JPH02132881A - Manufacture of circuit board - Google Patents

Manufacture of circuit board

Info

Publication number
JPH02132881A
JPH02132881A JP28577388A JP28577388A JPH02132881A JP H02132881 A JPH02132881 A JP H02132881A JP 28577388 A JP28577388 A JP 28577388A JP 28577388 A JP28577388 A JP 28577388A JP H02132881 A JPH02132881 A JP H02132881A
Authority
JP
Japan
Prior art keywords
circuit board
pattern
conductor
board
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP28577388A
Other languages
Japanese (ja)
Inventor
Kenzo Kobayashi
健造 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Furukawa Electric Co Ltd
Original Assignee
Furukawa Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Furukawa Electric Co Ltd filed Critical Furukawa Electric Co Ltd
Priority to JP28577388A priority Critical patent/JPH02132881A/en
Publication of JPH02132881A publication Critical patent/JPH02132881A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4644Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0011Working of insulating substrates or insulating layers
    • H05K3/0017Etching of the substrate by chemical or physical means
    • H05K3/0023Etching of the substrate by chemical or physical means by exposure and development of a photosensitive insulating layer

Abstract

PURPOSE:To manufacture a circuit board in a simple method and improve it in quality by a method wherein photosetting resin liquid thin layers, which ar used for the formation of an insulator and a conductor respectively, are irradiated with ultraviolet rays in required patterns to form an insulating pattern and a conductor pattern, and these layers are laminated. CONSTITUTION:A board 22 is horizontally immersed into a photosetting resin liquid 21 to form a thin film 21s of the liquid 21 on the board 22, and the film 21s is selectively irradiated with ultraviolet rays by an ultraviolet laser 23 to enable a required part of the film 21s to set for the formation of a hardened resin layer 24. Moreover, the board 22 is slightly immersed to form the layer 24 through the same process as above. The resin liquids 21 to form an insulator and a conductor respectively are provided, and the layers 24 are formed using these liquids alternately through a process as mentioned above, whereby a circuit board of stable quality, which is composed of an insulating board part and a circuit conductor part formed in one piece, can be easily manufactured.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、回路基板の製造方法に関し、特に多層回路基
板の製造に好適な方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for manufacturing a circuit board, and particularly to a method suitable for manufacturing a multilayer circuit board.

〔従来技術とその課題〕[Conventional technology and its issues]

図−5に従来の回路基板を示す.この回路基板は4層の
導体パターンlla〜lidを有するもので、第INと
第2層の導体パターンllaとllbはスルーホール1
2aにより導通がとられ、第3層と第4層の導体パター
ンIICとlidはスルーホール12bにより導通がと
られ、さらに各層の導体パターン118〜lidはスル
ーホール12cにより導通がとられているものである。
Figure 5 shows a conventional circuit board. This circuit board has four layers of conductor patterns lla to lid, and the conductor patterns lla and llb of the IN and second layers are through holes 1
2a, conduction is established between the conductor patterns IIC and lid of the third and fourth layers through the through hole 12b, and conduction is established between the conductor patterns 118 to lid of each layer through the through hole 12c. It is.

このような回路基板を製造するには、絶縁基板13aの
両面にw4箔のエッチング等により導体パターンlla
とllbを形成した後、スルーホール12aを形成して
第一の回路基114aを製造し、同様に絶縁基板13b
の両面に銅箔のエッチング等により導体パターンIIc
とlidを形成した後、スルーホール12bを形成して
第二の回路基板14bを製造した後、これらの回路基板
14aと14bを接着剤層15を介して張り合わせ、さ
らにスルーホール12cを形成して、最後に両面にソル
ダーレジスト層16a・16bを印刷するという方法が
とられる。
To manufacture such a circuit board, conductive patterns lla are formed on both sides of the insulating substrate 13a by etching W4 foil or the like.
After forming the through holes 12a and manufacturing the first circuit board 114a, the insulating substrate 13b is formed in the same manner.
A conductor pattern IIc is formed on both sides of the
After forming a through hole 12b and manufacturing a second circuit board 14b, these circuit boards 14a and 14b are bonded together via an adhesive layer 15, and a through hole 12c is further formed. Finally, a method is used in which solder resist layers 16a and 16b are printed on both sides.

