JPH0215922B2 - - Google Patents
Info
- Publication number
- JPH0215922B2 JPH0215922B2 JP55046682A JP4668280A JPH0215922B2 JP H0215922 B2 JPH0215922 B2 JP H0215922B2 JP 55046682 A JP55046682 A JP 55046682A JP 4668280 A JP4668280 A JP 4668280A JP H0215922 B2 JPH0215922 B2 JP H0215922B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- metal
- nickel
- disk
- head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910052751 metal Inorganic materials 0.000 claims description 37
- 239000002184 metal Substances 0.000 claims description 37
- 238000003860 storage Methods 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 12
- 230000001681 protective effect Effects 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 229910018104 Ni-P Inorganic materials 0.000 claims description 4
- 229910018536 Ni—P Inorganic materials 0.000 claims description 4
- 229910045601 alloy Inorganic materials 0.000 claims description 3
- 239000000956 alloy Substances 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- 230000001590 oxidative effect Effects 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 229910052726 zirconium Inorganic materials 0.000 claims description 3
- 229910009038 Sn—P Inorganic materials 0.000 claims description 2
- 229910052742 iron Inorganic materials 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- 229910052709 silver Inorganic materials 0.000 claims description 2
- 229910020674 Co—B Inorganic materials 0.000 claims 1
- 229910020515 Co—W Inorganic materials 0.000 claims 1
- 229910052721 tungsten Inorganic materials 0.000 claims 1
- 229910001096 P alloy Inorganic materials 0.000 description 20
- 229910044991 metal oxide Inorganic materials 0.000 description 19
- 150000004706 metal oxides Chemical class 0.000 description 19
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 description 14
- IGOJDKCIHXGPTI-UHFFFAOYSA-N [P].[Co].[Ni] Chemical compound [P].[Co].[Ni] IGOJDKCIHXGPTI-UHFFFAOYSA-N 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 10
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 6
- 238000007747 plating Methods 0.000 description 5
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 239000001569 carbon dioxide Substances 0.000 description 3
- 229910002092 carbon dioxide Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000001678 irradiating effect Effects 0.000 description 3
- 230000010355 oscillation Effects 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 239000010979 ruby Substances 0.000 description 3
- 229910001750 ruby Inorganic materials 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000011232 storage material Substances 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 238000001029 thermal curing Methods 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- WAIPAZQMEIHHTJ-UHFFFAOYSA-N [Cr].[Co] Chemical class [Cr].[Co] WAIPAZQMEIHHTJ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 150000004692 metal hydroxides Chemical class 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- HRXKRNGNAMMEHJ-UHFFFAOYSA-K trisodium citrate Chemical compound [Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O HRXKRNGNAMMEHJ-UHFFFAOYSA-K 0.000 description 1
- 229940038773 trisodium citrate Drugs 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/72—Protective coatings, e.g. anti-static or antifriction
Landscapes
- Preventing Corrosion Or Incrustation Of Metals (AREA)
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Description
【発明の詳細な説明】
本発明は磁気的記憶装置(磁気デイスク装置ま
たは磁気ドラム装置等)に用いられる磁気記憶体
の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of manufacturing a magnetic storage body used in a magnetic storage device (such as a magnetic disk device or a magnetic drum device).
一般に記録再生磁気ヘツド(以下ヘツドと呼
ぶ)、と磁気記憶体とを構成部とする磁気記憶装
置の記録再生方法には次のような方法がある。す
なわち操作開始時にヘツドと磁気記憶体面とを接
触状態でセツトした後、前記磁気記憶体に所要の
回転を与えることにより前記ヘツドと前記磁気記
憶体面との間に空気層分の空間を作り、この状態
で記録再生をする方法である(コンタクト・スタ
ート・ストツプ方式。以下CSS方式と呼ぶ)。こ
の方法では操作終了時に磁気記憶体の回転が止ま
り、この時ヘツドと磁気記憶体面は操作開始時と
同様に接触摩擦状態にある。 In general, there are the following methods for recording and reproducing a magnetic storage device comprising a recording and reproducing magnetic head (hereinafter referred to as a head) and a magnetic storage body. That is, after the head and the magnetic storage surface are set in contact at the start of operation, a space corresponding to an air layer is created between the head and the magnetic storage surface by giving the magnetic storage the required rotation, and this This is a method of recording and reproducing in the current state (contact start-stop method, hereinafter referred to as CSS method). In this method, at the end of the operation, the magnetic storage body stops rotating, and at this time the head and the magnetic storage body surface are in a frictional state of contact, as at the beginning of the operation.
