JPH021629B2 - - Google Patents

Info

Publication number
JPH021629B2
JPH021629B2 JP3827682A JP3827682A JPH021629B2 JP H021629 B2 JPH021629 B2 JP H021629B2 JP 3827682 A JP3827682 A JP 3827682A JP 3827682 A JP3827682 A JP 3827682A JP H021629 B2 JPH021629 B2 JP H021629B2
Authority
JP
Japan
Prior art keywords
processed
chipping
hard
grinding
machining
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP3827682A
Other languages
Japanese (ja)
Other versions
JPS58155157A (en
Inventor
Takashi Myatani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP3827682A priority Critical patent/JPS58155157A/en
Publication of JPS58155157A publication Critical patent/JPS58155157A/en
Publication of JPH021629B2 publication Critical patent/JPH021629B2/ja
Granted legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B1/00Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)

Description

【発明の詳細な説明】 〔発明の技術分野〕 この発明は、硬脆加工材料を研削加工するとき
に発生するチツピングを防止する硬脆材料におけ
るチツピング防止加工方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a chipping prevention processing method for hard and brittle materials that prevents chipping that occurs when grinding hard and brittle materials.

〔発明の技術的背景とその問題点〕[Technical background of the invention and its problems]

一般に窒化シリコンなどのセラミツクス、硝
子、シリコンなどの半導体素材である、硬脆加工
材料を加工(凹部加工、孔あけ加工等)するとき
には能率に優れる砥石を用いた研削加工が採用さ
れる。この研削加工では第1図で示すように硬脆
加工材料aの被加工部bのエツジが集中応力で欠
ける、いわゆるチツピングc,cが発生しやすい
問題を有している。このようなチツピングc,c
が発生すると、被加工部bにおける寸法形状およ
び精度が損なわれ所要の部品としての機能を失つ
てしまう。このことから研削加工分野ではいかに
チツピングc,cの発生を防止するかが課題とさ
れている。しかしながら、従来からチツピング
c,cの発生は避けられないものと考えられ、従
来では以下に述べるチツピング防止加工方法が採
られている。
Generally, when processing hard and brittle materials such as semiconductor materials such as ceramics such as silicon nitride, glass, and silicon (recess machining, hole machining, etc.), grinding using a highly efficient grindstone is used. As shown in FIG. 1, this grinding process has a problem in that the edges of the processed portion b of the hard and brittle material a are likely to chip due to concentrated stress, ie, so-called chipping c, c. Such chipping c, c
If this occurs, the dimensions, shape and accuracy of the processed portion b will be impaired and the required function of the part will be lost. For this reason, in the field of grinding, how to prevent the occurrence of chipping c, c has become an issue. However, it has been considered that the occurrence of chippings c and c is unavoidable, and conventionally, the following chipping prevention processing method has been adopted.

すなわち、砥石の切り込み量を少なくする、砥
石の送りを少なくするとかの変更、あるいは研削
加工を避けて遊離砥粒によるラツピング、ポリシ
リング、噴射加工で加工する技術が講じられてい
る。
That is, techniques are being used to reduce the cutting depth of the grindstone, reduce the feed of the grindstone, or to avoid grinding and instead use lapping, polishing, or jetting using free abrasive grains.

しかしながら、このようなチツピング防止加工
方法の技術によると、砥石の切り込み量および送
りを少なくする加工方法では加工能率の低下が余
儀なくされ、また遊離砥粒を用いた加工方法では
チツピングの発生を防止することができても、反
面加工能率が同様に低下してしまうといつた問題
があり、いずれも有効なものではなかつた。
However, according to such chipping prevention machining method technology, machining methods that reduce the cutting depth and feed of the grinding wheel are forced to reduce machining efficiency, and machining methods that use loose abrasive grains prevent the occurrence of chipping. However, even if it were possible to do so, there was a problem in that the efficiency of machining the other side similarly decreased, and none of them were effective.

〔発明の目的〕[Purpose of the invention]

この発明は上記事情に着目してなされたもので
その目的とするところは、チツピングの発生を伴
うことなく高能率に硬脆加工材料を研削加工する
ことができる硬脆材料におけるチツピング防止加
工方法を提供することにある。
This invention was made in view of the above circumstances, and its purpose is to provide a chipping prevention processing method for hard and brittle materials that can grind hard and brittle materials with high efficiency without causing chipping. It is about providing.

〔発明の概要〕[Summary of the invention]

この発明は、硬脆加工材料の被加工部を除く面
部にマスク部材をマスキングしたのち、被加工部
を遊離砥粒による加工で微小除去加工し、その後
その微小除去加工した部分を通じ被加工部を研削
加工することで、研削加工をチツピングの発生す
る原因となるエツジを有することなく行なえるよ
うにし、チツピングを生じることなく高能率の加
工を達成しようとするものである。
In this invention, after masking the surface of a hard brittle material excluding the part to be processed, the part to be processed is micro-removed by processing with free abrasive grains, and then the part to be processed is removed through the micro-removed part. By performing the grinding process, it is possible to perform the grinding process without having edges that cause chipping, and to achieve highly efficient machining without causing chipping.

