JPH02135823U - - Google Patents
Info
- Publication number
- JPH02135823U JPH02135823U JP4611589U JP4611589U JPH02135823U JP H02135823 U JPH02135823 U JP H02135823U JP 4611589 U JP4611589 U JP 4611589U JP 4611589 U JP4611589 U JP 4611589U JP H02135823 U JPH02135823 U JP H02135823U
- Authority
- JP
- Japan
- Prior art keywords
- diaphragm
- attached
- sensor chip
- block
- silicon sensor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 9
- 229910052710 silicon Inorganic materials 0.000 claims description 9
- 239000010703 silicon Substances 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 6
- 239000007788 liquid Substances 0.000 claims description 5
- 239000012530 fluid Substances 0.000 claims 3
- 238000005259 measurement Methods 0.000 claims 3
- 238000010586 diagram Methods 0.000 description 4
Landscapes
- Measurement Of Levels Of Liquids Or Fluent Solid Materials (AREA)
Description
第１図は本考案の一実施例の要部構成説明図、
第２図は第１図の斜視図、第３図、第４図は第１
図の要部詳細図、第５図は第１図の動作説明図、
第６図は本考案の他の実施例の要部構成説明図、
第７図は従来より一般に使用されている従来例の
構成説明図である。
１１……ダイアフラムブロツク、１１１……シ
ールダイアフラム、１１２……取付けブロツク、
１１３……凹部、１１４……シール室、１１５…
…連通孔、１２……差圧ブロツク、１２１……取
付けブロツク、１２２……凹部、１２３……シー
ル室、１２４……シールダイアフラム、１２４…
…シール液、１２６……圧力センサ、１２６１…
…第１の支持台、１２６２……第１の基板、１２
６３……第１のシリコンセンサチツプ、１２６４
……第１のダイアフラム、１２６５……第１の凹
部、１２６６……第１の歪みゲージ、１２７……
差圧センサ、１２７１……第２の支持台、１２７
２……第２の基板、１２７３……第２のシリコン
センサチツプ、１２７４……第２のダイアフラム
、１２７５……第２の凹部、１２７６……第２の
歪みゲージ、１３……キヤピラリーチユーブ、１
４……封入液、１５……演算回路。
FIG. 1 is an explanatory diagram of the main part configuration of an embodiment of the present invention,
Figure 2 is a perspective view of Figure 1, Figures 3 and 4 are perspective views of Figure 1.
A detailed view of the main parts of the figure, Figure 5 is an explanatory diagram of the operation of Figure 1,
FIG. 6 is an explanatory diagram of the main part configuration of another embodiment of the present invention,
FIG. 7 is a diagram illustrating the configuration of a conventional example that has been commonly used. 11...Diaphragm block, 111...Seal diaphragm, 112...Mounting block,
113... recess, 114... seal chamber, 115...
...Communication hole, 12...Differential pressure block, 121...Mounting block, 122...Recess, 123...Seal chamber, 124...Seal diaphragm, 124...
...Seal liquid, 126...Pressure sensor, 1261...
...first support stand, 1262 ...first substrate, 12
63...first silicon sensor chip, 1264
...First diaphragm, 1265... First recess, 1266... First strain gauge, 127...
Differential pressure sensor, 1271...Second support stand, 127
2...Second substrate, 1273...Second silicon sensor chip, 1274...Second diaphragm, 1275...Second recess, 1276...Second strain gauge, 13...Capillary reach tube, 1
4...Enclosed liquid, 15...Arithmetic circuit.