これらの接触摩擦状態におけるヘツドと磁気記
憶体の間に生じる摩擦力は、ヘツドおよび磁気記
憶体を摩耗させついにはヘツドおよび金属磁性媒
体に傷を生じせしめることがある。また前記接触
摩擦状態においてヘツドのわずかな姿勢の変化が
ヘツドにかかる荷重を不均一にさせヘツドおよび
磁気記憶体表面に傷を作ることもある。 The frictional force generated between the head and the magnetic storage material under these contact friction conditions can wear out the head and the magnetic storage material and may eventually cause scratches on the head and the metal magnetic medium. Further, in the contact friction state, a slight change in the posture of the head may cause the load applied to the head to become uneven, causing scratches on the surface of the head and the magnetic storage body.
また更に記録再生中に突発的にヘツドが磁気記
憶体に接触しヘツドと磁気記憶体間に大きな摩擦
力が働き、ヘツドおよび磁気記憶体が破壊される
ことがしばしば起こる。この様なヘツドと磁気記
憶体との接触摩擦、接触摩耗および接触破壊から
ヘツドおよび磁気記憶体を保護するために磁気記
憶体の表面に保護膜を被覆することが必要であ
る。 Furthermore, during recording and reproducing, the head suddenly comes into contact with the magnetic storage body, and a large frictional force acts between the head and the magnetic storage body, often resulting in destruction of the head and the magnetic storage body. In order to protect the head and the magnetic memory from such contact friction, contact wear and contact breakage between the head and the magnetic memory, it is necessary to coat the surface of the magnetic memory with a protective film.
従来より種々の保護膜が提案されており、その
うちの1つに磁気記憶体の記憶媒体として用いら
れる金属磁性媒体の表面を化成処理したのち200
〜290℃の温度で焼成して金属酸化物からなる保
護膜を形成させる方法が知られている(特公昭49
−29445号公報、特公昭50−30443号公報参照)。 A variety of protective films have been proposed in the past, and one of them is a 200% protective film that has been chemically treated on the surface of a metal magnetic medium used as a storage medium in a magnetic storage body.
A method is known in which a protective film made of metal oxide is formed by firing at a temperature of ~290°C (Japanese Patent Publication No. 49
(Refer to Publication No.-29445 and Japanese Patent Publication No. 50-30443).
しかしこの方法では化成処理による金属磁性媒
体の局部的な腐食が生じるうえに高温で焼成する
為に磁気記憶体を構成する各被覆層に熱膨張係数
の差によるクラツクあるいはそりが生じ、また、
被覆層の1つであるニツケル−燐の帯磁をもたら
す。またさらに金属磁性媒体の磁気等性をも損な
うことが多い。 However, with this method, local corrosion of the metal magnetic medium occurs due to chemical conversion treatment, and since it is fired at a high temperature, cracks or warpage occur in each coating layer that constitutes the magnetic storage body due to differences in thermal expansion coefficients.
One of the coating layers, nickel-phosphorus, is magnetized. Moreover, it often impairs the magnetic properties of the metal magnetic medium.
