JPH0450648B2 - - Google Patents
Info
- Publication number
- JPH0450648B2 JPH0450648B2 JP59079820A JP7982084A JPH0450648B2 JP H0450648 B2 JPH0450648 B2 JP H0450648B2 JP 59079820 A JP59079820 A JP 59079820A JP 7982084 A JP7982084 A JP 7982084A JP H0450648 B2 JPH0450648 B2 JP H0450648B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- layer
- titanium
- magnetic disk
- disk
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 12
- 239000000696 magnetic material Substances 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 8
- LLZRNZOLAXHGLL-UHFFFAOYSA-J titanic acid Chemical compound O[Ti](O)(O)O LLZRNZOLAXHGLL-UHFFFAOYSA-J 0.000 claims description 8
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 239000004408 titanium dioxide Substances 0.000 claims description 6
- 230000001681 protective effect Effects 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 3
- 229910001096 P alloy Inorganic materials 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- 238000005299 abrasion Methods 0.000 description 3
- 238000007772 electroless plating Methods 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 239000000314 lubricant Substances 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- 229910000990 Ni alloy Inorganic materials 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- SIBIBHIFKSKVRR-UHFFFAOYSA-N phosphanylidynecobalt Chemical compound [Co]#P SIBIBHIFKSKVRR-UHFFFAOYSA-N 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910000428 cobalt oxide Inorganic materials 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000010702 perfluoropolyether Substances 0.000 description 1
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical class [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G47/00—Article or material-handling devices associated with conveyors; Methods employing such devices
- B65G47/74—Feeding, transfer, or discharging devices of particular kinds or types
- B65G47/82—Rotary or reciprocating members for direct action on articles or materials, e.g. pushers, rakes, shovels
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Paints Or Removers (AREA)
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Description
【発明の詳細な説明】
「産業上の利用分野」
この発明は表面保護性の高い磁気デイスクの製
造方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION "Field of Industrial Application" This invention relates to a method of manufacturing a magnetic disk with high surface protection properties.
「従来の技術」
周知のように、磁気デイスク記憶装置は、１〜
10枚程度の磁気デイスクを同一軸上に適当な間隔
を置いて配列して、これを記憶媒体とし、例え
ば、これら磁気デイスクの各面に対し、通常１個
のヘツドを設け、これらを１つの可動機構に固定
して同時に動くようにし、読出し、書込みにおい
てこれらのヘツドをデイスクの半径方向に移動す
る構造の装置である。この装置においては、記録
密度を上げるためには、ヘツドとデイスク表面と
の間隔をできるだけ接近させ、かつ一定に保つこ
とが必要であり、現在はデイスクの高速回転によ
りデイスク表面に生ずる空気流によりヘツドを浮
かせて間隔を保つ浮動ヘツド方式が採用されてい
る。従つて、デイスクの停止時にはヘツドはデイ
スク表面上に当接しており、デイスクの始動、停
止の前後においてはデイスク表面にヘツドが摺接
することになる。“Prior Art” As is well known, magnetic disk storage devices are
Approximately 10 magnetic disks are arranged on the same axis at appropriate intervals and used as a storage medium. This device is fixed to a movable mechanism so that they can move simultaneously, and these heads are moved in the radial direction of the disk during reading and writing. In this device, in order to increase the recording density, it is necessary to keep the distance between the head and the disk surface as close as possible and to keep it constant. A floating head system is used that maintains the distance between the two heads by floating them. Therefore, when the disk is stopped, the head is in contact with the disk surface, and before and after the disk is started and stopped, the head is in sliding contact with the disk surface.
一方、薄膜磁気デイスクにおいては、その代表
的なものとして、無電解めつきにより製造される
ものが知られている。この磁気デイスクには、磁
性めつき層が潤滑剤を介して表面に露出している
構造のものと、磁性めつき層の上に保護膜として
ニツケル合金層、コバルトの酸化物層、有機化合
物層が形成され、その上に潤滑剤を塗布した構造
のものがある。 On the other hand, a typical example of thin film magnetic disks is one manufactured by electroless plating. This magnetic disk has a structure in which the magnetic plating layer is exposed on the surface through a lubricant, and a nickel alloy layer, cobalt oxide layer, and organic compound layer as protective films on the magnetic plating layer. There is a structure in which a lubricant is applied on top of the structure.
「発明が解決しようとする問題点」
上記のような構造の従来の磁気デイスクにおい
ては、上記したヘツドとの構造上の関係から下記
のような問題点が発生しており、その解決が望ま
れている。"Problems to be Solved by the Invention" In the conventional magnetic disk having the structure described above, the following problems occur due to the structural relationship with the head described above, and it is desired to solve them. ing.