しかしこのような方法では、パターンエッチング、スル
ーホール用の穴あけ、内面めっき、積層接着、ソルダー
レジスト印刷など、非常に種類の多い複雑な工程を数多
く経なければならないため、きわめて生産性が低く、ま
た品質のバラツキも生じやすいという問題がある。
However, this method has extremely low productivity, as it requires a large number of complex processes such as pattern etching, through-hole drilling, internal plating, lamination adhesion, and solder resist printing. There is also the problem that variations in quality tend to occur.

また絶縁ペーストを印刷して加熱硬化させる工程と、導
体ペーストを印刷して加熱硬化させる工程とを交互に繰
り返して、多層回路基板を製造する方法も知られている
が、この方法は、印刷した絶縁ペーストまたは導体ペー
ストのダレ等により層厚を正確に管理することが難しく
、このため層間絶縁が不良になったり、層数が多くなる
に従い表面が凸凹してきて印刷ができなくなる等の問題
がある. 〔課題の解決手段とその作用〕 本発明は、上記のような課題を解決するため、全く新し
い方法で回路基板を製造する方法を提供するもので、そ
の方法は、絶縁体形成用の光硬化性樹脂液の薄層に紫外
線を所要のパターンで照射して、照射した部分のみを硬
化させることにより絶縁パターンを形成することと、導
体形成用の光硬化性樹脂液の薄層に紫外線を所要のパタ
ーンで照射して、照射した部分のみを硬化させることに
より導体パターンを形成することとを交互に繰り返し、
これにより絶縁パターンおよび導体パターンを積層して
回路基板を得ることを特徴とするものである. この方法の原理を図−4を参照して説明する。
It is also known to manufacture multilayer circuit boards by alternately repeating the process of printing an insulating paste and heating and curing it, and the process of printing and heating and curing a conductor paste. It is difficult to accurately control the layer thickness due to sagging of the insulating paste or conductive paste, resulting in problems such as poor interlayer insulation, and as the number of layers increases, the surface becomes uneven and printing becomes impossible. .. [Means for Solving the Problems and Their Effects] In order to solve the above-mentioned problems, the present invention provides a method for manufacturing a circuit board using a completely new method. A thin layer of photocurable resin liquid is irradiated with ultraviolet rays in a desired pattern, and only the irradiated areas are cured to form an insulation pattern. This process is repeated alternately by irradiating in a pattern and curing only the irradiated part to form a conductive pattern.
This method is characterized by laminating insulating patterns and conductive patterns to obtain a circuit board. The principle of this method will be explained with reference to FIG.

まずlalに示すように光硬化性樹脂液21の中に平ら
な基板22を水平に沈め、基板22の上に光硬化性樹脂
液21の薄N21Sを形成する。次いで山)に示すよう
に、その薄層21sに紫外線レーザー23により紫外線
を選択的に照射して、その薄層21Sを必要な部分だけ
選択的に硬化させる.この紫外線の照射は、レーザー2
3をX−Y方向に移動させて薄層21Sを走査し、レー
ザー23が薄@21sの硬化させようとする部分を通過
するときは紫外線を発生させ、硬化させない部分を通過
するときは紫外線をストップする、という方法で行うこ
とができる。
First, as shown in lal, a flat substrate 22 is horizontally submerged in a photocurable resin liquid 21, and a thin N21S of the photocurable resin liquid 21 is formed on the substrate 22. Next, as shown in Fig. 2, the thin layer 21s is selectively irradiated with ultraviolet light by an ultraviolet laser 23 to selectively harden only the necessary portions of the thin layer 21S. This ultraviolet irradiation is performed by laser 2
3 is moved in the X-Y direction to scan the thin layer 21S, and when the laser 23 passes through the part of the thin layer 21s that is to be cured, it emits ultraviolet rays, and when it passes through the part that is not to be cured, it emits ultraviolet rays. This can be done by stopping.

上記の硬化処理が終了したら、(Clに示すように基板
22を少し沈め、硬化樹脂層24の上にさらに光硬化性
樹脂液のTtJ Fl2 1sを形成する.その後、t
dlに示すように、その薄層213に紫外線レーザー2
3により紫外線を選択的に照射して、その薄Ji21 
3を必要な部分だけ選択的に硬化させる。
After the above curing process is completed, the substrate 22 is slightly submerged as shown in (Cl), and a photocurable resin liquid TtJ Fl2 1s is further formed on the cured resin layer 24.
As shown in dl, the ultraviolet laser 2 is applied to the thin layer 213.
3, the thin Ji21
3. Selectively harden only the necessary parts.