さらに別の方法として、金属磁性媒体の上に非
磁性のニツケルまたはコバルト合金を被覆しその
表面を電気化学的に酸化する方法がある(特開昭
52−80804号公報参照)。しかし電気化学的に形成
した金属酸化物は金属水酸化物あるいは含水金属
酸化物であり、高温酸化によつて作られた無水金
属酸化物に比べ強度的に弱く、また、耐食性にも
弱い欠点がある。 Yet another method is to coat a non-magnetic nickel or cobalt alloy on a metal magnetic medium and electrochemically oxidize the surface (Japanese Patent Application Laid-Open No.
(See Publication No. 52-80804). However, electrochemically formed metal oxides are metal hydroxides or hydrated metal oxides, which have weaker strength and lower corrosion resistance than anhydrous metal oxides made by high-temperature oxidation. be.
本発明の目的は上記の高温焼成に伴なう弊害を
もたらさず、かつ、強度が大きく耐食性に優れた
無水の金属酸化物を保護膜として形成される磁気
記憶体の製造方法を提供することにある。 An object of the present invention is to provide a method for manufacturing a magnetic memory body which does not cause the above-mentioned disadvantages associated with high-temperature firing, and which is formed using an anhydrous metal oxide as a protective film, which has high strength and excellent corrosion resistance. be.
すなわち、本発明は鏡面を有する下地体の上に
金属磁性媒体を被覆し、その媒体又はその上に被
覆された別の金属の表面にレーザー光を照射して
金属酸化物を形成させることを特徴としている。
金属酸化物を形成するために表面に被覆される金
属としては、Co、Ni、Fe、Cr、Al、Cu、Zr、
Ti、Ag、Ni−P、Co−Ni−P、Co−Cr、Co−
B、Ni−Sn−P、N−W若しくはNi−B又はこ
れらの組合わせによる合金を例示することができ
る。 That is, the present invention is characterized in that a metal magnetic medium is coated on a base body having a mirror surface, and the surface of the medium or another metal coated thereon is irradiated with laser light to form a metal oxide. It is said that
Metals coated on the surface to form metal oxides include Co, Ni, Fe, Cr, Al, Cu, Zr,
Ti, Ag, Ni-P, Co-Ni-P, Co-Cr, Co-
Examples include alloys of B, Ni-Sn-P, N-W, Ni-B, or a combination thereof.
次に図面を参照して本発明を詳細に説明する。 Next, the present invention will be explained in detail with reference to the drawings.
第1,2図は磁気記憶体の部分断面図である。
第1図において磁気記憶体の基盤1としてアルミ
合金が軽くて加工性が良く安価なことから最も良
く用いられるが、場合によつてはチタン合金が用
いられることもある。基盤表面は機械加工により
小さなうねり(円周方向で50μm以下、半径方向
で100μm以下)を有する面に仕上げられる。 1 and 2 are partial cross-sectional views of the magnetic storage body.
In FIG. 1, aluminum alloy is most often used as the base 1 of the magnetic memory body because it is light, easy to work with, and inexpensive, but titanium alloy may also be used in some cases. The base surface is finished by machining into a surface with small undulations (50 μm or less in the circumferential direction and 100 μm or less in the radial direction).
次にこの基盤1の上に下地体2としてニツケル
−燐合金がめつきにより被覆され、この下地体2
の表面は機械的研摩により表面粗さ0.03μm
(Rmax)以下に鏡面仕上げされる。 Next, a nickel-phosphorus alloy is coated on this base 1 as a base body 2 by plating, and this base body 2
The surface has a surface roughness of 0.03μm by mechanical polishing.
Mirror finish is achieved below (Rmax).
次に上記下地体2の鏡面研磨上に金属磁性媒体
3としてコバルト−ニツケル−燐合金がめつきに
より被覆される。 Next, a cobalt-nickel-phosphorus alloy is coated on the mirror-polished base body 2 as a metal magnetic medium 3 by plating.
次にその金属磁性媒体3の表面にレーザー光6
を照射することによりその媒体3の表面が金属酸
化物4に変換され保護膜が形成される。 Next, a laser beam 6 is applied to the surface of the metal magnetic medium 3.
By irradiating the medium 3 with , the surface of the medium 3 is converted into a metal oxide 4 and a protective film is formed.
また、第2図においては金属磁性媒体3の上に
金属膜5が被覆され、次にその金属膜5の表面に
レーザー光6を照射することによりその金属膜5
の全て又は表面が金属酸化物41に変換され保護
膜が形成される。 Further, in FIG. 2, a metal film 5 is coated on the metal magnetic medium 3, and then the surface of the metal film 5 is irradiated with a laser beam 6.
All or the surface thereof is converted into metal oxide 41 to form a protective film.
酸化は第1図の場合、金属磁性媒体3が0.05〜
0.10μm残る程度に留る必要があるが、第2図の
場合は金属膜5を全て酸化してもかまわない。 In the case of Fig. 1, the oxidation of the metal magnetic medium 3 is from 0.05 to
Although it is necessary that only 0.10 μm remain, in the case of FIG. 2, the metal film 5 may be completely oxidized.
本発明によるレーザー光による金属酸化物の形
成は金属酸化物のレーザー光の吸収による熱焼成
および熱硬化以外に下地体2として用いられるニ
ツケル−燐合金を帯磁させたりあるいは基盤1と
下地体2の熱膨張係数の差によるクラツク、剥離
あるいはそりをもたらさないことが優れた特徴の
1つである。 Formation of a metal oxide by laser light according to the present invention involves magnetizing the nickel-phosphorus alloy used as the base body 2, or by magnetizing the nickel-phosphorus alloy used as the base body 2, or by magnetizing the nickel-phosphorus alloy used as the base body 2, in addition to thermal baking and thermosetting by the absorption of laser light by the metal oxide. One of its excellent features is that it does not cause cracks, peeling, or warping due to differences in thermal expansion coefficients.
すなわち、レーザー光の高エネルギー密度と、
金属酸化物の高いレーザー光吸収と、金属の高い
レーザー光反射率により、金属酸化物と下地体と
の間に高い温度勾配が生じて、金属の酸化物の熱
焼成および熱硬化と同時に下地体の帯磁、クラツ
クそりおよび剥離を防止するという二重の効果を
もたらすことが出来る。 In other words, the high energy density of laser light and
Due to the high laser light absorption of metal oxides and the high laser light reflectance of metals, a high temperature gradient is created between the metal oxide and the substrate, which causes thermal sintering and thermal curing of the metal oxide and simultaneous thermal curing of the substrate. This has the dual effect of preventing magnetization, crack warping, and peeling.
さらに金属表面にレーザー光を照射する工程を
酸素あるいはオゾンなどの酸化性雰囲気で行なう
ことにより、金属の酸化速度を速めることが出来
る。すなわち、金属表面はレーザー光を非常に良
く反射する一方、金属酸化物はレーザー光を良く
吸収するので金属表面を酸化雰囲気中でレーザー
光照射することにより急速に金属酸化物の形成が
進行する。 Furthermore, the oxidation rate of the metal can be increased by performing the step of irradiating the metal surface with laser light in an oxidizing atmosphere such as oxygen or ozone. That is, while metal surfaces reflect laser light very well, metal oxides absorb laser light well, so by irradiating the metal surface with laser light in an oxidizing atmosphere, the formation of metal oxides progresses rapidly.
次に実施例および比較例により本発明を詳細に
説明する。 Next, the present invention will be explained in detail with reference to Examples and Comparative Examples.
実施例 1
基盤1として施盤加工および熱矯正によつて十
分小さなうねり(円周方向で50μm以下および半
径方向で10μm以下)をもつた面に仕上げられた
デイスク状アルミニウム合金盤上に下地体2とし
てニツケル−燐合金を約50μmの厚さにめつき
し、このニツケル−燐めつき膜を表面粗さ0.02μ
m、厚さ30μmまで鏡面研磨仕上げした。次にこ
のニツケル−燐めつき膜の上に金属磁性媒体3と
してコバルト−ニツケル−燐合金を0.15μmの厚
さにめつきした。Example 1 As the substrate 1, a disc-shaped aluminum alloy plate whose surface was finished with sufficiently small waviness (50 μm or less in the circumferential direction and 10 μm or less in the radial direction) by lathe machining and heat straightening was used as the base body 2. Nickel-phosphorus alloy is plated to a thickness of approximately 50μm, and this nickel-phosphorus plating film has a surface roughness of 0.02μm.
