JPH0216419Y2 - - Google Patents
Info
- Publication number
- JPH0216419Y2 JPH0216419Y2 JP16651183U JP16651183U JPH0216419Y2 JP H0216419 Y2 JPH0216419 Y2 JP H0216419Y2 JP 16651183 U JP16651183 U JP 16651183U JP 16651183 U JP16651183 U JP 16651183U JP H0216419 Y2 JPH0216419 Y2 JP H0216419Y2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic recording
- layer
- plasma polymerized
- recording layer
- polymerized film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010410 layer Substances 0.000 claims description 42
- 239000011241 protective layer Substances 0.000 claims description 19
- 239000000758 substrate Substances 0.000 claims description 16
- 238000010521 absorption reaction Methods 0.000 claims description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 7
- 230000000694 effects Effects 0.000 claims description 6
- 239000011521 glass Substances 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 239000000463 material Substances 0.000 description 13
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 10
- 239000005977 Ethylene Substances 0.000 description 10
- 239000007789 gas Substances 0.000 description 7
- 230000035945 sensitivity Effects 0.000 description 7
- 229920000052 poly(p-xylylene) Polymers 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- 230000006866 deterioration Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 238000007738 vacuum evaporation Methods 0.000 description 3
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 2
- 229910016629 MnBi Inorganic materials 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- -1 olefin compounds Chemical class 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- 229910002837 PtCo Inorganic materials 0.000 description 1
- 239000011358 absorbing material Substances 0.000 description 1
- 150000001555 benzenes Chemical class 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- SJYNFBVQFBRSIB-UHFFFAOYSA-N norbornadiene Chemical compound C1=CC2C=CC1C2 SJYNFBVQFBRSIB-UHFFFAOYSA-N 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16651183U JPS6074224U (ja) | 1983-10-27 | 1983-10-27 | 光磁気記録担体 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16651183U JPS6074224U (ja) | 1983-10-27 | 1983-10-27 | 光磁気記録担体 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6074224U JPS6074224U (ja) | 1985-05-24 |
| JPH0216419Y2 true JPH0216419Y2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1990-05-07 |
Family
ID=30364522
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16651183U Granted JPS6074224U (ja) | 1983-10-27 | 1983-10-27 | 光磁気記録担体 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6074224U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0778915B2 (ja) * | 1985-08-19 | 1995-08-23 | ティーディーケイ株式会社 | 光磁気記録媒体の製造方法 |
| JPH0789414B2 (ja) * | 1986-01-31 | 1995-09-27 | シャープ株式会社 | 光学記憶素子 |
-
1983
- 1983-10-27 JP JP16651183U patent/JPS6074224U/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6074224U (ja) | 1985-05-24 |