JPH0193426A - 強磁性化合物およびその薄膜製造方法 - Google Patents
強磁性化合物およびその薄膜製造方法Info
- Publication number
- JPH0193426A JPH0193426A JP62247452A JP24745287A JPH0193426A JP H0193426 A JPH0193426 A JP H0193426A JP 62247452 A JP62247452 A JP 62247452A JP 24745287 A JP24745287 A JP 24745287A JP H0193426 A JPH0193426 A JP H0193426A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- target
- film
- compound
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/46—Sputtering by ion beam produced by an external ion source
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Soft Magnetic Materials (AREA)
- Compounds Of Iron (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62247452A JPH0193426A (ja) | 1987-09-30 | 1987-09-30 | 強磁性化合物およびその薄膜製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62247452A JPH0193426A (ja) | 1987-09-30 | 1987-09-30 | 強磁性化合物およびその薄膜製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0193426A true JPH0193426A (ja) | 1989-04-12 |
| JPH0379296B2 JPH0379296B2 (enExample) | 1991-12-18 |
Family
ID=17163655
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62247452A Granted JPH0193426A (ja) | 1987-09-30 | 1987-09-30 | 強磁性化合物およびその薄膜製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0193426A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110556225A (zh) * | 2018-06-04 | 2019-12-10 | 清华大学 | 铁磁绝缘材料、制备方法及应用 |
-
1987
- 1987-09-30 JP JP62247452A patent/JPH0193426A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110556225A (zh) * | 2018-06-04 | 2019-12-10 | 清华大学 | 铁磁绝缘材料、制备方法及应用 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0379296B2 (enExample) | 1991-12-18 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |