KR0136419B1 - Soft magnetic alloy thin film substrate - Google Patents

Soft magnetic alloy thin film substrate

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Publication number
KR0136419B1
KR0136419B1 KR1019950000614A KR19950000614A KR0136419B1 KR 0136419 B1 KR0136419 B1 KR 0136419B1 KR 1019950000614 A KR1019950000614 A KR 1019950000614A KR 19950000614 A KR19950000614 A KR 19950000614A KR 0136419 B1 KR0136419 B1 KR 0136419B1
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South Korea
Prior art keywords
thin film
soft magnetic
alloy thin
magnetic alloy
permeability
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KR1019950000614A
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Korean (ko)
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KR960030092A (en
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김태영
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구자홍
주식회사 엘지전자
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Priority to KR1019950000614A priority Critical patent/KR0136419B1/en
Publication of KR960030092A publication Critical patent/KR960030092A/en
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    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/187—Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features
    • G11B5/1875—"Composite" pole pieces, i.e. poles composed in some parts of magnetic particles and in some other parts of magnetic metal layers
    • G11B5/1877—"Composite" pole pieces, i.e. poles composed in some parts of magnetic particles and in some other parts of magnetic metal layers including at least one magnetic thin film
    • G11B5/1878—"Composite" pole pieces, i.e. poles composed in some parts of magnetic particles and in some other parts of magnetic metal layers including at least one magnetic thin film disposed immediately adjacent to the transducing gap, e.g. "Metal-In-Gap" structure
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
    • H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
    • H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
    • H01F10/14—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing iron or nickel

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Thin Magnetic Films (AREA)
  • Magnetic Heads (AREA)

Abstract

본 발명은 자기헤드 및 인덕터 등의 디바이스(Device)에 이용할 수 있는 높은 포화자화와 우수한 열적 안정성을 갖으며, 고주파 대역에서도 우수한 투자율의 주파수 특성을 갖는 연자성 합금 박막재료에 관한 것으로, FeaMbXcPd조성식에서 M은 Ta, Hf, Zr, Nb, Mo, Al, Si, Ti, Cr, W중 선택한 1종 또는 2종 이상이고, X는 C, N, O, B중 선택한 1종 이상이며 조성범위가 원자 %(at%)로서The present invention was has a high saturation magnetization and good thermal stability that can be used in the device (Device) such as a magnetic head and an inductor, on the soft magnetic alloy thin film material having the frequency characteristics of the high magnetic permeability in a high frequency band, Fe a M In the formula of b X c P d , M is one or more selected from Ta, Hf, Zr, Nb, Mo, Al, Si, Ti, Cr, and W, and X is 1 selected from C, N, O, and B. More than one species and the composition range is atomic% (at%)

40≤a≤9540≤a≤95

1≤b≤201≤b≤20

1≤c≤201≤c≤20

5≤d≤30 (단 a+b+c+d=100)5≤d≤30 (where a + b + c + d = 100)

에 관한 기술임.Description of the technology.

Description

연자성 합금 박막재료Soft Magnetic Alloy Thin Film Materials

제1도는 전착법으로 제조한 종래의 연자성 합금 박막재료에 대한 MH 곡선과 자기 특성을 나타낸 상태도1 is a state diagram showing the MH curve and magnetic properties of the conventional soft magnetic alloy thin film material prepared by electrodeposition

제2도는 열처리에 따른 박막투자율의 주파수 특성을 나타낸 그래프2 is a graph showing the frequency characteristics of the thin film permeability according to heat treatment

제3도는 본 발명의 제조한 박막의 열처리 온도에 따른 보자력(Hc) 및 포화자화(Bs)변화를 나타낸 그래프3 is a graph showing changes in coercive force (Hc) and saturation magnetization (Bs) according to the heat treatment temperature of the prepared thin film of the present invention.

제4도는 본 발명에 따른 결점립상태도4 is a fault state diagram according to the present invention

제5도는 본 발명에 대한 주파수 및 투자율 관계 그래프5 is a graph of frequency and permeability relationship for the present invention.

본 발명은 자기 헤드 및 인덕터 등의 디바이스(Device)에 이용할 수 있는 높은 포화자화와 우수한 열적안정성을 갖으며, 고주파수 대역에서 우수한 투자율의 주파수 특성을 나타내는 연자성 합금박막 재료에 관한 것이다.The present invention relates to a soft magnetic alloy thin film material having high saturation magnetization and excellent thermal stability that can be used in devices such as a magnetic head and an inductor, and exhibiting high permeability frequency characteristics in a high frequency band.

자기 기록 및 재생 장치의 고밀도화에 따라 기록매체는 고보자력화가 요구되며 이러한 고보자력 매체에 대응하기 위해 헤드코아 재료는 고포화 자속밀도(Bs)가 필요하고 자기 헤드의 출력을 높이기 위해서는 높은 투자율과, D-VCR 등과 같이 고주파 대역을 필요로 하는 기록장치에서는 수십 ㎒까지 투자율이 감소없이 고주파에서 안정한 투자율의 주파수 특성이 중요하게 된다.High density magnetic recording and reproducing devices require high coercivity of recording media. To cope with such high coercivity media, the head core material requires a high saturation magnetic flux density (Bs) and high magnetic permeability to increase the output of the magnetic head. In a recording apparatus requiring a high frequency band such as D-VCR, the frequency characteristic of permeability stable at high frequency becomes important without decreasing the permeability up to several tens of MHz.

또한 고온의 유리 융착(Gloss Bonding)과정이 포함된 자기헤드에 적용하기 위해서는 높은 온도에서의 높은 열적 안정성이 요구되고 있다.In addition, high thermal stability at a high temperature is required for application to a magnetic head including a high temperature glass bonding process.

현재 사용되고 있는 산화철계 테이프는 항자력이 600~800 Oe정도로 포화자화가 5,000가우스(Gauss)인 Mn-Zn 페라이트 헤드를 사용하고 있다.The iron oxide-based tape currently used uses a Mn-Zn ferrite head with a saturation magnetization of 5,000 gauss with a coercive force of 600 to 800 Oe.

그러나 8㎜VCR.DAT등에 사용되는 테이프는 항자력이 1500 Oe정도 되기 때문에 상기 헤드로는 기록, 재생이 어려워 고포화 자화값을 갖는 센더스트(Sendust)(Fe-Al-Si합금)등과 같은 연자성합금 박막을 갭(Gap)사이에 성막하거나 의사갭 효과를 줄이기 위하여 페라이트에 Cr, SiO2, Fe-N과 같은 물질로 베리어(Barrier)층을 성막하고 상기한 연자성 합금박막을 입힌다.However, since the tape used for 8 mm VCR, DAT, etc. has a coercive force of about 1500 Oe, it is difficult to record and reproduce with the head, and soft magnetic properties such as Sendust (Fe-Al-Si alloy) having a high saturation magnetization value. In order to form an alloy thin film between gaps or to reduce the pseudogap effect, a barrier layer is formed on a ferrite with a material such as Cr, SiO 2 , Fe-N, and the soft magnetic alloy thin film is coated.

이러한 헤드를 MIG(Metal-In-Gap)헤드라 한다.Such a head is called a MIG (Metal-In-Gap) head.

종래의 연자성 합금 박막에서 CoFe 합금인 경우는 24KG이상의 높은 Bs를 보이지만 자왜 및 결정자기 이방성이 높기 때문에 박막제조시 연자기 특성을 보이지 않는다. 따라서 보자력을 낮추는 방법으로 B, C, N, P, S 등을 첨가하여 박막 구조를 미결정화 시킴으로써 결정 자기 이방성을 감소시켜 연자기 특성을 얻기 위한 연구가 시도되고 있다.In the conventional soft magnetic alloy thin film, CoFe alloy shows high Bs of more than 24KG, but does not show soft magnetic properties when manufacturing thin film because of high magnetostriction and crystal magnetic anisotropy. Therefore, studies have been made to obtain soft magnetic properties by reducing crystal magnetic anisotropy by adding B, C, N, P, S, etc. as a method of lowering the coercivity to microcrystalline the thin film structure.

최근에 보고된 Fe에 P를 첨가시켜 전기화학적인 전착(Electrodeposition)법으로 제조한 FeP합금 박막인 경우는 박막 결정구조를 미세 결정화 시킴으로써 보자력이 (Hc) 0.2 Oe이하를 나타내어 우수한 연자기 특성을 얻는 결과를 보이고 있다.In the case of FeP alloy thin films prepared by electrochemical electrodeposition by adding P to Fe recently reported, the coercive force is (Hc) 0.2 Oe or less by fine crystallization of the thin crystal structure to obtain excellent soft magnetic properties. The results are showing.

제1도는 전착(Electrodeposition)법으로 제조한 Fe73P27(at%)박막의 MH곡선과 박막의 자기 특성을 나타낸 것으로 기존의 센더스트인 경우 Bs가 10KG정도의 값을 나타내지만 FeP박막인 경우 14KG이상의 높은 Bs을 보이고 있다.1 shows MH curve of Fe 73 P 27 (at%) thin film prepared by electrodeposition method and magnetic properties of thin film. In case of conventional sendust, Bs shows about 10KG but FeP thin film High Bs of over 14KG.

제2도는 열처리에 따른 박막 투자율의 주파수 특성을 나타낸 것으로, 250℃에서 열처리한 경우 50㎒까지 1000이상의 높은 투자율이 유지되어 양호한 투자율의 주파수 특성을 보이고 있다.Figure 2 shows the frequency characteristics of the thin film magnetic permeability according to the heat treatment, the high permeability of 1000 or more is maintained up to 50 MHz when the heat treatment at 250 ℃ shows a good permeability frequency characteristics.

그러나 FeP박막인 경우 열처리 온도를 400℃이상으로 올리면 연자기 특성이 급격히 저하 되어 실제 MIG Head 박막코아 재료로 사용할 경우 550℃이상의 고온에서의 유리접합(Glass Bonding)과정이 포함된 헤드 제조시 문제를 발생시키는 열적 안정성의 문제가 있으며 또한 자왜값이 λs=2.7×10·5정도로 상대적으로 크기 때문에 실제 자기 헤드 응용시 헤드 출력과 밀접한 관계를 갖는 자왜값을 낮추어야 하는 문제점을 갖고 있다.However, in the case of FeP thin film, if the heat treatment temperature is raised to 400 ℃ or higher, the soft magnetic properties deteriorate rapidly, and when used as a real MIG Head thin film core material, there is a problem in manufacturing the head including glass bonding process at a high temperature of 550 ℃ or higher. There is a problem of thermal stability to generate and also because the magnetostriction value is relatively large, such as λ s = 2.7 × 10 · 5 , the magnetostriction value which has a close relationship with the head output in the actual magnetic head application has a problem.

본 발명은 기존의 Fe계 박막중 높은 포화자화값을 보이고(14㎏) 양호한 연자기 특성(Hc=0.2 Oe, μ=1000, at 50㎒)를 보이는 FeP박막이 400℃이상의 고온에서 연자기 특성이 급격히 떨어지는 열적 안정성의 문제를 해결하고 연자기 특성이 향상된 연자성 합금 박막 재료를 제공하는 데 그 목적이 있다.In the present invention, the FeP thin film exhibits a high saturation magnetization value (14 kg) and a good soft magnetic property (Hc = 0.2 Oe, μ = 1000, at 50 MHz) of the existing Fe-based thin film. The purpose is to solve this problem of rapidly falling thermal stability and to provide a soft magnetic alloy thin film material having improved soft magnetic properties.

이하 본 발명을 설명한다.Hereinafter, the present invention will be described.

본 발명은 FeaMbXcPd로 이루어진 조성식에서 M은 Ta, Hf, Zr, Nb, Mo, Al, Si, Ti, Cr, W중 1종 또는 2종 이상 선택되고, 상기 X는 C, N, O, B중 1종 이상 선택되며 조성범위가 원자 %(at%)로서In the present invention, in the composition consisting of Fe a M b X c P d M is selected from Ta, Hf, Zr, Nb, Mo, Al, Si, Ti, Cr, W, or two or more, wherein X is C At least one selected from among N, O, and B. The composition range is atomic% (at%)

40≤a≤9540≤a≤95

1≤b≤201≤b≤20

1≤c≤201≤c≤20

5≤d≤30 (단 a+b+c+d=100)5≤d≤30 (where a + b + c + d = 100)

로 조성된 연자성 합금 박막 재료로 이루어 진다.It is made of a soft magnetic alloy thin film material.

상기한 박막내의 조상에 따라 질화물, 탄화물 또는 산화물이 석출되어 고온에서도 미결정 상태를 유지하여 우수한 열전 안전성과 우수한 연자기 특성을 갖게 된다.Nitride, carbide, or oxide precipitates according to the ancestors in the thin film to maintain a microcrystalline state even at high temperature, thereby having excellent thermoelectric safety and excellent soft magnetic properties.

이하 실시예에 따라 설명한다.It demonstrates according to an Example below.

실시예1.Example 1

연자성 합금 박막을 제조함에 있어서는 기존의 FeP 박막 제조는 주로 전기 화학적인 전착법(Electrodeposition)인데 반해 본발명은 박막내의 질화물, 탄화물, 산화물의 생성이 용이한 RF Sputtering법을 이용하였다.In manufacturing a soft magnetic alloy thin film, the conventional FeP thin film manufacturing is mainly electrochemical electrodeposition (electrodeposition), whereas the present invention uses the RF sputtering method that is easy to form nitride, carbide, oxide in the thin film.

이때 타겟(target)은 FeP 합금 타겟위에 M(M: Ta, Hf, Zr, Nb, Mo, Al, Si, Ti, Cr, W등) 칩을 배치하여 사용하였고, Sputter시 Ar 외에 N 또는 CH4, O2등을 혼합하여 FeMXP 박막을 제조하였다.At this time, the target (target) is over FeP alloy target M (M: Ta, Hf, Zr, Nb, Mo, Al, Si, Ti, Cr, W, etc.) was used to place the chip, in addition to Ar when Sputter N or CH 4 , O 2 and the like were mixed to prepare a FeMXP thin film.

제3도는 본 발명의 방법으로 제조한 Fe74Zr5N6P15(at%) 박막의 열처리 온도에 따른 보자력(HC) 및 포화자화(Bs) 변화를 나타낸 것으로, 성막 초기에는 3Oe이상의 높은 보자력을 보이고 있지만 열처리 온도의 상승에 따라 보자력이 감소하여 550℃에서 열처리 할 경우 0.2Oe 정도의 우수한 연자기 특성을 보이고 있으며 그 이상의 온도, 즉 650℃까지 0.5Oe이하의 낮은 보자력을 유지하였다.Figure 3 shows the coercive force (HC) and saturation magnetization (Bs) change according to the heat treatment temperature of the Fe 74 Zr 5 N 6 P 15 (at%) thin film prepared by the method of the present invention, high coercive force of 3Oe or more at the beginning of film formation Although the coercivity decreases with the increase of heat treatment temperature, it shows excellent soft magnetic properties of about 0.2Oe when heat treated at 550 ℃ and maintained a low coercivity below 0.5Oe up to a temperature above 650 ℃.

따라서, 기존의 FeP 박막이 400℃이상에서는 연자기 특성이 급격히 열화되는데 반해 상기한 바와같이 본 발명의 경우 현격한 열적 안정성이 개선 되었음을 알 수 있다.Therefore, while the soft Fe properties of the existing FeP thin film is more than 400 ℃ is rapidly deteriorated as described above it can be seen that the thermal stability is improved.

이것은 박막 제조시 첨가된 Zr과 질소가 고온 열처리시 제4도와 같이 Zr질화물로 석출되어 α-Fe 결정립 성장을 억제하여 550℃이상의 고온에서도 양호한 연자기 특성을 유지시키는 것이며 또한 박막내의 질소가 박막의 결정립을 더욱 미세화 시킴으로써 FeP박막에 비해 우수한 연자기 특성이 출현할 수 있다.This is because Zr and nitrogen added during the thin film production are precipitated as Zr nitride during the high temperature heat treatment to suppress α-Fe grain growth and maintain good soft magnetic properties even at high temperature above 550 ℃. By further miniaturizing the grains, superior soft magnetic properties may be exhibited compared to the FeP thin film.

또한 550℃이상의 열처리시 포화자속밀도가 14㎏이상으로 증가하여 기존의 Sendust 박막재료(10㎏)에 비하여 월등히 높은 포화자화를 갖기 때문에 기록밀도가 높은 고보자력 기록매체를 사용할 수 있는 장점이 있다.In addition, since the saturation magnetic flux density is increased to 14 kg or more during heat treatment at 550 ° C. or higher, the saturation magnetic flux has a much higher saturation magnetization than the conventional Sendust thin film material (10 kg).

실시예2.Example 2.

제5도는 실시예 1과 같은 방법으로 Sputter 시 Ar외에 O2반응 가스를 혼입하여 제조한 Fe64Hf8O18P10(at%) 박막의 주파수에 따른 투자율의 변화를 나타낸 것으로, 기존의 FeP 박막에 비해 전주파수 대역에서 높은 투자율을 나타내고 100㎒의 고주파에서도 투자율이 2000정도를 유지하여 투자율의 우수한 주파수 특성을 보이고 있다.Figure 5 shows the change in permeability according to the frequency of the Fe 64 Hf 8 O 18 P 10 (at%) thin film prepared by incorporating O 2 reaction gas in addition to Ar during the sputtering method in the same manner as in Example 1, Compared to the thin film, it has higher permeability in all frequency bands and maintains permeability of about 2000 even at high frequency of 100MHz, showing excellent frequency characteristics of permeability.

이것은 박막내에 석출된 산소 화합물에 의해 박막의 비저항값이 증가하여, 고주파 대역에서도 와전류 손실없이 높은 투자율 값을 유지할 수 있는 것으로써, 본 발명에서와 같이 FeH5OP 박막을 제조할 경우 고주파 대역에서의 동작을 필요로 하는 인덕터 및 박막 transformer와 같은 Device에 적용할 수 있다.This is because the specific resistance of the thin film increases due to the oxygen compound deposited in the thin film, and thus it is possible to maintain a high permeability value without loss of eddy current even in the high frequency band. When manufacturing the FeH 5 OP thin film as in the present invention, It can be applied to devices such as inductors and thin film transformers that require operation.

이상에서와 같이 본 발명은 연자기 특성이 떨어지지 않으면서 열적 안정성이 우수하고 고주파 대역에서도 우수한 투자율의 주파수 특성을 갖는 연자성 합금 박막을 얻게 된다.As described above, the present invention obtains a soft magnetic alloy thin film having excellent thermal stability and excellent permeability frequency characteristics even in a high frequency band without inferior soft magnetic properties.

Claims (1)

FeaMbXcPd조성식에서 M은 Ta, Hf, Zr, Nb, Mo, Al, Si, Ti, Cr, W중 선택한 1종 또는 2종 이상이고, 상기 X는 C, N, O, B중 선택한 1종 이상이며, 조성범위가 원자 %(at%)로서In the composition of Fe a M b X c P d M is one, two or more selected from Ta, Hf, Zr, Nb, Mo, Al, Si, Ti, Cr, W, X is C, N, O, At least one selected from B, the composition range is atomic% (at%) 40≤a≤9540≤a≤95 1≤b≤201≤b≤20 1≤c≤201≤c≤20 5≤d≤30 (단 a+b+c+d=100)5≤d≤30 (where a + b + c + d = 100) 로 조성된 연자성 합금박막 재료.Soft magnetic alloy thin film material composed of.
KR1019950000614A 1995-01-16 1995-01-16 Soft magnetic alloy thin film substrate KR0136419B1 (en)

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