すなわち、上記した２つの構造の磁気デイスク
のどちらにおいても、つまり、磁性めつき層が表
面にある場合でも、その上にニツケル合金層等の
保護膜が表面にある場合でも、これら磁性めつき
層および保護膜の硬度、耐摩耗性が比較的低いの
で、デイスクの始動、停止時にヘツドがデイスク
表面に摺接するその経時変化によりデイスク表面
の摩耗がすすみ、出力の低下、摩耗粉によるヘツ
ドクラツシユ等が発生してしまうという問題点で
ある。 In other words, in both of the magnetic disks with the above two structures, that is, whether there is a magnetic plating layer on the surface or a protective film such as a nickel alloy layer on the surface, these magnetic plating layers Since the hardness and abrasion resistance of the protective film are relatively low, the head slides against the disk surface when the disk starts and stops, and the wear of the disk surface progresses over time, resulting in a decrease in output and head crushing due to wear particles. The problem is that it happens.
この発明は、上記事情に鑑みてなされたもの
で、ヘツドの摺接によつてその表面が摩耗される
ことが少なく、摩耗粉の発生もほとんど見られな
い磁気デイスクの製造方法を提供することを目的
とするものである。 This invention has been made in view of the above circumstances, and an object of the present invention is to provide a method for manufacturing a magnetic disk in which the surface is less likely to be abraded due to the sliding contact of the head, and the generation of abrasion powder is hardly observed. This is the purpose.
「問題点を解決するための手段」
この発明に係る磁気デイスクの製造方法は、最
外層を形成している磁性材層またはこの磁性材層
上にさらに形成されている非磁性材層の上に四塩
化チタンを被覆し、この四塩化チタンを加水分解
により四水酸化チタンとし、さらにこの水酸化チ
タンを加熱酸化して最外層に強靭、軽量、高耐摩
耗性の二酸化チタン層を形成し、これによつて表
面保護性の高い磁気デイスクを得られるようにし
たものである。"Means for Solving the Problems" The method for manufacturing a magnetic disk according to the present invention is directed to a method for manufacturing a magnetic disk according to the present invention. Coated with titanium tetrachloride, this titanium tetrachloride is hydrolyzed to titanium tetrahydroxide, and this titanium hydroxide is further heated and oxidized to form a tough, lightweight, and highly wear-resistant titanium dioxide layer as the outermost layer. This makes it possible to obtain a magnetic disk with high surface protection properties.
「作用」
上記のように、この発明の方法によれば、磁気
デイスクの最外層に強靭、軽量、高耐摩耗性の二
酸化チタン層を容易に形成することができるの
で、長期に亘つて特性上問題となる摩耗を受ける
ことがなく、したがつて摩耗粉の発生もほとんど
なく、ヘツドクラツシユを起こすことのない表面
保護性の高い磁気デイスクを容易に製造すること
ができる。"Operation" As described above, according to the method of the present invention, it is possible to easily form a strong, lightweight, and highly wear-resistant titanium dioxide layer on the outermost layer of a magnetic disk, so that it can maintain its properties over a long period of time. It is possible to easily produce a magnetic disk with high surface protection properties that does not suffer from problematic wear, therefore generates almost no abrasion powder, and does not cause head crushing.
次に、この発明を実施例によりさらに詳しく説
明する。 Next, the present invention will be explained in more detail with reference to Examples.
「実施例」
図に示すように、非磁性基板として充分小さな
うねり（円周方向で50μｍ以下かつ半径方向で
10μｍ以下）をもつ面に仕上げた円板状のアルミ
ニウム合金板１上に無電解めつきにより20μｍ厚
のニツケル・リン合金層２を形成した。このニツ
ケル・リン合金層２の表面２ａを表面粗さ
Rmax0.1μｍに研磨仕上げし、この上に無電解め
つきにより0.05μｍ厚のコバルト・リン合金層３
を形成した。そして、このコバルト・リン合金層
３上に四塩化チタンをスピンコートし、この四塩
化チタンを80℃、RH80％の雰囲気で加水分解し
て四水酸化チタンとした。つづいて、この四水酸
化チタンを200℃恒温槽中で約２時間に亘つて加
熱し、酸化して、最外層に四酸化チタン層４を形
成した。最後にこの二酸化チタン層４上に潤滑剤
としてパーフロロポリエーテル５を約0.01μｍ厚
に塗布した。"Example" As shown in the figure, the waviness is small enough for a non-magnetic substrate (50 μm or less in the circumferential direction and radial direction).
A nickel-phosphorous alloy layer 2 having a thickness of 20 μm was formed by electroless plating on a disc-shaped aluminum alloy plate 1 whose surface was finished with a surface of 10 μm or less. The surface 2a of this nickel-phosphorus alloy layer 2 has a surface roughness.
Polished to Rmax 0.1μm, and coated with a 0.05μm thick cobalt-phosphorus alloy layer 3 by electroless plating.
was formed. Then, titanium tetrachloride was spin-coated on this cobalt-phosphorus alloy layer 3, and this titanium tetrachloride was hydrolyzed in an atmosphere of 80° C. and 80% RH to form titanium tetrahydroxide. Subsequently, this titanium tetrahydroxide was heated in a constant temperature bath at 200° C. for about 2 hours to oxidize it to form a titanium tetroxide layer 4 as the outermost layer. Finally, perfluoropolyether 5 was applied as a lubricant on the titanium dioxide layer 4 to a thickness of about 0.01 μm.
