JPH021721U - - Google Patents
Info
- Publication number
- JPH021721U JPH021721U JP1988161211U JP16121188U JPH021721U JP H021721 U JPH021721 U JP H021721U JP 1988161211 U JP1988161211 U JP 1988161211U JP 16121188 U JP16121188 U JP 16121188U JP H021721 U JPH021721 U JP H021721U
- Authority
- JP
- Japan
- Prior art keywords
- beam splitting
- optical system
- image
- image plane
- members
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 claims description 7
- 230000004907 flux Effects 0.000 claims description 6
- 230000005499 meniscus Effects 0.000 claims description 3
- 230000004075 alteration Effects 0.000 claims 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/14—Beam splitting or combining systems operating by reflection only
- G02B27/144—Beam splitting or combining systems operating by reflection only using partially transparent surfaces without spectral selectivity
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Lenses (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure Or Original Feeding In Electrophotography (AREA)
Description
第１図は、本考案による装置の１実施例の構造
を略示する縦断面図である。 １１……投影光束、１３……像面、１５……ビ
ームスプリツトキユーブ、１７……観察方向へ反
射された光束、１９……無焦点等倍の光学系、２
１，２３……メニスカスレンズ部材、２５……補
正により生じた光束。
を略示する縦断面図である。 １１……投影光束、１３……像面、１５……ビ
ームスプリツトキユーブ、１７……観察方向へ反
射された光束、１９……無焦点等倍の光学系、２
１，２３……メニスカスレンズ部材、２５……補
正により生じた光束。
Claims (1)
- 【実用新案登録請求の範囲】 １ マスクの像を感光性ウエーハに形成するマイ
クロ投影装置中へ挿入し、像面へ投影された像を
その画質、寸法または位置に影響を与えずに観察
するための光学系において、この光学系が、 光路中で像面１３の前方にあつて、光束を像面
１３へ透過させかつ、この像面から反射された１
部分の光束を観察方向へ反射させるように配置さ
れたビームスプリツト部材１５；および 前記ビームスプリツト部材１５の前方にあつて
、それらの凹面が相互に対向するように配置され
ている、前記ビームスプリツト部材により惹起さ
れる像の移動および収差を補正する装置を形成す
る１対のメニスカスレンズ部材２１，２３；より
成り、 かつ前記それぞれのビームスプリツト部材１５
およびメニスカスレンズ部材２１，２３が無焦点
であり、従つてこの光学系が等倍であることを特
徴とするマイクロ投影装置用の観察光学系。 ２ 前記ビームスプリツト部材１５がビームスプ
リツトキユーブである請求項１記載の観察光学系
。
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/070,568 US4288148A (en) | 1979-08-29 | 1979-08-29 | Beam-splitting optical system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH021721U true JPH021721U (ja) | 1990-01-08 |
| JPH0350490Y2 JPH0350490Y2 (ja) | 1991-10-29 |
Family
ID=22096092
Family Applications (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11716080A Pending JPS5636623A (en) | 1979-08-29 | 1980-08-27 | Optical system for projector |
| JP1988161212U Expired JPH0350491Y2 (ja) | 1979-08-29 | 1988-12-12 | |
| JP1988161211U Expired JPH0350490Y2 (ja) | 1979-08-29 | 1988-12-12 | |
| JP1988161213U Expired JPH0350492Y2 (ja) | 1979-08-29 | 1988-12-12 |
Family Applications Before (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11716080A Pending JPS5636623A (en) | 1979-08-29 | 1980-08-27 | Optical system for projector |
| JP1988161212U Expired JPH0350491Y2 (ja) | 1979-08-29 | 1988-12-12 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1988161213U Expired JPH0350492Y2 (ja) | 1979-08-29 | 1988-12-12 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US4288148A (ja) |
| EP (1) | EP0025832B1 (ja) |
| JP (4) | JPS5636623A (ja) |
| CA (1) | CA1143192A (ja) |
| DE (1) | DE3065609D1 (ja) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4412723A (en) * | 1981-05-28 | 1983-11-01 | The Perkin-Elmer Corporation | Optical system for correcting the aberrations of a beamsplitter in converging light |