Claims (1)
ダイアフラムを有し測定流体の測定圧を受圧する
ダイアフラムブロツクと、 開放タンクの側面の底面側に取付けられた取付
けブロツクと 該取付けブロツクに設けられた受圧凹部と 前記取付けブロツクに取付けられ該受圧凹部と
シール室を構成し外表面が測定流体に接するシー
ルダイアフラムと 前記シール室に満たされるシール液と 前記取付けブロツクに一端が取付けられた第１
の支持台と該第１の支持台の他端に一面が取付け
られた第１の基板と該第１の基板の他面に取付け
られた第１のシリコンセンサチツプと該第１のシ
リコンセンサチツプに設けられ該第１のシリコン
センサチツプに第１のダイアフラムを構成し大気
圧が導入される第１の凹部と前記第１のダイアフ
ラムに設けられた第１の歪みゲージとを有する圧
力センサと 前記取付けブロツクに一端が取付けられた第２
の支持台と該第２の支持台の他端に一面が取付け
られた第２の基板と該第２の基板の他面に取付け
られた第２のシリコンセンサチツプと該第２のシ
リコンセンサチツプに設けられ該第２のシリコン
センサチツプに第２のダイアフラムを構成し前記
ダイアフラムブロツクの測定圧が導入される第２
の凹部と前記第２のダイアフラムに設けられた第
２の歪みゲージとを有する差圧センサと からなる差圧計ブロツクと、 該差圧計ブロツクと前記ダイアフラムブロツク
とを連通するキヤピラリーチユーブと、 該キヤピラリーチユーブに封入された封入液と
、 該キヤピラリーチユーブの封入液の比重量と前
記ダイアフラムブロツクと前記差圧計ブロツク間
の距離と前記差圧センサの測定信号と前記圧力セ
ンサの測定信号とにより測定流体の密度を使用す
ることなく開放タンク内のレベルを演算する演算
回路とを 具備してなるレベル計。[Claims for Utility Model Registration] A diaphragm block that has a seal diaphragm and is attached to the liquid surface side of the side surface of an open tank and receives the measured pressure of the measured fluid; A mounting block that is attached to the bottom side of the side surface of the open tank; a pressure-receiving recess provided in the mounting block; a seal diaphragm mounted on the mounting block and forming a seal chamber with the pressure-receiving recess and having an outer surface in contact with the measurement fluid; a seal liquid filling the seal chamber; First installed
a support stand, a first substrate having one side attached to the other end of the first support stand, a first silicon sensor chip attached to the other side of the first substrate, and the first silicon sensor chip. a pressure sensor comprising a first recess provided in the first silicon sensor chip and forming a first diaphragm into which atmospheric pressure is introduced; and a first strain gauge provided in the first diaphragm; The second one is attached at one end to the mounting block.
a support stand, a second substrate having one side attached to the other end of the second support stand, a second silicon sensor chip attached to the other side of the second substrate, and the second silicon sensor chip. A second diaphragm is provided on the second silicon sensor chip, and a second diaphragm is introduced into the second silicon sensor chip.
a differential pressure sensor having a recess and a second strain gauge provided on the second diaphragm; a capillary reach tube communicating the differential pressure gauge block and the diaphragm block; Measured by the specific weight of the liquid sealed in the capillary reach tube, the distance between the diaphragm block and the differential pressure gauge block, the measurement signal of the differential pressure sensor, and the measurement signal of the pressure sensor. A level meter equipped with a calculation circuit that calculates the level in an open tank without using the density of the fluid.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4611589U JPH02135823U (en) | 1989-04-19 | 1989-04-19 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4611589U JPH02135823U (en) | 1989-04-19 | 1989-04-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02135823U true JPH02135823U (en) | 1990-11-13 |
Family
ID=31560907
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4611589U Pending JPH02135823U (en) | 1989-04-19 | 1989-04-19 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02135823U (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5188059A (en) * | 1975-01-30 | 1976-08-02 | ||
| JPS5439161A (en) * | 1977-09-02 | 1979-03-26 | Hitachi Ltd | Liquid level meter of differential pressure type |
-
1989
- 1989-04-19 JP JP4611589U patent/JPH02135823U/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5188059A (en) * | 1975-01-30 | 1976-08-02 | ||
| JPS5439161A (en) * | 1977-09-02 | 1979-03-26 | Hitachi Ltd | Liquid level meter of differential pressure type |
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