JPH02109325A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPH02109325A
JPH02109325A JP26263788A JP26263788A JPH02109325A JP H02109325 A JPH02109325 A JP H02109325A JP 26263788 A JP26263788 A JP 26263788A JP 26263788 A JP26263788 A JP 26263788A JP H02109325 A JPH02109325 A JP H02109325A
Authority
JP
Japan
Prior art keywords
film
impurity
insulating film
silicon layer
reduction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP26263788A
Other languages
Japanese (ja)
Inventor
Hideaki Kuroda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP26263788A priority Critical patent/JPH02109325A/en
Publication of JPH02109325A publication Critical patent/JPH02109325A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To prevent the reduction in resistance by an etching residue by forming an amorphous silicon layer and conducting the treatment before patterning at a low temperature causing no grain growth.
CONSTITUTION: An element separating insulating film 2, a gate insulating film 3, and an amorphous silicon layer 4 are successively formed on the surface of a substrate 1. Then, a high melting point metal silicide film 5 such as WSix, MoSix or TaSix is formed at a low temperature not more than 600°C by CVD process. An impurity such as phosphor is ion-impregnated with such an impregnation energy as to dope the impurity only into the film 5. Then, an insulating film 6 is formed at a temperature not more than 600°C, and then the films 5 and 4 are subjected to photoetching to form a gate electrode. Thereafter, when a diffusion treatment is carried out at a high temperature, the impurity in the film 5 is diffused in the film 4, which film 4 is then made conductive and polycrystallized. Hence, the grain growth is never caused, and the reduction in resistance by the etching residue can be prevented.
COPYRIGHT: (C)1990,JPO&Japio
JP26263788A 1988-10-18 1988-10-18 Manufacture of semiconductor device Pending JPH02109325A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26263788A JPH02109325A (en) 1988-10-18 1988-10-18 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26263788A JPH02109325A (en) 1988-10-18 1988-10-18 Manufacture of semiconductor device

Publications (1)

Publication Number Publication Date
JPH02109325A true JPH02109325A (en) 1990-04-23

Family

ID=17378551

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26263788A Pending JPH02109325A (en) 1988-10-18 1988-10-18 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPH02109325A (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5877838A (en) * 1997-04-28 1999-03-02 Contour Optik Inc. Eyeglass appliance having clamping members
US5883688A (en) * 1997-04-28 1999-03-16 Contour Optik, Inc. Eyeglass frames with arms and flaps
US5882101A (en) * 1997-04-28 1999-03-16 Contour Optik Inc. Auxiliary frames with ears and lateral projections
US5883689A (en) * 1997-04-28 1999-03-16 Contour Optik Inc. Auxiliary frames with clamping members including resilient mechanisms
US6012811A (en) * 1996-12-13 2000-01-11 Contour Optik, Inc. Eyeglass frames with magnets at bridges for attachment
US6109747A (en) * 1997-04-28 2000-08-29 Contour Optik, Inc. Eyeglass frames with magnets in flanges
US6170948B1 (en) 1997-04-28 2001-01-09 Contour Optik Inc. Eyeglass device having auxiliary frame
USRE37545E1 (en) 1995-11-07 2002-02-12 Contour Optik, Inc. Auxiliary lenses for eyeglasses
US6364478B1 (en) 1999-10-13 2002-04-02 Arun Jaswant Jagasia Eyeglass device having primary and auxiliary frames with lenses and method of forming the same
US6811254B2 (en) 2002-11-08 2004-11-02 Chic Optic Inc. Eyeglass with auxiliary lenses
KR100517422B1 (en) * 1997-04-18 2005-12-01 이라 러너, 인코오포레이티드 Glasses with a single block

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USRE37545E1 (en) 1995-11-07 2002-02-12 Contour Optik, Inc. Auxiliary lenses for eyeglasses
US6092896A (en) * 1996-12-13 2000-07-25 Contour Optik, Inc. Eye-wear with magnets
US6367926B1 (en) 1996-12-13 2002-04-09 Contour Optik, Inc. Eye-wear with magnets
US6012811A (en) * 1996-12-13 2000-01-11 Contour Optik, Inc. Eyeglass frames with magnets at bridges for attachment
KR100517422B1 (en) * 1997-04-18 2005-12-01 이라 러너, 인코오포레이티드 Glasses with a single block
US6109747A (en) * 1997-04-28 2000-08-29 Contour Optik, Inc. Eyeglass frames with magnets in flanges
US5877838A (en) * 1997-04-28 1999-03-02 Contour Optik Inc. Eyeglass appliance having clamping members
US6170948B1 (en) 1997-04-28 2001-01-09 Contour Optik Inc. Eyeglass device having auxiliary frame
US5883689A (en) * 1997-04-28 1999-03-16 Contour Optik Inc. Auxiliary frames with clamping members including resilient mechanisms
US5882101A (en) * 1997-04-28 1999-03-16 Contour Optik Inc. Auxiliary frames with ears and lateral projections
US5883688A (en) * 1997-04-28 1999-03-16 Contour Optik, Inc. Eyeglass frames with arms and flaps
US6364478B1 (en) 1999-10-13 2002-04-02 Arun Jaswant Jagasia Eyeglass device having primary and auxiliary frames with lenses and method of forming the same
US6612694B2 (en) 1999-10-13 2003-09-02 Arun Jaswant Jagasia Eyeglass device having magnetically attached primary and auxiliary frames and method of forming the device
US6811254B2 (en) 2002-11-08 2004-11-02 Chic Optic Inc. Eyeglass with auxiliary lenses

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