JPS6250884B2 - - Google Patents

Info

Publication number
JPS6250884B2
JPS6250884B2 JP16593379A JP16593379A JPS6250884B2 JP S6250884 B2 JPS6250884 B2 JP S6250884B2 JP 16593379 A JP16593379 A JP 16593379A JP 16593379 A JP16593379 A JP 16593379A JP S6250884 B2 JPS6250884 B2 JP S6250884B2
Authority
JP
Japan
Prior art keywords
magnetic
reflective layer
coated
head
medium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP16593379A
Other languages
Japanese (ja)
Other versions
JPS5690424A (en
Inventor
Masahiro Yanagisawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP16593379A priority Critical patent/JPS5690424A/en
Priority to US06/192,566 priority patent/US4380558A/en
Priority to DE19803050791 priority patent/DE3050791C2/en
Priority to DE19803050525 priority patent/DE3050525C2/en
Priority to DE3037168A priority patent/DE3037168C2/en
Publication of JPS5690424A publication Critical patent/JPS5690424A/en
Publication of JPS6250884B2 publication Critical patent/JPS6250884B2/ja
Granted legal-status Critical Current

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  • Magnetic Record Carriers (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Description

【発明の詳細な説明】 本発明は磁気デイスク装置、磁気ドラム装置な
どの磁気的記憶装置に用いられる磁気記憶体およ
びその製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a magnetic storage body used in a magnetic storage device such as a magnetic disk device or a magnetic drum device, and a method for manufacturing the same.

一般に記録再生磁気ヘツド(以下ヘツドと呼
ぶ)と磁気記憶体とを構成部とする磁気記憶装置
の記録再生方法には次のような方法がある。すな
わち操作開始時にヘツドと磁気記憶体面とを接触
状態でセツトした後、前記磁気記憶体に所要の回
転を与えることにより前記ヘツドと前記磁気記憶
体面との間に空気層分の空間を作り、この状態で
記録再生をする方法である(コンタクト・スター
ト・ストツプ方式。以下CSS方式と呼ぶ)。この
方法では操作終了時に磁気記憶体の回転が止ま
り、この時ヘツドと磁気記憶体面は操作開始時と
同様に接触摩擦状態にある。
In general, there are the following methods for recording and reproducing a magnetic storage device comprising a recording and reproducing magnetic head (hereinafter referred to as a head) and a magnetic storage body. That is, after the head and the magnetic storage surface are set in contact at the start of operation, a space corresponding to an air layer is created between the head and the magnetic storage surface by giving the magnetic storage the required rotation, and this This is a method of recording and reproducing in the current state (contact start-stop method, hereinafter referred to as the CSS method). In this method, the rotation of the magnetic storage body stops at the end of the operation, and at this time the head and the surface of the magnetic storage body are in the same frictional state as at the beginning of the operation.

これらの接触摩擦状態におけるヘツドと磁気記
憶体の間に生じる摩擦力は、ヘツドおよび磁気記
憶体を摩耗させついにはヘツドおよび金属磁性薄
膜媒体に傷を生じさせることがある。また前記接
触摩擦状態においてヘツドのわずかな姿勢の変化
がヘツドにかゝる荷重を不均一にさせヘツドおよ
び磁気記憶体表面に傷を作ることもある。
The frictional force generated between the head and the magnetic storage material under these contact friction conditions may wear out the head and the magnetic storage material, and may eventually cause scratches on the head and the metal magnetic thin film medium. Further, in the contact friction state, a slight change in the posture of the head may cause the load on the head to become uneven, causing scratches on the surface of the head and the magnetic storage body.

また更に記録再生中に突発的にヘツドが磁気記
憶体に接触しヘツドと磁気記憶体間に大きな摩擦
力が働き、ヘツドおよび磁気記憶体が破壊される
ことがしばしば起こる。このようなヘツドと磁気
記憶体との接触摩擦、接触摩耗および接触破壊か
らヘツドおよび磁気記憶体を保護するために磁気
記憶体の表面に保護膜を被覆することが必要であ
る。
Furthermore, during recording and reproducing, the head suddenly comes into contact with the magnetic storage body, and a large frictional force acts between the head and the magnetic storage body, often resulting in destruction of the head and the magnetic storage body. In order to protect the head and the magnetic memory from such contact friction, contact wear and contact breakage between the head and the magnetic memory, it is necessary to coat the surface of the magnetic memory with a protective film.