このような操作を繰り返すと、各層ごとに異なる平面パ
ターンを有する硬化樹脂層24が積層され、一体的な樹
脂成形体を得ることができる.その際、絶縁体形成用の
光硬化性樹脂液と導体形成用の光硬化性樹脂液とを用意
し、前者の樹脂液からの絶縁性硬化樹脂層の形成と、後
者の樹脂液からの導電性硬化樹脂層の形成とを交互に行
えば、絶縁基板部分と回路導体部分とが一体となった回
路基板を製造することができるわけである. なお、光硬化性樹脂としては、光硬化性エボキシ樹脂、
光硬化性ポリイミド、光硬化性ポリウレタンアクリレー
ト、光硬化性シリコン樹脂などが使用可能である.導電
性を持たせるためには、これらの樹脂に導電性粉末を混
入すればよい。また樹脂自体が導電性を有する光硬化性
樹脂も使用可能である. 〔実施例〕 以下、本発明の実施例を図面を参照して詳細に説明する
By repeating such operations, cured resin layers 24 each having a different planar pattern are laminated, and an integrated resin molded body can be obtained. At that time, a photocurable resin liquid for forming an insulator and a photocurable resin liquid for forming a conductor are prepared, and the former resin liquid forms an insulating cured resin layer, and the latter resin liquid forms a conductive resin layer. By alternately forming the hardening resin layer, it is possible to manufacture a circuit board in which the insulating substrate portion and the circuit conductor portion are integrated. In addition, as the photocurable resin, photocurable epoxy resin,
Photocurable polyimide, photocurable polyurethane acrylate, photocurable silicone resin, etc. can be used. In order to make these resins conductive, conductive powder may be mixed into these resins. It is also possible to use photocurable resins whose resin itself is electrically conductive. [Example] Hereinafter, an example of the present invention will be described in detail with reference to the drawings.

図=1は本発明の製造方法の一実施例を示し、図−2は
それによって得られる回路基板を示す.まず図−1(a
)に示すように基板22を絶縁体形成用の光硬化性樹脂
液の中に沈めて、その上に同樹脂液の薄FJ31を形成
し、その薄Jif31を紫外線の照射により選択的に硬
化させて同図(blのように絶縁パターン32を形成す
る.これによって図−2の第1層目の絶縁パターン32
が形成される。
Figure 1 shows an embodiment of the manufacturing method of the present invention, and Figure 2 shows a circuit board obtained by the method. First, Figure 1 (a
), the substrate 22 is submerged in a photocurable resin liquid for forming an insulator, a thin FJ31 of the same resin liquid is formed on it, and the thin JIF31 is selectively cured by irradiation with ultraviolet rays. The insulation pattern 32 is formed as shown in the same figure (bl).This forms the insulation pattern 32 of the first layer in Figure 2.
is formed.

