JPH02116734U - - Google Patents

Info

Publication number
JPH02116734U
JPH02116734U JP2592789U JP2592789U JPH02116734U JP H02116734 U JPH02116734 U JP H02116734U JP 2592789 U JP2592789 U JP 2592789U JP 2592789 U JP2592789 U JP 2592789U JP H02116734 U JPH02116734 U JP H02116734U
Authority
JP
Japan
Prior art keywords
substrate
deposited
inclined surface
holding mechanism
vapor deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2592789U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2592789U priority Critical patent/JPH02116734U/ja
Publication of JPH02116734U publication Critical patent/JPH02116734U/ja
Pending legal-status Critical Current

Links

JP2592789U 1989-03-06 1989-03-06 Pending JPH02116734U (enExample)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2592789U JPH02116734U (enExample) 1989-03-06 1989-03-06

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2592789U JPH02116734U (enExample) 1989-03-06 1989-03-06

Publications (1)

Publication Number Publication Date
JPH02116734U true JPH02116734U (enExample) 1990-09-19

Family

ID=31247092

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2592789U Pending JPH02116734U (enExample) 1989-03-06 1989-03-06

Country Status (1)

Country Link
JP (1) JPH02116734U (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8826854B2 (en) 2009-01-09 2014-09-09 Shin-Etsu Chemical Co., Ltd. Direct-current plasma CVD apparatus and method for producing diamond using the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8826854B2 (en) 2009-01-09 2014-09-09 Shin-Etsu Chemical Co., Ltd. Direct-current plasma CVD apparatus and method for producing diamond using the same

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