Mirror polished to a thickness of 30 μm. Next, a cobalt-nickel-phosphorus alloy was plated on the nickel-phosphorus plating film to a thickness of 0.15 μm as a metal magnetic medium 3.
次にコバルト−ニツケル−燐合金が被覆された
デイスク状円盤を200rpmで回転させつつ出力
250W、ビーム直径0.15mmの連続発振炭酸ガスレ
ーザーを半径方向に1分間に20mmの速さでコバル
ト−ニツケルー燐合金面上に空気中で照射して、
コバルトーニツケルー燐合金の表面にその合金の
酸化物を形成して磁気デイスクを作つた。 Next, a disk-shaped disk coated with cobalt-nickel-phosphorus alloy is rotated at 200 rpm and output.
A 250W continuous wave carbon dioxide laser with a beam diameter of 0.15mm is irradiated in the radial direction at a speed of 20mm per minute onto a cobalt-nickel phosphorus alloy surface in air.
A magnetic disk was made by forming an oxide of the cobalt-nickel-phosphorus alloy on the surface of the alloy.
実施例 2
実施例1と同様にして、但し、レーザー光源と
して50MW、ビーム直径30mmのパルス発振炭酸ガ
スレーザーを用いて磁気デイスクを作つた。Example 2 A magnetic disk was manufactured in the same manner as in Example 1, except that a pulsed carbon dioxide laser of 50 MW and a beam diameter of 30 mm was used as the laser light source.
実施例 3
実施例1と同様にして、但し、レーザー光源と
して100MW、ビーム直径40mmのパレス発振ルビ
ーレーザーを用いて磁気デイスクを作つた。Example 3 A magnetic disk was manufactured in the same manner as in Example 1, except that a pulse oscillation ruby laser of 100 MW and a beam diameter of 40 mm was used as the laser light source.
実施例 4
実施例1と同様にして、但し、レーザー光源と
して10MW、ビーム直径10mmのパルス発振YAG
レーザーを用いて磁気デイスクを作つた。Example 4 Same as Example 1, except that pulse oscillation YAG with 10 MW and beam diameter of 10 mm was used as the laser light source.
Created a magnetic disk using a laser.
実施例 5
実施例1と同様にして、但し、酸素雰囲気中で
レーザー照射を行ない磁気デイスクを作つた。Example 5 A magnetic disk was produced in the same manner as in Example 1, except that laser irradiation was performed in an oxygen atmosphere.
実施例 6
実施例3と同様にして、但し、オゾン雰囲気中
でレーザー照射を行ない磁気デイスクを作つた。Example 6 A magnetic disk was produced in the same manner as in Example 3, except that laser irradiation was performed in an ozone atmosphere.
実施例 7
実施例1と同様にして、但し、金属磁性媒体3
としてコバルト−クロム合金を被覆したものを用
いて磁気デイスクを作つた。Example 7 Same as Example 1, except that metal magnetic medium 3
A magnetic disk was made using a cobalt-chromium alloy coating.
実施例 8
実施例7と同様にして、但し、レーザー光源と
してパワー密度6.3×106W/cm2のパルス発振ルビ
ーレーザーを用いて10μs照射を酸素雰囲気中で行
ない磁気デイスクを作つた。Example 8 A magnetic disk was produced in the same manner as in Example 7, except that a pulsed ruby laser with a power density of 6.3×10 6 W/cm 2 was used as the laser light source and irradiation was performed for 10 μs in an oxygen atmosphere.