〔発明の実施例〕[Embodiments of the invention]

以下、この発明の加工方法をたとえばガラスプ
レートの凹部加工に適用して説明する。
Hereinafter, the processing method of the present invention will be explained by applying it to, for example, processing a concave portion of a glass plate.

第2図中1は板状の硝子で構成された硬脆加工
材料であるプレートで、このプレート1の一側面
には一実鎖線で示す矩形状の被加工部1aが設定
されている。そして、この被加工部1aを凹部加
工することになる。この加工を行なうときには、
まずプレート1の被加工部1aを除く側の面部に
たとえばアルミ製あるいは弾性体からなるマスク
部材2を接着し、第3図aで示すようにプレート
1をマスキングする。こののち、このプレート1
上の被加工部1aを遊離砥粒による加工であるド
ライ(液体)ホーニングなどの噴射加工でチツピ
ングが起きない程度、たとえば100μm、第3図
bで示すように微小除去加工し、荒取りする。こ
こで、こうした加工に際し、第6図に示すように
被加工物1aのエツジ5がマスク部材2の端面か
ら外方に突き出て露出してしまつては次の研削加
工を行なうとき、そのエツジ部分に応力が集中し
てチツピングを発生してしまうが、先に述べたよ
うな遊離砥粒を使つた加工を行なうと、マスク部
材2を遮蔽部として、被加工部1aの表面が加工
されるから、第3図bで示すように、マスク部材
2の端面と被加工部1aの端面とが面一となつた
状態、つまりエツジ5を生じない微小除去加工が
行なわれることになる。なお、3は噴射ノズルで
ある。その後、能力のよいたとえば砥石4を用い
た研削加工で第3図cで示すように微小除去加工
した部分1bを通して被加工部1aを凹部状に中
仕上げする。この中仕上げのときもエツジ5は先
の遊離砥粒を使用した加工のときと同様露出しな
い。ついで、ラツピングなどで最終仕上加工を行
なえば第4図で示す所要の深さ、寸法精度を有し
た凹部加工が行なわれる。
In FIG. 2, reference numeral 1 denotes a plate made of a hard and brittle material made of plate-shaped glass, and on one side of this plate 1, a rectangular workpiece portion 1a shown by a solid chain line is set. Then, this processed portion 1a is processed into a recess. When performing this processing,
First, a mask member 2 made of, for example, aluminum or an elastic material is adhered to the side of the plate 1 excluding the processed portion 1a, and the plate 1 is masked as shown in FIG. 3a. After this, this plate 1
The upper part to be processed 1a is subjected to micro-removal processing such as dry (liquid) honing using free abrasive grains to an extent that no chipping occurs, for example 100 μm, as shown in FIG. 3b, and rough cutting is performed. During such machining, if the edge 5 of the workpiece 1a protrudes outward from the end face of the mask member 2 and is exposed as shown in FIG. 6, when the next grinding process is performed, the edge 5 However, when processing using free abrasive grains as described above, the surface of the processed part 1a is processed using the mask member 2 as a shielding part. As shown in FIG. 3b, the end face of the mask member 2 and the end face of the processed portion 1a are flush with each other, that is, micro-removal processing without producing an edge 5 is performed. Note that 3 is an injection nozzle. Thereafter, the part to be processed 1a is semi-finished into a concave shape through the micro-removed part 1b as shown in FIG. During this semi-finishing, the edges 5 are not exposed as in the previous processing using free abrasive grains. Then, by performing a final finishing process such as wrapping, a concave portion having the required depth and dimensional accuracy as shown in FIG. 4 is obtained.

しかして、チツピングを発生しやすいとされる
研削加工は、あらかじめ噴射加工によつて切り込
まれた微小除去加工部を通して行なわれることに
なり、応力の集中の原困となるエツジ5の露出が
ない状態で所要の研削加工を達成することができ
るようになる。
Therefore, the grinding process, which is said to be likely to cause chipping, is performed through the micro-removal part cut in advance by the jetting process, so there is no exposure of the edge 5, which can cause stress concentration. The required grinding process can be achieved in this state.

したがつて、能率の優れた研削加工を用いて、
エツジ5にチツピングを生じることなくプレート
1を高能率に加工することができる。
Therefore, using highly efficient grinding process,
The plate 1 can be processed with high efficiency without causing chipping on the edges 5.

なお、上述した実施例では遊離砥粒による加工
に噴射加工を採用したが、ラツピング、エツチン
グなどの加工を用いても同様である。
Incidentally, in the above-mentioned embodiment, jet machining was employed for machining using free abrasive grains, but the same effect may be achieved by using machining such as lapping or etching.

