JPH02174205A - Soft magnetic thin film - Google Patents

Soft magnetic thin film

Info

Publication number
JPH02174205A
JPH02174205A JP32793388A JP32793388A JPH02174205A JP H02174205 A JPH02174205 A JP H02174205A JP 32793388 A JP32793388 A JP 32793388A JP 32793388 A JP32793388 A JP 32793388A JP H02174205 A JPH02174205 A JP H02174205A
Authority
JP
Japan
Prior art keywords
thin film
soft magnetic
coercive force
magnetic thin
10atom
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP32793388A
Other languages
Japanese (ja)
Inventor
Osamu Shimizu
治 清水
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP32793388A priority Critical patent/JPH02174205A/en
Publication of JPH02174205A publication Critical patent/JPH02174205A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00Thin magnetic films, e.g. of one-domain structure
    • H01F10/08Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
    • H01F10/10Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
    • H01F10/12Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
    • H01F10/14Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing iron or nickel

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Magnetic Record Carriers (AREA)
  • Thin Magnetic Films (AREA)

Abstract

PURPOSE:To reduce coercive force Hc and improve corrosion-resistance by incorporating 12-25atom% Si, 0.5-10atom% Ru, and remaining Fe as chief ingredients into a material of the title thin film. CONSTITUTION:A soft magnetic thin film is formed on a crystallized glass substrate by RF sputtering by properly disposing two kinds of small pieces of Si and Ru on a pure Fe (3N) target. The soft magnetic thin film incorporates therein as chief ingredients 12-25atom% Si, 0.5-10atom% Ru, and remaining Fe. By the existence of the 0.5-10atom% Ru, coercive force Hc can be reduced and corrosion resistance can be improved. Ru preferably ranges from 1 to 8atom% and more preferably from 2 to 6atom%. Si preferably ranges from 17 to 23atom% when Si is less than 12atom%, for example when Si is 11atom%, the coercive force Hc is increased by addition of Ru, and not preferred.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は磁気ヘッドの材料等として好適な軟磁性薄膜に
関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a soft magnetic thin film suitable as a material for a magnetic head.

[発明の背景] 例えばオーディオテープレコーダやVTR(ビデオテー
プレコーダ)等の磁気記録再生装置においては、記録信
号の高密度化や高品質化等が進められており、この高記
録密度化に対応して、磁気記録媒体として磁性粉にFe
、Co、N1等の金属あるいは合金からなる粉末を用い
た。いわゆるメタルテープや1強磁性金属材料を真空薄
膜形成技術によりベースフィルム上に直接被着した。い
わゆる蒸着テープ等が開発され8各分野で実用化されて
いる。
[Background of the Invention] For example, in magnetic recording and reproducing devices such as audio tape recorders and VTRs (video tape recorders), the density and quality of recording signals are increasing, and it is necessary to cope with this increase in recording density. Fe is added to magnetic powder as a magnetic recording medium.
, Co, N1, or other metals or alloys were used. A so-called metal tape or a ferromagnetic metal material was deposited directly onto the base film by vacuum thin film formation technology. So-called vapor deposition tapes have been developed and put into practical use in eight different fields.

[従来の技術及び発明が解決しようとする課8]ところ
で、このような高抗磁力を有する磁気記録媒体の特性を
発揮せしめるためには、磁気ヘッドのコア材料の特性と
して、高い飽和磁束密度を有するとともに、同一の磁気
ヘッドで再生を行なおうとする場合においては、高透磁
率を併せて有することが要求される。例えば、従来磁気
ヘッドのコア材料として多用されているフェライト材で
は飽和磁束密度が低く、また、パーマロイでは耐摩耗性
に問題がある。
[Issue 8 to be solved by the prior art and the invention] By the way, in order to exhibit the characteristics of a magnetic recording medium having such a high coercive force, a high saturation magnetic flux density is required as a characteristic of the core material of the magnetic head. If the same magnetic head is to be used for reproduction, it is also required to have high magnetic permeability. For example, ferrite materials, which are commonly used as core materials for conventional magnetic heads, have a low saturation magnetic flux density, and permalloy has problems with wear resistance.

従来、かかる諸要求を満たすコア材料として。Conventionally, it has been used as a core material that satisfies these various requirements.

Fe−A、g−8t系合金からなるセンダスト合金が好
適であると考えられ、すでに実用に供されている。
Sendust alloys made of Fe-A and g-8t alloys are considered suitable and have already been put to practical use.

しかしながら、このセンダスト合金のように軟磁気特性
に優れた材料においては、磁歪λSと結晶磁気異方性K
が共に零付近であることが望ましく、磁気ヘッドに使用
可能な材料組成はこれら両者の値を考慮して決められる
。したがって、飽和磁束密度もこの組成に対応して一義
的に決まり。
However, in materials with excellent soft magnetic properties such as this Sendust alloy, magnetostriction λS and magnetocrystalline anisotropy K
It is desirable that both of these values be around zero, and the material composition that can be used in the magnetic head is determined by taking these two values into consideration. Therefore, the saturation magnetic flux density is also uniquely determined according to this composition.