実施例 9
実施例7と同様にして、但し、レーザー光源と
してパワー密度1×107W/cm2のパルス発振YAG
レーザーを用いて50μs照射をオゾン雰囲気中で行
ない磁気デイスクを作つた。Example 9 Same as Example 7, except that pulse oscillation YAG with a power density of 1×10 7 W/cm 2 was used as the laser light source.
A magnetic disk was fabricated using a laser for 50 μs irradiation in an ozone atmosphere.
実施例 10
実施例1と同様にして、但し、金属磁性媒体3
としてコバルト−ニツケルー燐合金を0.05μmの
厚さにめつきし、その上に金属膜5としてニツケ
ル−燐合金を0.05μmの厚さにめつきした。Example 10 Same as Example 1, except that metal magnetic medium 3
A cobalt-nickel-phosphorus alloy was plated to a thickness of 0.05 .mu.m as a metal film 5, and a nickel-phosphorus alloy was plated thereon to a thickness of 0.05 .mu.m.
次にそのニツケル−燐合金の表面にパワー密度
1.4×106W/cm2の連続発振炭酸ガスレーザーを空
気中で4ms照射してニツケル−燐合金の酸化物
を形成して磁気デイスクを作つた。 Next, the power density is applied to the surface of the nickel-phosphorus alloy.
A 1.4×10 6 W/cm 2 continuous wave carbon dioxide laser was irradiated in the air for 4 ms to form a nickel-phosphorus alloy oxide to produce a magnetic disk.
実施例 11
実施例10と同様にして、但し、酸素雰囲気中で
レーザー照射を行ない磁気デイスクを作つた。Example 11 A magnetic disk was produced in the same manner as in Example 10, except that laser irradiation was performed in an oxygen atmosphere.
実施例 12
実施例10と同様にして、但し、レーザー光源と
してパワー密度6.3×106W/cm2のパルス発振ルビ
ーレーザーを用いてオゾン雰囲気中でレーザー照
射を行ない磁気デイスクを作つた。Example 12 A magnetic disk was produced in the same manner as in Example 10, except that a pulsed ruby laser with a power density of 6.3×10 6 W/cm 2 was used as the laser light source and laser irradiation was performed in an ozone atmosphere.
実施例 13
実施例10と同様にして、但し、金属膜5として
Crを0.1μmの厚さにめつきしたものを用いて磁気
デイスクを作つた。Example 13 Same as Example 10, except that as the metal film 5
A magnetic disk was made using Cr plated to a thickness of 0.1 μm.
実施例 14
実施例10と同様にして、但し、金属膜5として
アルミニウムを0.05μmの厚さに被覆したものを
用いて磁気デイスクを作つた。Example 14 A magnetic disk was fabricated in the same manner as in Example 10, except that the metal film 5 was coated with aluminum to a thickness of 0.05 μm.
実施例 15
実施例10と同様にして、但し、金属膜5として
ジルコニウムを0.10μmの厚さに被覆したものを
用いて磁気デイスクを作つた。Example 15 A magnetic disk was fabricated in the same manner as in Example 10, except that the metal film 5 was coated with zirconium to a thickness of 0.10 μm.
実施例 16
実施例10と同様にして、但し、金属膜5として
チタンを0.10μmの厚さに被覆したものを用いて
磁気デイスクを作つた。Example 16 A magnetic disk was fabricated in the same manner as in Example 10, except that the metal film 5 was coated with titanium to a thickness of 0.10 μm.
実施例 17
実施例10と同様にして、但し、金属膜5として
銅を0.10μmの厚さにめつきしたものを用いて磁
気デイスクを作つた。Example 17 A magnetic disk was fabricated in the same manner as in Example 10, except that the metal film 5 was plated with copper to a thickness of 0.10 μm.
