JPH0212663U - - Google Patents

Info

Publication number
JPH0212663U
JPH0212663U JP8958488U JP8958488U JPH0212663U JP H0212663 U JPH0212663 U JP H0212663U JP 8958488 U JP8958488 U JP 8958488U JP 8958488 U JP8958488 U JP 8958488U JP H0212663 U JPH0212663 U JP H0212663U
Authority
JP
Japan
Prior art keywords
peripheral base
flexible
mechanical quantity
semiconductor
flexible portion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8958488U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP8958488U priority Critical patent/JPH0212663U/ja
Publication of JPH0212663U publication Critical patent/JPH0212663U/ja
Pending legal-status Critical Current

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  • Pressure Sensors (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図および第2図a,bは、本考案の一実施
例を示し、第1図は半導体加速度センサの側面図
、第2図aはそのセンサ部の上面図、第2図bは
aの正面図である。第3図は他の実施例を示す断
面図である。第4図は従来の半導体加速度センサ
を示す断面図である。 1:周囲基部、2:撓み部、3:重り部、4:
ピエゾ抵抗、5U,5L:ストツパ、11:半田
バンプ、12:プリント基板、13:鉄板。
1 and 2a and 2b show an embodiment of the present invention, in which FIG. 1 is a side view of a semiconductor acceleration sensor, FIG. 2a is a top view of the sensor part, and FIG. 2b is a. FIG. FIG. 3 is a sectional view showing another embodiment. FIG. 4 is a sectional view showing a conventional semiconductor acceleration sensor. 1: Surrounding base, 2: Flexible part, 3: Weight part, 4:
Piezoresistor, 5U, 5L: Stopper, 11: Solder bump, 12: Printed circuit board, 13: Iron plate.

Claims (1)

【実用新案登録請求の範囲】 半導体基板を加工して、周囲基部と、この周囲
基部に囲まれ該周囲基部に連設される撓み部と、
撓み部に設けられる重り部とを形成し、撓み部の
歪をピエゾ抵抗素子で検出して力学量を検出する
半導体力学量センサにおいて、 前記周囲基部の上下面の少なくとも一方を半田
バンプにより実装基板に接合し、測定範囲内の荷
重入力時に前記撓み部が十分に撓むとともに過大
荷重の入力時に重り部が前記実装基板に当接して
撓み部の歪量を制限するように、前記周囲基部と
実装基板との間隙を前記半田バンプにより形成す
ることを特徴とする半導体力学量センサ。
[Claims for Utility Model Registration] A semiconductor substrate is processed to form a peripheral base, a flexible portion surrounded by the peripheral base and connected to the peripheral base,
In a semiconductor mechanical quantity sensor that forms a weight part provided on a flexible part and detects a mechanical quantity by detecting strain in the flexible part with a piezoresistive element, at least one of the upper and lower surfaces of the peripheral base is attached to a mounting board by solder bumps. The peripheral base and the mounting portion are connected to each other so that the flexible portion is sufficiently bent when a load within the measurement range is input, and the weight portion contacts the mounting board to limit the amount of distortion of the flexible portion when an excessive load is input. A semiconductor mechanical quantity sensor characterized in that a gap between the solder bump and the substrate is formed by the solder bump.
JP8958488U 1988-07-06 1988-07-06 Pending JPH0212663U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8958488U JPH0212663U (en) 1988-07-06 1988-07-06

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8958488U JPH0212663U (en) 1988-07-06 1988-07-06

Publications (1)

Publication Number Publication Date
JPH0212663U true JPH0212663U (en) 1990-01-26

Family

ID=31314129

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8958488U Pending JPH0212663U (en) 1988-07-06 1988-07-06

Country Status (1)

Country Link
JP (1) JPH0212663U (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0367177A (en) * 1989-08-07 1991-03-22 Nippondenso Co Ltd Semiconductor acceleration sensor
JP2004212246A (en) * 2003-01-06 2004-07-29 Hitachi Metals Ltd Acceleration sensor
WO2007061062A1 (en) * 2005-11-25 2007-05-31 Matsushita Electric Works, Ltd. Method for manufacturing wafer level package structure
WO2007061047A1 (en) * 2005-11-25 2007-05-31 Matsushita Electric Works, Ltd. Wafer level package structure and method for manufacturing same
WO2007061056A1 (en) * 2005-11-25 2007-05-31 Matsushita Electric Works, Ltd. Sensor device and method for manufacturing same
WO2007061050A1 (en) * 2005-11-25 2007-05-31 Matsushita Electric Works, Ltd. Sensor device and method for manufacturing same
WO2007061059A1 (en) * 2005-11-25 2007-05-31 Matsushita Electric Works, Ltd. Sensor device and method for manufacturing same

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0367177A (en) * 1989-08-07 1991-03-22 Nippondenso Co Ltd Semiconductor acceleration sensor
JP2004212246A (en) * 2003-01-06 2004-07-29 Hitachi Metals Ltd Acceleration sensor
WO2007061062A1 (en) * 2005-11-25 2007-05-31 Matsushita Electric Works, Ltd. Method for manufacturing wafer level package structure
WO2007061054A1 (en) * 2005-11-25 2007-05-31 Matsushita Electric Works, Ltd. Wafer level package structure and sensor device obtained from such package structure
WO2007061047A1 (en) * 2005-11-25 2007-05-31 Matsushita Electric Works, Ltd. Wafer level package structure and method for manufacturing same
WO2007061056A1 (en) * 2005-11-25 2007-05-31 Matsushita Electric Works, Ltd. Sensor device and method for manufacturing same
WO2007061050A1 (en) * 2005-11-25 2007-05-31 Matsushita Electric Works, Ltd. Sensor device and method for manufacturing same
WO2007061059A1 (en) * 2005-11-25 2007-05-31 Matsushita Electric Works, Ltd. Sensor device and method for manufacturing same
US7674638B2 (en) 2005-11-25 2010-03-09 Panasonic Electric Works Co., Ltd. Sensor device and production method therefor
US8026594B2 (en) 2005-11-25 2011-09-27 Panasonic Electric Works Co., Ltd. Sensor device and production method therefor
US8067769B2 (en) 2005-11-25 2011-11-29 Panasonic Electric Works Co., Ltd. Wafer level package structure, and sensor device obtained from the same package structure
US8080869B2 (en) 2005-11-25 2011-12-20 Panasonic Electric Works Co., Ltd. Wafer level package structure and production method therefor

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