従来より種々の保護膜が提案されているが、前
記接触摩擦、接触摩耗又は接触破壊に対し有効な
保護膜として硬度が高くかつ量産性に優れたポリ
珪酸が既に提案されている(特開昭52−20804号
公報参照。)。それによつても前記接触摩擦などの
現象に対して磁気記憶体を保護することができる
が、上記接触摩擦などの現象に対する信頼性は高
ければ高い程望ましく、常に信頼性の向上が望ま
れている。
Various protective films have been proposed in the past, and polysilicic acid, which has high hardness and is easy to mass-produce, has already been proposed as a protective film that is effective against contact friction, contact wear, and contact breakage (Japanese Patent Application Laid-Open No. (See Publication No. 52-20804.) Although this also protects the magnetic memory against phenomena such as the contact friction, the higher the reliability with respect to such phenomena as the contact friction, the more desirable it is, and improvements in reliability are always desired. .

本発明の目的は上記接触摩擦などの現象に対し
てより良く金属磁性薄膜媒体を保護する保護膜を
有し量産性に優れた磁気記憶体およびその製造方
法を提供することにある。
An object of the present invention is to provide a magnetic memory body having a protective film that better protects a metal magnetic thin film medium against phenomena such as the above-mentioned contact friction, and which is excellent in mass production, and a method for manufacturing the same.

すなわち本発明の磁気記憶体は金属磁性媒体の
上に反射層を被覆しこの反射層の上に塗布したポ
リ珪酸を有する磁気記憶体であり、また本発明の
製造方法はこの磁気記憶体にレーザー光を照射し
てポリ珪酸を選択的に焼成することを特徴として
いる。
That is, the magnetic memory of the present invention is a magnetic memory having a reflective layer coated on a metal magnetic medium and polysilicate coated on the reflective layer, and the manufacturing method of the present invention is a magnetic memory having a reflective layer coated on a metal magnetic medium, and the manufacturing method of the present invention is a magnetic memory having a metal magnetic medium coated with a reflective layer and polysilicate coated on the reflective layer. It is characterized by selectively firing polysilicic acid by irradiating it with light.

次に図面を参照して本発明を詳細に説明する。
図は磁気記憶体の断面図である。
Next, the present invention will be explained in detail with reference to the drawings.
The figure is a cross-sectional view of the magnetic storage body.

図において磁気記憶体の基盤1としてアルミ合
金が軽くて加工性が良く安価なことから最も良く
用いられるが、場合によつてはチタン合金が用い
られることもある。基盤表面は機械加工により小
さなうねり(円周方向で50μm以下、半径方向で
100μm以下)を有する面に仕上げられる。
In the figure, aluminum alloy is most often used as the base 1 of the magnetic memory body because it is light, easy to work with, and inexpensive, but titanium alloy may be used in some cases. The base surface is machined to create small waviness (less than 50μm in the circumferential direction and radial direction).
100μm or less).

次にこの基盤1の上に下地体2としてニツケル
―燐合金がめつきにより被覆され、この下地体2
の表面は機械的研磨により表面粗さ0.03μm
(Rmax)以下に鏡面仕上げされる。
Next, a nickel-phosphorus alloy is coated on this base 1 as a base body 2 by plating, and this base body 2
The surface has a surface roughness of 0.03μm by mechanical polishing.
Mirror finish is achieved below (Rmax).