次に基板22を少し沈め、図−1 (Clのように絶縁
パターン32の上に上記と同じ光硬化性樹脂液の薄N3
lを形成し、その薄層31を紫外線の照射により選択的
に硬化させて同図(dlのように絶縁パターン32を形
成する。これによって図−2の第2N目の絶縁パターン
32が形成される. 次に全体を光硬化性樹脂液から取り出し、未硬化の樹脂
液を洗浄により除去した後、今度は導体形成用の光硬化
性樹脂液の中に沈めて、図−2(e)に示すように表面
が絶縁パターン32とそろうように同樹脂液の薄層33
を形成し、その薄N33を紫外線の照射により硬化させ
て同図(flのように導体パターン34を形成する.こ
れによって図−2の第2層目の導体パターン34が形成
される.次に基板22を少し沈め、図−N&のように絶
縁パターン32および導体パターン34の上に上記と同
じ光硬化性樹脂液の薄層33を形成し、その薄層33を
紫外線の照射により選択的に硬化させて同図(hlのよ
うに導体パターン34を形成する.これによって図−2
の第3層目の導体パターン34が形成される. 以下同様にして図−2の第3層目の絶縁パターン、第4
N目の絶縁パターン、第4層目の導体パターン、第5層
目の導体パターン、第5N目の絶縁パターン、・・・・
を順次形成すれば、図−2のような回路基板を得ること
ができる.なお各層の紫外線照射パターンは、例えば三
次元CADなどにより回路基板のモデルを設計し、その
モデルを必要な層数にスライスすることにより容易に作
製することができる. 以上の実施例は平面的な回路基板を製造する場合である
が、本発明に方法によれば、図−3のような立体的な回
路基板を製造することも可能である.なお図−3におい
て図−2と同一部分には同一符号を付゛してある. 〔発明の効果〕 以上説明したように本発明によれば、きわめて単純な工
程の繰り返しで多層回路基板を簡単に製造することがで
き、またこのため回路基板の品質も安定する利点がある
Next, submerge the substrate 22 slightly, and apply a thin N3 layer of the same photocurable resin liquid as above on the insulating pattern 32 as shown in Figure 1 (Cl).
1 is formed, and the thin layer 31 is selectively cured by irradiation with ultraviolet rays to form an insulating pattern 32 as shown in the figure (dl). As a result, the 2Nth insulating pattern 32 in Fig. 2 is formed. Next, the whole was taken out of the photocurable resin liquid, the uncured resin liquid was removed by washing, and then it was immersed in a photocurable resin liquid for forming a conductor, as shown in Figure 2(e). As shown, a thin layer 33 of the same resin liquid is applied so that the surface is aligned with the insulating pattern 32.
The thin N33 is cured by irradiation with ultraviolet rays to form a conductor pattern 34 as shown in the same figure (fl).Thus, the second layer conductor pattern 34 shown in Figure 2 is formed.Next, The substrate 22 is slightly submerged, and a thin layer 33 of the same photocurable resin liquid as above is formed on the insulating pattern 32 and the conductive pattern 34 as shown in Figure N&, and the thin layer 33 is selectively irradiated with ultraviolet rays. After curing, a conductive pattern 34 is formed as shown in the same figure (hl).
A third layer of conductor pattern 34 is formed. Similarly, the insulation pattern of the third layer and the fourth layer of FIG.
Nth insulation pattern, fourth layer conductor pattern, fifth layer conductor pattern, 5Nth insulation pattern, etc.
By forming these in sequence, a circuit board as shown in Figure 2 can be obtained. Note that the ultraviolet irradiation pattern for each layer can be easily produced by, for example, designing a model of the circuit board using three-dimensional CAD and slicing the model into the required number of layers. Although the above embodiment is a case of manufacturing a flat circuit board, according to the method of the present invention, it is also possible to manufacture a three-dimensional circuit board as shown in FIG. In Figure 3, the same parts as in Figure 2 are given the same symbols. [Effects of the Invention] As explained above, according to the present invention, a multilayer circuit board can be easily manufactured by repeating extremely simple steps, and the quality of the circuit board is therefore stable.

【図面の簡単な説明】[Brief explanation of the drawing]

図−1 (a)〜(hlは本発明の一実施例に係る回路
基板の製造方法を工程順に示す断面図、図−2はそれに
よって製造された回路基板の断面図、図−3は本発明の
方法によって得られる回路基板の他の例を示す断面図、
図−4《a》〜(d+は本発明方法の原理を工程順に示
す断面図、図−5は従来の方法で製造された回路基板の
断面図である. 31:絶縁体形成用の光硬化性樹脂液の薄層、32:絶
縁パターン、33:導体形成用の光硬化性樹脂液の薄層
、34:導体パターン。 図−1 図−3 図−5 図−4
Figures 1 (a) to (hl are cross-sectional views showing the method for manufacturing a circuit board according to an embodiment of the present invention in the order of steps, Figure 2 is a cross-sectional view of a circuit board manufactured by the method, and Figure 3 is a cross-sectional view of the circuit board manufactured by this method. A sectional view showing another example of a circuit board obtained by the method of the invention,
Figures 4 (a) to (d+ are cross-sectional views showing the principle of the method of the present invention in the order of steps, and Figure 5 is a cross-sectional view of a circuit board manufactured by a conventional method. 31: Photocuring for forming an insulator 32: Insulating pattern, 33: Thin layer of photocurable resin liquid for conductor formation, 34: Conductor pattern. Fig. 1 Fig. 3 Fig. 5 Fig. 4

Claims (1)

【特許請求の範囲】[Claims]  1.絶縁体形成用の光硬化性樹脂液の薄層に紫外線を
所要のパターンで照射して、照射した部分のみを硬化さ
せることにより絶縁パターンを形成することと、導体形
成用の光硬化性樹脂液の薄層に紫外線を所要のパターン
で照射して、照射した部分のみを硬化させることにより
導体パターンを形成することとを交互に繰り返し、これ
により絶縁パターンおよび導体パターンを積層して回路
基板を得ることを特徴とする回路基板の製造方法。
1. A thin layer of photocurable resin liquid for forming an insulator is irradiated with ultraviolet rays in a desired pattern, and only the irradiated area is cured to form an insulation pattern, and a photocurable resin liquid for forming a conductor is used. A thin layer of ultraviolet rays is irradiated in a desired pattern to form a conductor pattern by curing only the irradiated area, and this process is repeated alternately to form a conductor pattern, thereby laminating an insulating pattern and a conductor pattern to obtain a circuit board. A method for manufacturing a circuit board, characterized by:
JP28577388A 1988-11-14 1988-11-14 Manufacture of circuit board Pending JPH02132881A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28577388A JPH02132881A (en) 1988-11-14 1988-11-14 Manufacture of circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28577388A JPH02132881A (en) 1988-11-14 1988-11-14 Manufacture of circuit board