上記のようにして製造した磁気デイスクを４万
回のCSSテスト（コンタクト・スタート・ストツ
プテスト）の供した結果、電磁変換特性に変化は
認められず、摩耗粉の発生も、ヘツドクラツシユ
の発生も見られなかつた。これによりこの発明の
方法により製造した磁気デイスクは、すぐれた耐
久性を有し、高信頼性、高品質性をもつことが確
められた。 As a result of subjecting the magnetic disk manufactured as described above to 40,000 CSS tests (Contact Start Stop Test), no change was observed in the electromagnetic conversion characteristics, and no wear particles or head crushing was observed. Nakatsuta. This confirmed that the magnetic disk manufactured by the method of the present invention has excellent durability, high reliability, and high quality.
「発明の効果」
以上説明したように、この発明に係る磁気デイ
スクの製造方法は、最外層を形成している磁性材
層またはこの磁性材層上にさらに形成されている
非磁性材層の上に四塩化チタンを被覆し、この四
塩化チタンを加水分解により四水酸化チタンと
し、さらにこの四水酸化チタンを加熱酸化して最
外層に強靭、軽量、高耐摩耗性の二酸化チタン層
を形成するものなので、経時的なヘツドの摺接に
よつて表面が摩耗されることが少なく、摩耗粉の
発生もほとんど見られず、すぐれた耐久性を発揮
し、高信頼性、高品質な磁気デイスクを容易に製
造することができる。``Effects of the Invention'' As explained above, the method for manufacturing a magnetic disk according to the present invention can be applied to a magnetic material layer forming the outermost layer or a non-magnetic material layer further formed on this magnetic material layer. coated with titanium tetrachloride, this titanium tetrachloride is hydrolyzed to titanium tetrahydroxide, and this titanium tetrahydroxide is further heated and oxidized to form a tough, lightweight, and highly wear-resistant titanium dioxide layer as the outermost layer. Because of this, the surface is less likely to be worn down due to sliding contact between the heads over time, and there is almost no wear debris, providing excellent durability, high reliability, and high quality magnetic disks. can be easily manufactured.
図はこの発明の方法によつて製造した磁気デイ
スクの一例を示す断面構成図である。
１……アルミニウム合金板（非磁性基板）、２
……ニツケル・リン合金層（磁性材層）、３……
コバルト・リン合金層（磁性材層）、４……二酸
化チタン層。
The figure is a cross-sectional configuration diagram showing an example of a magnetic disk manufactured by the method of the present invention. 1... Aluminum alloy plate (non-magnetic substrate), 2
...Nickel-phosphorus alloy layer (magnetic material layer), 3...
Cobalt-phosphorous alloy layer (magnetic material layer), 4...Titanium dioxide layer.
Claims (1)
されている磁気デイスクまたは前記磁性材層上に
さらに非磁性材層が形成されている磁気デイスク
の最外層である前記磁性材層または非磁性材層上
に四塩化チタンを被覆し、この四塩化チタンを加
水分解により四水酸化チタンにし、さらにこの四
水酸化チタンを加熱酸化して磁気デイスクの最外
層に保護膜となる二酸化チタン層を形成すること
を特徴とする磁気デイスクの製造方法。1. A magnetic disk in which a magnetic material layer is formed on a thin disc-shaped non-magnetic substrate, or the magnetic material layer which is the outermost layer of a magnetic disk in which a non-magnetic material layer is further formed on the magnetic material layer; Titanium tetrachloride is coated on the non-magnetic material layer, this titanium tetrachloride is hydrolyzed to titanium tetrahydroxide, and this titanium tetrahydroxide is then heated and oxidized to form titanium dioxide which becomes the protective film on the outermost layer of the magnetic disk. A method for manufacturing a magnetic disk, characterized by forming a layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7982084A JPS60224127A (en) | 1984-04-20 | 1984-04-20 | Manufacture of magnetic disk |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7982084A JPS60224127A (en) | 1984-04-20 | 1984-04-20 | Manufacture of magnetic disk |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60224127A JPS60224127A (en) | 1985-11-08 |
| JPH0450648B2 true JPH0450648B2 (en) | 1992-08-14 |
Family
ID=13700835
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7982084A Granted JPS60224127A (en) | 1984-04-20 | 1984-04-20 | Manufacture of magnetic disk |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60224127A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63140091A (en) * | 1986-12-02 | 1988-06-11 | Kobe Steel Ltd | Improvement of corrosion resistance in electroless ni-p plating substrate for magnetic disk |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58221459A (en) * | 1982-06-18 | 1983-12-23 | Hitachi Ltd | Controlling circuit of external storage device |
-
1984
- 1984-04-20 JP JP7982084A patent/JPS60224127A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58221459A (en) * | 1982-06-18 | 1983-12-23 | Hitachi Ltd | Controlling circuit of external storage device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60224127A (en) | 1985-11-08 |
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