次に上記下地体2の鏡面研磨面上に金属磁性媒
体としてコバルト―ニツケル―燐合金がめつきに
より被覆され、この金属磁性媒体3の上に反射層
4が被覆される。反射層4は金属磁性媒体3がレ
ーザー光を吸収して加熱されるのを防ぐために設
けられ、光源として炭酸ガスレーザーを用いた場
合、波長10.6μm附近で反射率が高い銀、金また
は銅が好ましい。膜厚は保護膜の厚さに影響が少
ない程度(500Å以下)が望ましい。
Next, a cobalt-nickel-phosphorus alloy is coated as a metal magnetic medium on the mirror-polished surface of the base body 2 by plating, and a reflective layer 4 is coated on the metal magnetic medium 3. The reflective layer 4 is provided to prevent the metal magnetic medium 3 from absorbing laser light and being heated, and when a carbon dioxide laser is used as a light source, silver, gold, or copper, which has a high reflectance at a wavelength of around 10.6 μm, is used. preferable. It is desirable that the film thickness is such that it has little effect on the thickness of the protective film (500 Å or less).

次にこの反射層4の上に保護膜4として、前に
引用した特開昭52−20804号に示された様なポリ
珪酸が回転塗布法により被覆される。次にこのポ
リ珪酸を被覆した磁気記憶体の表面に波長9μm
〜11μmの炭酸ガスレーザー光を照射して上記ポ
リ珪酸膜を焼成硬化する。
Next, polysilicic acid as disclosed in Japanese Patent Application Laid-Open No. 52-20804 cited above is coated on this reflective layer 4 as a protective film 4 by a spin coating method. Next, the surface of the magnetic memory body coated with this polysilicate was coated with a wavelength of 9 μm.
The polysilicate film is baked and hardened by irradiation with carbon dioxide laser light of ~11 μm.

ポリ珪酸は波長4μmから50μmの範囲では光
の吸収が大きく、赤外吸収スペクトルによると特
に9〜10μmの範囲に大きな吸収があり、波長9
〜11μmの炭酸ガスレーザーをよく吸収すること
が分る。
Polysilicic acid has a large absorption of light in the wavelength range of 4 μm to 50 μm, and according to the infrared absorption spectrum, it has a particularly large absorption in the 9 to 10 μm range;
It can be seen that carbon dioxide laser of ~11 μm is well absorbed.

本発明による反射層を有する磁気記憶体は、ヘ
ツドに対する耐磨擦性にすぐれ、且つ量産性に富
むポリ珪酸の焼成硬化法としてエネルギー密度の
高いレーザー光を用いた場合、コバルト―ニツケ
ル―燐合金及び下地金属であるニツケル―燐合金
の温度上昇を防ぐことが出来る。
The magnetic storage body having a reflective layer according to the present invention has excellent abrasion resistance against heads and is easily produced in large quantities.When a high-energy-density laser beam is used as a baking hardening method for polysilicic acid, it is possible to form a cobalt-nickel-phosphorus alloy. Also, it is possible to prevent the temperature rise of the nickel-phosphorus alloy that is the base metal.

すなわち、レーザー光のより高いエネルギー密
度と、ポリ珪酸のレーザー光吸収特性と、反射層
4の高いレーザー光反射率によりポリ珪酸とコバ
ルト―ニツケル―燐合金またはニツケル―燐合金
の間に高い温度勾配が生じて、ポリ珪酸の硬化と
同時に下地体の帯磁あるいは金属磁性媒体の磁気
特性の劣化を防ぎ、かつ照射時間の短縮により量
産性を高めることが出来る。
That is, due to the higher energy density of laser light, the laser light absorption characteristics of polysilicate, and the high laser light reflectance of the reflective layer 4, a high temperature gradient is created between polysilicate and cobalt-nickel-phosphorus alloy or nickel-phosphorus alloy. occurs, and at the same time as curing the polysilicic acid, magnetization of the base body or deterioration of the magnetic properties of the metal magnetic medium can be prevented, and mass productivity can be increased by shortening the irradiation time.

次に実施例および、比較例により本発明の磁気
記憶体の製造方法を詳細に説明する。
Next, the method for manufacturing a magnetic memory of the present invention will be explained in detail using Examples and Comparative Examples.

