JPH0183073U - - Google Patents
Info
- Publication number
- JPH0183073U JPH0183073U JP1987165222U JP16522287U JPH0183073U JP H0183073 U JPH0183073 U JP H0183073U JP 1987165222 U JP1987165222 U JP 1987165222U JP 16522287 U JP16522287 U JP 16522287U JP H0183073 U JPH0183073 U JP H0183073U
- Authority
- JP
- Japan
- Prior art keywords
- substrate support
- vapor phase
- phase growth
- growth apparatus
- sleeve
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 8
- 238000001947 vapour-phase growth Methods 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 3
- 239000002994 raw material Substances 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 claims 3
- 239000004065 semiconductor Substances 0.000 claims 3
- 230000004308 accommodation Effects 0.000 claims 1
- 239000007795 chemical reaction product Substances 0.000 claims 1
- 239000007789 gas Substances 0.000 claims 1
- 239000012495 reaction gas Substances 0.000 claims 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16522287U JPH0345957Y2 (enrdf_load_stackoverflow) | 1987-10-28 | 1987-10-28 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16522287U JPH0345957Y2 (enrdf_load_stackoverflow) | 1987-10-28 | 1987-10-28 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0183073U true JPH0183073U (enrdf_load_stackoverflow) | 1989-06-02 |
JPH0345957Y2 JPH0345957Y2 (enrdf_load_stackoverflow) | 1991-09-27 |
Family
ID=31451511
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16522287U Expired JPH0345957Y2 (enrdf_load_stackoverflow) | 1987-10-28 | 1987-10-28 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0345957Y2 (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010502833A (ja) * | 2006-08-31 | 2010-01-28 | アドバンスド テクノロジー マテリアルズ,インコーポレイテッド | 制御された固体モルフォロジを利用する、固体前駆体に基づいた流体の送出 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4083512B2 (ja) * | 2002-08-30 | 2008-04-30 | 東京エレクトロン株式会社 | 基板処理装置 |
-
1987
- 1987-10-28 JP JP16522287U patent/JPH0345957Y2/ja not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010502833A (ja) * | 2006-08-31 | 2010-01-28 | アドバンスド テクノロジー マテリアルズ,インコーポレイテッド | 制御された固体モルフォロジを利用する、固体前駆体に基づいた流体の送出 |
Also Published As
Publication number | Publication date |
---|---|
JPH0345957Y2 (enrdf_load_stackoverflow) | 1991-09-27 |