また上述した実施例ではこの発明を凹部加工に
採用したが、孔あけ加工にも適用できることはい
うまでもない。なお、第5図a,b,cに孔あけ
の際の加工手順を示す。但し、第5図a,b,c
において上述した実施例と同一構成部品は同一番
号を附してその説明を省略した。
Further, in the embodiments described above, the present invention is applied to machining recesses, but it goes without saying that it can also be applied to machining holes. Note that FIGS. 5a, b, and c show the processing procedure for drilling holes. However, Fig. 5 a, b, c
Components that are the same as those in the embodiment described above are given the same numbers and their explanations are omitted.

〔発明の効果〕〔Effect of the invention〕

以上説明したようにこの発明によれば、被加工
部を除く硬脆加工材料の面部にマスキングを施し
て遊離砥粒による加工で被加工部を微小除去加工
したのち、能率に優れる研削加工で微小除去加工
部分を通して被加工部を加工するようにしたか
ら、応力の集中の伴うエツジのない状態で所要の
研削加工を達成することができるようになる。
As explained above, according to the present invention, after masking the surface of the hard and brittle material excluding the part to be machined and performing micro-removal processing on the part to be processed using free abrasive grains, the highly efficient grinding process Since the part to be machined is machined through the removed part, the required grinding process can be achieved without edges where stress is concentrated.

したがつて、チツピングを生じることなく研削
加工で硬脆加工材料を高能率で加工することがで
きるものである。
Therefore, it is possible to process hard and brittle materials by grinding with high efficiency without causing chipping.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の硬脆加工材料における研削加工
のチツピングの発生を指摘説明した説明図、第2
図はこの発明の一実施例にかかる硬脆加工材料を
示す斜視図、第3図a,b,cはこの発明の一実
施例のチツピング防止加工方法を方法推移に沿つ
て説明した説明図、第4図はその加工方法を終え
たときの硬脆加工材料を示す斜視図、第5図a,
b,cはこの発明を孔あけ加工に適用した他の実
施例を方法推移とともに示す説明図、第6図はエ
ツジの露出を示す断面図である。 1……プレート(硬脆加工材料)、1a……被
加工部、2……マスク部材、3……噴射ノズル
(遊離砥粒による加工)、4……砥石(研削加工)、
5……エツジ。
Figure 1 is an explanatory diagram pointing out and explaining the occurrence of chipping during grinding in conventional hard and brittle processed materials.
The figure is a perspective view showing a hard and brittle processing material according to an embodiment of the present invention, and Figures 3a, b, and c are explanatory diagrams illustrating a chipping prevention processing method according to an embodiment of the present invention along the process progress, Figure 4 is a perspective view showing the hard and brittle processed material after the processing method is completed, Figure 5a,
b and c are explanatory diagrams showing another embodiment in which the present invention is applied to drilling processing, together with the progress of the method, and FIG. 6 is a sectional view showing exposure of an edge. 1... Plate (hard brittle processing material), 1a... Processed part, 2... Mask member, 3... Spray nozzle (processing using free abrasive grains), 4... Grindstone (grinding process),
5...Etsuji.

Claims (1)

【特許請求の範囲】[Claims] 1 被加工部を有した硬脆加工材料の上記被加工
部を除く面部にマスク部材を付着するマスキング
工程と、上記マスキング工程後に上記被加工部に
遊離砥粒を噴射し微小除去加工する噴射加工工程
と、上記噴射加工工程後に上記微小除去加工され
た被加工部を研削加工する研削加工工程とからな
ることを特徴とする硬脆材料におけるチツピング
防止加工方法。
1. A masking step in which a mask member is attached to a surface of a hard brittle material having a to-be-processed portion other than the to-be-processed portion, and a jetting process in which free abrasive grains are injected onto the to-be-processed portion to perform micro-removal processing after the masking step. and a grinding process of grinding the micro-removed part after the injection process.
JP3827682A 1982-03-11 1982-03-11 Chipping-proof machining method of brittle material Granted JPS58155157A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3827682A JPS58155157A (en) 1982-03-11 1982-03-11 Chipping-proof machining method of brittle material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3827682A JPS58155157A (en) 1982-03-11 1982-03-11 Chipping-proof machining method of brittle material

Publications (2)

Publication Number Publication Date
JPS58155157A JPS58155157A (en) 1983-09-14
JPH021629B2 true JPH021629B2 (en) 1990-01-12

Family

ID=12520781

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3827682A Granted JPS58155157A (en) 1982-03-11 1982-03-11 Chipping-proof machining method of brittle material

Country Status (1)

Country Link
JP (1) JPS58155157A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4918229B2 (en) * 2005-05-31 2012-04-18 信越半導体株式会社 Manufacturing method of bonded wafer
JP5023113B2 (en) * 2009-07-31 2012-09-12 ブリヂストンプラントエンジニアリング株式会社 Thin glass processing equipment
JP5653234B2 (en) * 2011-01-21 2015-01-14 株式会社ディスコ Hard substrate grinding method

Also Published As

Publication number Publication date
JPS58155157A (en) 1983-09-14

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