センダスト合金の場合、10〜11にガウスが限界であ
る。
In the case of Sendust alloy, the limit is 10 to 11 Gauss.

そのため、上記センダスト合金にかわり、高周波数領域
での透磁率の低下が少なく高い飽和磁束密度を有する非
晶質磁性合金材料(いわゆるアモルファス磁性合金材料
)も開発されているが、この非晶質磁性合金材料でも飽
和磁束密度は12にガウス程度であり、また、熱的に不
安定で結晶化の可能性が大きいので500℃以上の温度
を長時間加えることができず2例えばガラス融着のよう
に各種熱処理が必要な磁気ヘッドに使用するには工程上
制限が生ずる。
Therefore, instead of the Sendust alloy mentioned above, an amorphous magnetic alloy material (so-called amorphous magnetic alloy material) that has a high saturation magnetic flux density with little decrease in magnetic permeability in the high frequency region has been developed. Even with alloy materials, the saturation magnetic flux density is about 12 Gauss, and since they are thermally unstable and have a high possibility of crystallization, it is not possible to apply temperatures over 500°C for a long time. There are process limitations when using it for magnetic heads that require various heat treatments.

本発明は上記従来の技術の欠点を改良した軟磁性薄膜を
提供することを目的とする。
An object of the present invention is to provide a soft magnetic thin film that improves the drawbacks of the above-mentioned conventional techniques.

[課題を解決するための手段] 本発明によれば、 12〜25原子%(at%)のSi
と0.5〜lO原子%のRuと残部Feとを主成分とし
て成る軟磁性薄膜に゛より、上記目的を達成することが
できる。
[Means for Solving the Problems] According to the present invention, 12 to 25 atomic % (at%) of Si
The above object can be achieved by a soft magnetic thin film mainly composed of 0.5 to 10 atomic % Ru and the balance Fe.

〔好適な実施態様及び作用] 本発明の軟磁性薄膜は、 12〜25原子%のSiと0
.5〜10原子%のRuと残部Feとを主成分として成
る。0.5〜IO原子%のRuの存在により、保磁力1
1cを低下させることができ、また耐食性を向上させる
ことができる。Ruの好ましい範囲は1〜8原子%であ
り、より好ましくは2〜6原子%である。Ruが0.5
原子%未満の場合にはRuの存在による効果、即ち保磁
力lieの低下及び耐食性の向上を図ることが困難なこ
とが多く、逆に10原子%を越えると保磁力Heがかえ
って増大し好ましくない。
[Preferred embodiments and effects] The soft magnetic thin film of the present invention contains 12 to 25 atomic % of Si and 0
.. The main components are 5 to 10 atomic % of Ru and the balance is Fe. Due to the presence of 0.5 to IO atomic % Ru, the coercive force 1
1c can be lowered, and corrosion resistance can be improved. The preferred range of Ru is 1 to 8 at%, more preferably 2 to 6 at%. Ru is 0.5
If it is less than atomic %, it is often difficult to achieve the effects of the presence of Ru, that is, to reduce the coercive force lie and improve corrosion resistance.On the other hand, if it exceeds 10 atomic %, the coercive force He will increase, which is undesirable. .

Slが12原子%以上の場合はRuの添加により保磁力
Heを減少させることができる。しかし。
When the Sl content is 12 atomic % or more, the coercive force He can be reduced by adding Ru. but.

Slが25原子%を越えると飽和磁束密度Bsが低下し
て12KG未満になり、Fe−Al−5t系及びFe−
Ga−5t−Ru系軟磁性材料と比ヘテ優位性がなくな
ってしまう。Siの好ましい範囲は17〜23原子%で
ある。Siが12原子%未満の場合1例えばSiが11
原子%の場合は、Ruの添加により保磁力Heが増大し
好ましくない。
When Sl exceeds 25 at%, the saturation magnetic flux density Bs decreases to less than 12 KG, and Fe-Al-5t system and Fe-
The specific advantage over Ga-5t-Ru soft magnetic material is lost. The preferred range of Si is 17 to 23 atomic %. When Si is less than 12 atomic % 1 For example, Si is 11
In the case of atomic %, the addition of Ru increases the coercive force He, which is not preferable.

本発明の軟磁性薄膜は2例えばRFスパッタ法等の気相
析着法により製膜しこれを350〜600℃程度で熱処
理して製造することができる。前記熱処理は2例えば、
1時間程度で十分である。
The soft magnetic thin film of the present invention can be manufactured by forming the film by a vapor phase deposition method such as RF sputtering, and then heat-treating the film at about 350 to 600°C. The heat treatment may be carried out in two ways, for example,
About 1 hour is sufficient.

前記熱処理を例えば300℃程度以下で行なうと、 H
eが所定範囲を越えるものが製造されるので好ましくな
く、逆に2例えば800℃以上で行なうと基板との反応
等により特性が低下゛すると思われる。好ましいのは凡
そ、350〜550℃の範囲である。
If the heat treatment is performed at a temperature of about 300°C or less, H
It is not preferable to manufacture products with e exceeding a predetermined range, and conversely, if the temperature is 2, for example, 800° C. or higher, the characteristics may deteriorate due to reactions with the substrate, etc. The preferred temperature range is approximately 350 to 550°C.

