JPH02155232A - エッチング方法 - Google Patents

エッチング方法

Info

Publication number
JPH02155232A
JPH02155232A JP63308933A JP30893388A JPH02155232A JP H02155232 A JPH02155232 A JP H02155232A JP 63308933 A JP63308933 A JP 63308933A JP 30893388 A JP30893388 A JP 30893388A JP H02155232 A JPH02155232 A JP H02155232A
Authority
JP
Japan
Prior art keywords
layer
hydrochloric acid
etching solution
etching
metal layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP63308933A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0519301B2 (enExample
Inventor
Masayuki Hanaoka
正行 花岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanken Electric Co Ltd
Original Assignee
Sanken Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanken Electric Co Ltd filed Critical Sanken Electric Co Ltd
Priority to JP63308933A priority Critical patent/JPH02155232A/ja
Publication of JPH02155232A publication Critical patent/JPH02155232A/ja
Publication of JPH0519301B2 publication Critical patent/JPH0519301B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Weting (AREA)
JP63308933A 1988-12-08 1988-12-08 エッチング方法 Granted JPH02155232A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63308933A JPH02155232A (ja) 1988-12-08 1988-12-08 エッチング方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63308933A JPH02155232A (ja) 1988-12-08 1988-12-08 エッチング方法

Publications (2)

Publication Number Publication Date
JPH02155232A true JPH02155232A (ja) 1990-06-14
JPH0519301B2 JPH0519301B2 (enExample) 1993-03-16

Family

ID=17987019

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63308933A Granted JPH02155232A (ja) 1988-12-08 1988-12-08 エッチング方法

Country Status (1)

Country Link
JP (1) JPH02155232A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6997985B1 (en) 1993-02-15 2006-02-14 Semiconductor Energy Laboratory Co., Ltd. Semiconductor, semiconductor device, and method for fabricating the same

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103617952B (zh) * 2013-11-29 2016-08-17 中国电子科技集团公司第四十七研究所 二极管湿法刻蚀方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6997985B1 (en) 1993-02-15 2006-02-14 Semiconductor Energy Laboratory Co., Ltd. Semiconductor, semiconductor device, and method for fabricating the same

Also Published As

Publication number Publication date
JPH0519301B2 (enExample) 1993-03-16

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