比較例 1
実施例1と同様にして作つた金属磁性媒体とし
てコバルト−ニツケル−燐合金を被覆したデイス
ク状円盤を2g/の硝酸と、20g/のクエン
酸3ナトリウムを含む水溶液中に2分間浸漬した
後、水洗、乾燥し、次に250℃で空気中で2時間
加熱して磁気デイスクを作つた。Comparative Example 1 A disk-shaped disk coated with a cobalt-nickel-phosphorus alloy as a metal magnetic medium prepared in the same manner as in Example 1 was immersed for 2 minutes in an aqueous solution containing 2 g of nitric acid and 20 g of trisodium citrate. After that, it was washed with water, dried, and then heated in air at 250°C for 2 hours to make a magnetic disk.
比較例 2
実施例1と同様にして作つた金属磁性媒体とし
てコバルト−ニツケル−燐合金を被覆したデイス
ク状円盤を空気中で275℃で2時間焼成加熱して
磁気デイスクを作つた。Comparative Example 2 A disk-shaped disk coated with a cobalt-nickel-phosphorus alloy as a metal magnetic medium produced in the same manner as in Example 1 was fired and heated in air at 275° C. for 2 hours to produce a magnetic disk.
比較例 3
実施例1と同様にして作つた金属磁性媒体とし
てコバルト−ニツケル−燐合金を被覆したデイス
ク状円盤の上にニツケル−燐合金をめつきにより
被覆し全体を10%硫酸溶液中に浸漬し、ニツケル
−燐合金の表面を次の条件で電気化学的に酸化し
た。Comparative Example 3 A disk-shaped disk coated with a cobalt-nickel-phosphorus alloy was coated with a cobalt-nickel-phosphorus alloy as a metal magnetic medium prepared in the same manner as in Example 1.The disk-shaped disk was coated with a nickel-phosphorus alloy by plating, and the entire disc was immersed in a 10% sulfuric acid solution. Then, the surface of the nickel-phosphorus alloy was electrochemically oxidized under the following conditions.
陽極;デイスク状円盤、陰極;ステンレス板
温度;室温 陽極電流密度;1.5〜5.5A/dm2
実施例1〜17および比較例1〜3で示した各磁
気デイスクの表面に形成された無水金属酸化物あ
るいは含水金属酸化物の強度を0.03Rサフアイア
針による引掻試験により測定したところ、比較例
1、2、3においてそれぞれ荷重30g、40g、10
gで表面に引掻傷が生じたが実施例1〜9では60
gまで、実施例10〜17では60〜80gまで引掻傷は
生じなかつた。Anode: disk-shaped disk, cathode: stainless steel plate Temperature: room temperature Anode current density: 1.5 to 5.5 A/ dm 2Anhydrous metal oxide formed on the surface of each magnetic disk shown in Examples 1 to 17 and Comparative Examples 1 to 3 The strength of the material or hydrated metal oxide was measured by a scratch test using a 0.03R sapphire needle. In Comparative Examples 1, 2, and 3, the strength was measured at a load of 30 g, 40 g, and 10 g.
Scratches occurred on the surface at 60 g in Examples 1 to 9.
In Examples 10-17, no scratches occurred up to 60-80 g.
また実施例1〜17の磁気デイスクを用いてCSS
方式のテストを1万回繰り返したが全く傷は生じ
なかつた。一方、比較例1、2の磁気デイスクは
約5000回、比較例3では約500回のCSSの繰り返
しでヘツドクラツシユを起こした。 Furthermore, using the magnetic disks of Examples 1 to 17, CSS
The method was tested 10,000 times and no scratches appeared. On the other hand, head crash occurred in the magnetic disks of Comparative Examples 1 and 2 after about 5000 CSS cycles, and in Comparative Example 3 after about 500 CSS cycles.
また各磁気デイスクの磁気特性を調べたところ
実施例1〜17の磁気デイスクには磁気特性の変化
は無かつたが、比較例1、2の磁気デイスクは下
地体として用いたニツケル−燐が帯磁してヘツド
からの出力電圧が50%減少した。 In addition, when the magnetic properties of each magnetic disk were investigated, there was no change in the magnetic properties of the magnetic disks of Examples 1 to 17, but the magnetic disks of Comparative Examples 1 and 2 had nickel-phosphorus used as the base material, which was magnetized. The output voltage from the head was reduced by 50%.
