NL6701520A - - Google Patents

Info

Publication number
NL6701520A
NL6701520A NL6701520A NL6701520A NL6701520A NL 6701520 A NL6701520 A NL 6701520A NL 6701520 A NL6701520 A NL 6701520A NL 6701520 A NL6701520 A NL 6701520A NL 6701520 A NL6701520 A NL 6701520A
Authority
NL
Netherlands
Application number
NL6701520A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to NL6701520A priority Critical patent/NL6701520A/xx
Priority to DE19681622979 priority patent/DE1622979A1/de
Priority to US700970A priority patent/US3536380A/en
Priority to CH129268A priority patent/CH483026A/de
Priority to GB4441/68A priority patent/GB1213728A/en
Priority to SE01144/68A priority patent/SE330993B/xx
Priority to BE710114D priority patent/BE710114A/xx
Priority to FR1558619D priority patent/FR1558619A/fr
Publication of NL6701520A publication Critical patent/NL6701520A/xx

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/008—Systems specially adapted to form image relays or chained systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
NL6701520A 1967-02-01 1967-02-01 NL6701520A (ja)

Priority Applications (8)

Application Number Priority Date Filing Date Title
NL6701520A NL6701520A (ja) 1967-02-01 1967-02-01
DE19681622979 DE1622979A1 (de) 1967-02-01 1968-01-11 Vorrichtung zum Anbringen mehrerer gleicher Elemente auf einem halbleitenden Substrat mit Hilfe mehrerer ungleicher Masken
US700970A US3536380A (en) 1967-02-01 1968-01-26 Device for applying a plurality of equal elements to a semiconductor substrate by means of a plurality of unequal masks
CH129268A CH483026A (de) 1967-02-01 1968-01-29 Vorrichtung zum Abbilden einer Maske mit mehreren Mustern auf ein halbleitendes Substrat
GB4441/68A GB1213728A (en) 1967-02-01 1968-01-29 Optical device
SE01144/68A SE330993B (ja) 1967-02-01 1968-01-29
BE710114D BE710114A (ja) 1967-02-01 1968-01-30
FR1558619D FR1558619A (ja) 1967-02-01 1968-02-01

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL6701520A NL6701520A (ja) 1967-02-01 1967-02-01

Publications (1)

Publication Number Publication Date
NL6701520A true NL6701520A (ja) 1968-08-02

Family

ID=19799187

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6701520A NL6701520A (ja) 1967-02-01 1967-02-01

Country Status (8)

Country Link
US (1) US3536380A (ja)
BE (1) BE710114A (ja)
CH (1) CH483026A (ja)
DE (1) DE1622979A1 (ja)
FR (1) FR1558619A (ja)
GB (1) GB1213728A (ja)
NL (1) NL6701520A (ja)
SE (1) SE330993B (ja)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3914030A (en) * 1971-04-12 1975-10-21 Helmut Weiss Virtual image magnifier system filled with a refractive medium
US3758196A (en) * 1971-04-12 1973-09-11 H Weiss Optical magnifying system and apparatus for viewing small objects
US3748015A (en) * 1971-06-21 1973-07-24 Perkin Elmer Corp Unit power imaging catoptric anastigmat
US4103989A (en) * 1977-02-07 1978-08-01 Seymour Rosin Unit-power concentric optical systems
US4171870A (en) * 1977-05-06 1979-10-23 Bell Telephone Laboratories, Incorporated Compact image projection apparatus
US4171871A (en) * 1977-06-30 1979-10-23 International Business Machines Corporation Achromatic unit magnification optical system
US4288148A (en) * 1979-08-29 1981-09-08 The Perkin-Elmer Corporation Beam-splitting optical system
US4302079A (en) * 1980-04-10 1981-11-24 Bell Telephone Laboratories, Incorporated Photolithographic projection apparatus using light in the far ultraviolet
US4406520A (en) * 1980-08-14 1983-09-27 Universal Pioneer Corporation Beam splitter optical system of signal pickup device
US4391494A (en) * 1981-05-15 1983-07-05 General Signal Corporation Apparatus for projecting a series of images onto dies of a semiconductor wafer
US4425037A (en) 1981-05-15 1984-01-10 General Signal Corporation Apparatus for projecting a series of images onto dies of a semiconductor wafer
US4444492A (en) * 1982-05-15 1984-04-24 General Signal Corporation Apparatus for projecting a series of images onto dies of a semiconductor wafer
US4540251A (en) * 1983-12-01 1985-09-10 International Business Machines Corporation Thermo-mechanical overlay signature tuning for Perkin-Elmer mask aligner
US4896952A (en) * 1988-04-22 1990-01-30 International Business Machines Corporation Thin film beamsplitter optical element for use in an image-forming lens system
US4953960A (en) * 1988-07-15 1990-09-04 Williamson David M Optical reduction system
US4964705A (en) * 1988-11-07 1990-10-23 General Signal Corporation Unit magnification optical system
US5040882A (en) * 1988-11-07 1991-08-20 General Signal Corporation Unit magnification optical system with improved reflective reticle
US5140459A (en) * 1989-08-29 1992-08-18 Texas Instruments Apparatus and method for optical relay and reimaging
US5241423A (en) * 1990-07-11 1993-08-31 International Business Machines Corporation High resolution reduction catadioptric relay lens
US5089913A (en) * 1990-07-11 1992-02-18 International Business Machines Corporation High resolution reduction catadioptric relay lens
US5323263A (en) * 1993-02-01 1994-06-21 Nikon Precision Inc. Off-axis catadioptric projection system
US5515207A (en) * 1993-11-03 1996-05-07 Nikon Precision Inc. Multiple mirror catadioptric optical system
US5610765A (en) * 1994-10-17 1997-03-11 The University Of North Carolina At Chapel Hill Optical path extender for compact imaging display systems
US20060238732A1 (en) * 2005-04-21 2006-10-26 Mercado Romeo I High-NA unit-magnification projection optical system having a beamsplitter
US8493670B2 (en) 2010-09-10 2013-07-23 Coherent, Inc. Large-field unit-magnification catadioptric projection system
US8659823B2 (en) 2011-04-22 2014-02-25 Coherent, Inc. Unit-magnification catadioptric and catoptric projection optical systems

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2801570A (en) * 1952-05-29 1957-08-06 Centre Nat Rech Scient Mirror type optical objectives for microscopes
FR1471508A (fr) * 1966-03-15 1967-03-03 Optische Ind De Oude Delft Nv Système catadioptrique de grossissement égal à l'unité

Also Published As

Publication number Publication date
CH483026A (de) 1969-12-15
BE710114A (ja) 1968-07-30
SE330993B (ja) 1970-12-07
FR1558619A (ja) 1969-02-28
DE1622979A1 (de) 1971-01-07
US3536380A (en) 1970-10-27
GB1213728A (en) 1970-11-25

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