JPH021226B2 - - Google Patents

Info

Publication number
JPH021226B2
JPH021226B2 JP5405081A JP5405081A JPH021226B2 JP H021226 B2 JPH021226 B2 JP H021226B2 JP 5405081 A JP5405081 A JP 5405081A JP 5405081 A JP5405081 A JP 5405081A JP H021226 B2 JPH021226 B2 JP H021226B2
Authority
JP
Japan
Prior art keywords
crystal
vapor deposition
shielding plate
frequency
crystal piece
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP5405081A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57169087A (en
Inventor
Toshio Hayashi
Yasuo Nomura
Toshiki Suganuma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nihon Dempa Kogyo Co Ltd
Original Assignee
Nihon Dempa Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Dempa Kogyo Co Ltd filed Critical Nihon Dempa Kogyo Co Ltd
Priority to JP5405081A priority Critical patent/JPS57169087A/ja
Publication of JPS57169087A publication Critical patent/JPS57169087A/ja
Publication of JPH021226B2 publication Critical patent/JPH021226B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators

Landscapes

  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
JP5405081A 1981-04-10 1981-04-10 Vacuum vapor-deposition device of crystal resonator Granted JPS57169087A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5405081A JPS57169087A (en) 1981-04-10 1981-04-10 Vacuum vapor-deposition device of crystal resonator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5405081A JPS57169087A (en) 1981-04-10 1981-04-10 Vacuum vapor-deposition device of crystal resonator

Publications (2)

Publication Number Publication Date
JPS57169087A JPS57169087A (en) 1982-10-18
JPH021226B2 true JPH021226B2 (cs) 1990-01-10

Family

ID=12959776

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5405081A Granted JPS57169087A (en) 1981-04-10 1981-04-10 Vacuum vapor-deposition device of crystal resonator

Country Status (1)

Country Link
JP (1) JPS57169087A (cs)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2586443B2 (ja) * 1984-07-31 1997-02-26 カシオ計算機株式会社 波形発生装置
JP5550415B2 (ja) * 2010-03-29 2014-07-16 セイコーインスツル株式会社 端子付電気化学セルおよび製造方法

Also Published As

Publication number Publication date
JPS57169087A (en) 1982-10-18

Similar Documents

Publication Publication Date Title
JP2014070969A (ja) レートセンサ及びリニアソース並びに蒸着装置
JP2002515178A (ja) 電子多層素子の製造方法
JPS6340493B2 (cs)
JPH021226B2 (cs)
US3205855A (en) Coating apparatus for producing electrical components
US4080696A (en) Method of making piezoelectric vibrator
JP2017145443A (ja) 膜厚監視装置
JP3720846B2 (ja) 複数の電子多層構成部品の製造方法
JPH021224B2 (cs)
JP2000307368A (ja) 圧電振動子の製造方法
JPH025818B2 (cs)
JPH021225B2 (cs)
US2597511A (en) Selectively demetalizing condenser paper
JPH09256155A (ja) 成膜装置
JPH05129405A (ja) 成膜装置
JP2017190513A (ja) 蒸着装置
GB1428702A (en) System for vapour deposition of thin films
CN213172553U (zh) 一种真空镀膜机的传动系统
JPH09256156A (ja) 成膜装置
US3503368A (en) Apparatus for sequentially vacuum depositing metal film on substrates
JPS6360275A (ja) スパツタリング装置
JPS6123270B2 (cs)
KR20000024501A (ko) 인시츄 물리기상 증착기
CA1298634C (en) Process and machinery for step-and-repeat vacuum-deposition or large-area thin-film-electronics matrix-circuits on monolithic glass panes through small perforated metal masks
JPH0373630B2 (cs)