実施例 1 基盤1として旋盤加工および熱矯正によつて十
分小さなうねり(円周方向で50μm以下、半径方
向で10μm以下)をもつた面に仕上げられたデイ
スク状アルミニウム合金盤上に下地体2としてニ
ツケル―燐合金を約50μmの厚さにめつきし、こ
のニツケル―燐めつき膜を表面粗さ0.02μm
(Rmax)厚さ30μmまで鏡面研磨仕上げした。
Example 1 As the substrate 1, the base body 2 was placed on a disk-shaped aluminum alloy disk whose surface was finished with sufficiently small waviness (50 μm or less in the circumferential direction and 10 μm or less in the radial direction) by lathe processing and heat straightening. Nickel-phosphorus alloy is plated to a thickness of approximately 50μm, and this nickel-phosphorus plating film has a surface roughness of 0.02μm.
(Rmax) Mirror polished to a thickness of 30μm.

次にこのニツケル―燐めつき膜の上に磁性媒体
3としてコバルト―ニツケル―燐合金を0.05μm
の厚さにめつきした。このコバルト―ニツケル―
燐めつき膜の上に反射層として銀を0.05μmの厚
さにめつきし、この反射層の上にテトラヒドロキ
シシランの2%n―ブチルアルコール溶液を0.1
μmの厚さに塗布、乾燥後200℃で1時間焼成し
てポリ珪酸にし保護膜とした。
Next, on this nickel-phosphorus plating film, a cobalt-nickel-phosphorus alloy with a thickness of 0.05 μm was applied as a magnetic medium 3.
I was impressed by the thickness. This cobalt - nickel -
Silver was plated to a thickness of 0.05 μm as a reflective layer on the phosphor-plated film, and 0.1% of a 2% n-butyl alcohol solution of tetrahydroxysilane was applied on the reflective layer.
It was applied to a thickness of μm, dried, and then baked at 200°C for 1 hour to form a polysilicic acid protective film.

次に出力25KWのパルス発振炭酸ガスレーザー
をスポツト径0.7mmに絞つてポリ珪酸膜に照射焼
成して磁気デイスクを作つた。
Next, a magnetic disk was created by irradiating and baking the polysilicate film with a pulsed carbon dioxide gas laser with an output of 25 kW, focused to a spot diameter of 0.7 mm.

実施例 2 実施例1と同様にして、但し反射層として銀の
代りに金めつきにより0.05μmの厚さに被覆し磁
気デイスクを作つた。
Example 2 A magnetic disk was produced in the same manner as in Example 1, except that the reflective layer was coated with gold plating to a thickness of 0.05 μm instead of silver.

実施例 3 実施例1と同様にして、但し反射層として銀の
代りに銅をめつきにより0.05μmの厚さに被覆し
て磁気デイスクを作つた。
Example 3 A magnetic disk was produced in the same manner as in Example 1, except that copper was coated with a thickness of 0.05 μm instead of silver as a reflective layer by plating.

比較例 実施例1と同様にして、但し反射層を被覆せず
に磁気デイスクを作つた。
Comparative Example A magnetic disk was made in the same manner as in Example 1, except that it was not coated with a reflective layer.

実施例1〜3および比較例で示した各磁気デイ
スクを用いてレーザー照射前後における磁気特性
を測定したところ、比較例の磁気デイスクは金属
磁性媒体の抗磁力(Hc)が5%増加し、下地層
のニツケル―燐の磁束密度(Br)が100ガウス
(Gauss)発生したが、実施例1〜3の磁気デイ
スクでは変化がなわつた。
When the magnetic properties of the magnetic disks shown in Examples 1 to 3 and Comparative Example were measured before and after laser irradiation, it was found that the magnetic disk of Comparative Example showed a 5% increase in the coercive force (Hc) of the metal magnetic medium, and a lower The magnetic flux density (Br) of nickel-phosphorus in the geological formations occurred at 100 Gauss, but there was a slight change in the magnetic disks of Examples 1 to 3.

なお実施例1〜3は全てCSS試験を3万回繰り
返したが全く傷は生じなかつた。
Note that in all Examples 1 to 3, the CSS test was repeated 30,000 times, but no scratches occurred.

なお量産性については実施例1〜3の場合直径
14インチの磁気デイスクの場合、処理時間が1面
当り数分であつたが、比較例の場合には10数分を
要した。
Regarding mass production, in the case of Examples 1 to 3, the diameter
In the case of a 14-inch magnetic disk, the processing time was several minutes per side, but in the case of the comparative example, it took more than 10 minutes.