また湿度80%、温度40℃で120時間耐湿試験を
行なつたところ、比較例1、2、3ではそれぞれ
約50倍、10倍、50倍程度ドロツプアウトが増加し
たが実施例1〜17の磁気デイスクではほとんど増
加は見られなかつた。 In addition, when a humidity test was conducted for 120 hours at a humidity of 80% and a temperature of 40°C, the dropout increased by about 50 times, 10 times, and 50 times in Comparative Examples 1, 2, and 3, respectively, but in Examples 1 to 17, the dropout Almost no increase was observed in disks.
以上のことから本発明の磁気記憶体の製造方法
によつて製造した磁気デイスクはより優れた信頼
性を有していることが分つた。 From the above, it was found that the magnetic disk manufactured by the method for manufacturing a magnetic storage body of the present invention has superior reliability.
第1,2図はそれぞれ本発明により製造される
磁気記憶体を示す部分断面図である。
1は基盤、2は下地体、3は金属磁性媒体、4
は金属酸化物、5は金属膜、6はレーザー光であ
る。
FIGS. 1 and 2 are partial cross-sectional views showing magnetic storage bodies manufactured according to the present invention, respectively. 1 is a base, 2 is a base body, 3 is a metal magnetic medium, 4
is a metal oxide, 5 is a metal film, and 6 is a laser beam.
Claims (1)
化性雰囲気中でレーザー光を照射してその表面金
属の酸化物からなる保護膜を付与することを特徴
とする磁気記憶体の製造方法。 2 金属がCo、Ni、Fe、Cr、Al、Cu、Zr、Ti、
Ag、Ni−P、Co−P、Co−Ni−P、Co−Cr、
Co−W、Co−B、Ni−Sn−P、Ni−W若しく
はNi−B又はこれらの組合わせによる合金であ
る特許請求の範囲第1項に記載の磁気記憶体の製
造方法。[Claims] 1. A magnetic storage body having a metal surface, which is characterized in that the surface thereof is irradiated with laser light in an oxidizing atmosphere to provide a protective film made of an oxide of the surface metal. manufacturing method. 2 The metal is Co, Ni, Fe, Cr, Al, Cu, Zr, Ti,
Ag, Ni-P, Co-P, Co-Ni-P, Co-Cr,
2. The method for manufacturing a magnetic memory body according to claim 1, wherein the material is an alloy of Co-W, Co-B, Ni-Sn-P, Ni-W, Ni-B, or a combination thereof.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4668280A JPS56143538A (en) | 1980-04-09 | 1980-04-09 | Manufacture of magnetic storage body |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4668280A JPS56143538A (en) | 1980-04-09 | 1980-04-09 | Manufacture of magnetic storage body |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56143538A JPS56143538A (en) | 1981-11-09 |
JPH0215922B2 true JPH0215922B2 (en) | 1990-04-13 |
Family
ID=12754143
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4668280A Granted JPS56143538A (en) | 1980-04-09 | 1980-04-09 | Manufacture of magnetic storage body |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56143538A (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6018388A (en) * | 1983-07-11 | 1985-01-30 | Dainippon Printing Co Ltd | Thermal magnetic recording medium |
JPS6113425A (en) * | 1984-06-29 | 1986-01-21 | Nec Corp | Magnetic recording medium and its production |
JP2513597B2 (en) * | 1985-02-04 | 1996-07-03 | 富士通株式会社 | Perpendicular magnetic recording |
JPH0758542B2 (en) * | 1985-10-31 | 1995-06-21 | 帝人株式会社 | Thin film type magnetic recording medium |
-
1980
- 1980-04-09 JP JP4668280A patent/JPS56143538A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS56143538A (en) | 1981-11-09 |
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