[実施例] 純Fe(3N)のターゲット上にSt及びRuの2Nの
小片を適宜配してRFスパッタ法により、結晶化ガラス
基板(保谷ガラス社製、商品名HOYA  PEG31
30C)上に種々の成分の薄膜を製膜した。前記スパッ
タ条件は、陰極電力200W、 A rガス圧2.0P
aであった。前記薄膜を500℃1時間で熱処理して軟
磁性薄膜を得てB−Hカーブn1定を行なった。B−H
カーブは25(Oe)の磁界を周波数50Hzで印加し
て測定し保磁力11cを求めた。また、飽和磁束密度B
sを測定した。それらの結果をSi含有量ごとに分類し
てプロットしたものが第1図及び第2図である。第1図
により、5il1%のものはRu添加によってHcは増
大してしまうが、 13%以上Slを含有したものはR
u添加によってさらにHeが低下しているということが
わかり、第2図により本発明の軟磁性薄膜は飽和磁束密
度Bsが大きいということがわかる。
[Example] A crystallized glass substrate (manufactured by Hoya Glass Co., Ltd., trade name: HOYA PEG31) was prepared by RF sputtering by appropriately disposing 2N pieces of St and Ru on a pure Fe (3N) target.
30C), thin films of various components were formed on the top. The sputtering conditions are cathode power 200W, Ar gas pressure 2.0P.
It was a. The thin film was heat-treated at 500° C. for 1 hour to obtain a soft magnetic thin film, and the B-H curve n1 was determined. B-H
The curve was measured by applying a magnetic field of 25 (Oe) at a frequency of 50 Hz, and the coercive force 11c was determined. Also, the saturation magnetic flux density B
s was measured. FIGS. 1 and 2 are plots of the results classified by Si content. According to Figure 1, Hc increases with the addition of Ru in the case of 5il1%, but the Hc increases in the case of 13% or more of Sl.
It can be seen that the addition of u further reduces He, and it can be seen from FIG. 2 that the soft magnetic thin film of the present invention has a large saturation magnetic flux density Bs.

[発明の効果] 本発明の軟磁性薄膜は、 12〜25原子%のStと0
.5〜lO原子%のRuと残部Feとを主成分として成
り、前記Ruの存在により保磁力Heを減少させること
ができるとともに耐食性を向上させることができ、さら
にFe−AJ−Si系及びFe−Ga−5i−Ru系軟
磁性材料よりも大きな飽和磁束密度111s (12K
Gを越える)を有する。
[Effect of the invention] The soft magnetic thin film of the present invention has 12 to 25 at% of St and 0
.. It is mainly composed of 5 to 10 atomic % Ru and the balance Fe, and the presence of Ru can reduce the coercive force He and improve corrosion resistance. Saturation magnetic flux density 111s (12K
G).

したがって、この軟磁性薄膜を例えば磁気ヘッドのコア
材料として用いることにより、磁気記録媒体の高抗磁力
化に充分対処することができ、高品質化や高記録密度化
を図ることが可能となる。
Therefore, by using this soft magnetic thin film as a core material of a magnetic head, for example, it is possible to sufficiently cope with the increase in coercive force of a magnetic recording medium, and it becomes possible to achieve higher quality and higher recording density.

【図面の簡単な説明】[Brief explanation of the drawing]

Si  Ru  (at%)を 第1図は’ Fe100−x−y   y   x主成
分として成る軟磁性薄膜の保磁力Heを示す図、第2図
は前記軟磁性薄膜の飽和磁束密度BsをHc(Oe) 第 図 示す図である。
Fig. 1 shows the coercive force He of the soft magnetic thin film mainly composed of Si Ru (at%), and Fig. 2 shows the saturation magnetic flux density Bs of the soft magnetic thin film Hc ( Oe) This is a diagram shown in the figure.

Claims (1)

【特許請求の範囲】[Claims] 12〜25原子%のSiと0.5〜10原子%のRuと
残部Feとを主成分として成る軟磁性薄膜。
A soft magnetic thin film mainly composed of 12 to 25 atomic % Si, 0.5 to 10 atomic % Ru, and the balance Fe.
JP32793388A 1988-12-27 1988-12-27 Soft magnetic thin film Pending JPH02174205A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32793388A JPH02174205A (en) 1988-12-27 1988-12-27 Soft magnetic thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32793388A JPH02174205A (en) 1988-12-27 1988-12-27 Soft magnetic thin film

Publications (1)

Publication Number Publication Date
JPH02174205A true JPH02174205A (en) 1990-07-05

Family

ID=18204631

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32793388A Pending JPH02174205A (en) 1988-12-27 1988-12-27 Soft magnetic thin film

Country Status (1)

Country Link
JP (1) JPH02174205A (en)

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