以上のことから本発明の磁気記憶体およびその
製造方法によつて製造した磁気デイスクは、金属
磁性媒体の磁気特性の変化および下地層の帯磁が
なく、かつより信頼性および量産性に優れている
ことがわかつた。
From the above, the magnetic storage body of the present invention and the magnetic disk manufactured by the manufacturing method thereof are free from changes in the magnetic properties of the metal magnetic medium and magnetization of the underlayer, and are superior in reliability and mass production. I found out.

【図面の簡単な説明】[Brief explanation of the drawing]

図は本発明の磁気記憶体の一実施例を示す部分
断面図である。 図において、1は基盤、2は下地体、3は磁性
媒体、4は反射層、5はポリ珪酸層を表わす。
The figure is a partial sectional view showing an embodiment of the magnetic storage body of the present invention. In the figure, 1 is a base, 2 is an underlayer, 3 is a magnetic medium, 4 is a reflective layer, and 5 is a polysilicate layer.

Claims (1)

【特許請求の範囲】 1 鏡面研磨された下地体の上に磁性媒体が被覆
され、該媒体の上に反射層が被覆され、該反射層
の上にポリ珪酸が被覆されていることを特徴とす
る磁気記憶体。 2 反射層がAg,AuまたはCuである特許請求の
範囲第1項に記載の磁気記憶体。 3 鏡面研磨された下地体の上に磁性媒体を被覆
し、該媒体の上に反射層を被覆し、該反射層の上
にポリ珪酸を被覆した後、レーザー光を照射して
該ポリ珪酸を焼成することを特徴とする磁気記憶
体の製造方法。 4 反射層がAg,AuまたはCuである特許請求の
範囲第3項に記載の磁気記憶体の製造方法。
[Claims] 1. A magnetic medium is coated on a mirror-polished base body, a reflective layer is coated on the medium, and a polysilicic acid is coated on the reflective layer. magnetic memory. 2. The magnetic memory according to claim 1, wherein the reflective layer is made of Ag, Au, or Cu. 3 A magnetic medium is coated on a mirror-polished base body, a reflective layer is coated on the medium, a polysilicic acid is coated on the reflective layer, and then the polysilicic acid is irradiated with a laser beam. A method for manufacturing a magnetic memory, which comprises firing. 4. The method for manufacturing a magnetic memory body according to claim 3, wherein the reflective layer is made of Ag, Au or Cu.
JP16593379A 1979-10-02 1979-12-20 Magnetic storage material and its production Granted JPS5690424A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP16593379A JPS5690424A (en) 1979-12-20 1979-12-20 Magnetic storage material and its production
US06/192,566 US4380558A (en) 1979-10-02 1980-09-30 Process for manufacturing a protective polysilicate layer of a record member by a laser beam and a magnetic record member suitably manufactured thereby
DE19803050791 DE3050791C2 (en) 1979-10-02 1980-10-01 Process for the simultaneous production of two magnetic recording media
DE19803050525 DE3050525C2 (en) 1979-10-02 1980-10-01 Protective poly:silicate coating prodn. on magnetic recording material - by applying tetra:hydroxy-silane, precure and laser irradiation to complete cure
DE3037168A DE3037168C2 (en) 1979-10-02 1980-10-01 Process for the production of a magnetic recording medium by means of laser radiation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16593379A JPS5690424A (en) 1979-12-20 1979-12-20 Magnetic storage material and its production

Publications (2)

Publication Number Publication Date
JPS5690424A JPS5690424A (en) 1981-07-22
JPS6250884B2 true JPS6250884B2 (en) 1987-10-27

Family

ID=15821765

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16593379A Granted JPS5690424A (en) 1979-10-02 1979-12-20 Magnetic storage material and its production

Country Status (1)

Country Link
JP (1) JPS5690424A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01159975U (en) * 1988-04-21 1989-11-07

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01159975U (en) * 1988-04-21 1989-11-07

Also Published As

Publication number Publication date
JPS5690424A (en) 1981-07-22

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