| GB2162963B (en) * | 1984-08-07 | 1988-05-05 | Pilkington Perkin Elmer Ltd | Infra-red optical systems |
| US4711535A (en) * | 1985-05-10 | 1987-12-08 | The Perkin-Elmer Corporation | Ring field projection system |
| JP2563260B2 (ja) * | 1986-04-11 | 1996-12-11 | 松下電器産業株式会社 | 光ビ−ム走査装置 |
| US4890901A (en) * | 1987-12-22 | 1990-01-02 | Hughes Aircraft Company | Color corrector for embedded prisms |
| JP2510313Y2 (ja) * | 1990-11-20 | 1996-09-11 | 株式会社アイチコーポレーション | ブ―ム付き作業車の安全装置 |
| US5559629A (en) * | 1994-08-19 | 1996-09-24 | Tamarack Scientific Co., Inc. | Unit magnification projection system and method |
| US6545758B1 (en) * | 2000-08-17 | 2003-04-08 | Perry Sandstrom | Microarray detector and synthesizer |
| US6567163B1 (en) | 2000-08-17 | 2003-05-20 | Able Signal Company Llc | Microarray detector and synthesizer |
| US7477392B2 (en) * | 2005-07-27 | 2009-01-13 | Key Technology, Inc | Electromagnetic energy measurement apparatus and method |
| US20090112482A1 (en) * | 2007-10-26 | 2009-04-30 | Sandstrom Perry L | Microarray detector and synthesizer |
| US9557547B2 (en) | 2014-07-24 | 2017-01-31 | University Of Rochester | Paraxial cloak design and device |
| JP2018524952A (ja) | 2015-04-21 | 2018-08-30 | ユニバーシティー オブ ロチェスター | クローキングシステム及び方法 |
| EP3494457A1 (en) | 2016-08-05 | 2019-06-12 | University of Rochester | Virtual window |
| US10496238B2 (en) | 2016-08-22 | 2019-12-03 | University Of Rochester | 3D display ray principles and methods, zooming, and real-time demonstration |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3357769A (en) * | 1965-02-09 | 1967-12-12 | Kenneth B Thompson | Optical viewing apparatus |
| NL6701520A (ja) * | 1967-02-01 | 1968-08-02 | ||
| FR2134272B1 (ja) * | 1971-04-29 | 1975-02-21 | Cerco | |
| US3748015A (en) * | 1971-06-21 | 1973-07-24 | Perkin Elmer Corp | Unit power imaging catoptric anastigmat |
| US3726594A (en) * | 1971-12-09 | 1973-04-10 | Nippon Kogaku Kk | Image positioning optical arrangement in projection printing system |
-
1979
- 1979-08-29 US US06/070,568 patent/US4288148A/en not_active Expired - Lifetime
-
1980
- 1980-07-11 CA CA000355971A patent/CA1143192A/en not_active Expired
- 1980-07-17 EP EP80104203A patent/EP0025832B1/en not_active Expired
- 1980-07-17 DE DE8080104203T patent/DE3065609D1/de not_active Expired
- 1980-08-27 JP JP11716080A patent/JPS5636623A/ja active Pending
-
1988
- 1988-12-12 JP JP1988161212U patent/JPH0350491Y2/ja not_active Expired
- 1988-12-12 JP JP1988161211U patent/JPH0350490Y2/ja not_active Expired
- 1988-12-12 JP JP1988161213U patent/JPH0350492Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE3065609D1 (en) | 1983-12-22 |
| JPS5636623A (en) | 1981-04-09 |
| JPH023520U (ja) | 1990-01-10 |
| JPH023519U (ja) | 1990-01-10 |
| JPH0350491Y2 (ja) | 1991-10-29 |
| JPH0350492Y2 (ja) | 1991-10-29 |
| JPH0350490Y2 (ja) | 1991-10-29 |
| EP0025832A1 (en) | 1981-04-01 |
| EP0025832B1 (en) | 1983-11-16 |
| US4288148A (en) | 1981-09-08 |
| CA1143192A (en) | 1983-03-22 |
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