Publications (1)

Publication Number Publication Date
JPH02132881A true JPH02132881A (en) 1990-05-22

Family

ID=17695875

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28577388A Pending JPH02132881A (en) 1988-11-14 1988-11-14 Manufacture of circuit board

Country Status (1)

Country Link
JP (1) JPH02132881A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5816783A (en) * 1993-05-19 1998-10-06 Hitachi, Ltd. Electrically driven hermetic compressor
WO2007080943A1 (en) * 2006-01-13 2007-07-19 Matsushita Electric Industrial Co., Ltd. Three-dimensional circuit board and its manufacturing method
JP2007189058A (en) * 2006-01-13 2007-07-26 Matsushita Electric Ind Co Ltd Three-dimensional circuit board and manufacturing method therefor
JP2007208027A (en) * 2006-02-02 2007-08-16 Matsushita Electric Ind Co Ltd Solid circuit board and its manufacturing method
JP2007208028A (en) * 2006-02-02 2007-08-16 Matsushita Electric Ind Co Ltd Manufacturing method of solid interconnection and solid wiring board fabricated thereby
US20100276184A1 (en) * 2007-12-25 2010-11-04 Furukawa Electric Co., Ltd. Multilayer printed board and method for manufacturing the same
JP2015135933A (en) * 2014-01-16 2015-07-27 株式会社ワールドメタル Multilayer wiring board and manufacturing method thereof
JP2016213465A (en) * 2015-05-08 2016-12-15 華邦電子股▲ふん▼有限公司 Multilayer electronic device and manufacturing method therefor

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5816783A (en) * 1993-05-19 1998-10-06 Hitachi, Ltd. Electrically driven hermetic compressor
JP4613828B2 (en) * 2006-01-13 2011-01-19 パナソニック株式会社 3D circuit board and manufacturing method thereof
WO2007080943A1 (en) * 2006-01-13 2007-07-19 Matsushita Electric Industrial Co., Ltd. Three-dimensional circuit board and its manufacturing method
JP2007189058A (en) * 2006-01-13 2007-07-26 Matsushita Electric Ind Co Ltd Three-dimensional circuit board and manufacturing method therefor
US8809693B2 (en) 2006-01-13 2014-08-19 Panasonic Corporation Three-dimensional circuit board
US20120125676A1 (en) * 2006-01-13 2012-05-24 Panasonic Corporation Three-dimensional circuit board and its manufacturing method
US8134081B2 (en) 2006-01-13 2012-03-13 Panasonic Corporation Three-dimensional circuit board and its manufacturing method
JP2007208027A (en) * 2006-02-02 2007-08-16 Matsushita Electric Ind Co Ltd Solid circuit board and its manufacturing method
JP4613847B2 (en) * 2006-02-02 2011-01-19 パナソニック株式会社 Three-dimensional wiring manufacturing method and three-dimensional wiring board manufactured by the manufacturing method
JP4613846B2 (en) * 2006-02-02 2011-01-19 パナソニック株式会社 3D circuit board and manufacturing method thereof
JP2007208028A (en) * 2006-02-02 2007-08-16 Matsushita Electric Ind Co Ltd Manufacturing method of solid interconnection and solid wiring board fabricated thereby
US20100276184A1 (en) * 2007-12-25 2010-11-04 Furukawa Electric Co., Ltd. Multilayer printed board and method for manufacturing the same
US8476534B2 (en) * 2007-12-25 2013-07-02 Furukawa Electric Co., Ltd. Multilayer printed board and method for manufacturing the same
JP2015135933A (en) * 2014-01-16 2015-07-27 株式会社ワールドメタル Multilayer wiring board and manufacturing method thereof
JP2016213465A (en) * 2015-05-08 2016-12-15 華邦電子股▲ふん▼有限公司 Multilayer electronic device and manufacturing method therefor

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