JPH0160549B2 - - Google Patents

Info

Publication number
JPH0160549B2
JPH0160549B2 JP61219909A JP21990986A JPH0160549B2 JP H0160549 B2 JPH0160549 B2 JP H0160549B2 JP 61219909 A JP61219909 A JP 61219909A JP 21990986 A JP21990986 A JP 21990986A JP H0160549 B2 JPH0160549 B2 JP H0160549B2
Authority
JP
Japan
Prior art keywords
species
copper plating
electroless copper
treatment
activation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP61219909A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62247078A (ja
Inventor
Rune Aruno Patoritsuku
Jonasan Auabatsuchi Danieru
Richaado Burundoru Kurisutofuaa
Kyaarotsuta Miraa Darorisu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS62247078A publication Critical patent/JPS62247078A/ja
Publication of JPH0160549B2 publication Critical patent/JPH0160549B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28Sensitising or activating

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
JP61219909A 1985-10-29 1986-09-19 無電解銅めつきのPd/Sn種の活性化促進方法 Granted JPS62247078A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/792,425 US4640718A (en) 1985-10-29 1985-10-29 Process for accelerating Pd/Sn seeds for electroless copper plating
US792425 1985-10-29

Publications (2)

Publication Number Publication Date
JPS62247078A JPS62247078A (ja) 1987-10-28
JPH0160549B2 true JPH0160549B2 (enExample) 1989-12-22

Family

ID=25156853

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61219909A Granted JPS62247078A (ja) 1985-10-29 1986-09-19 無電解銅めつきのPd/Sn種の活性化促進方法

Country Status (4)

Country Link
US (1) US4640718A (enExample)
EP (1) EP0221359B1 (enExample)
JP (1) JPS62247078A (enExample)
DE (1) DE3664646D1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4948707A (en) * 1988-02-16 1990-08-14 International Business Machines Corporation Conditioning a non-conductive substrate for subsequent selective deposition of a metal thereon
US4818286A (en) * 1988-03-08 1989-04-04 International Business Machines Corporation Electroless copper plating bath
FR2726205B1 (fr) * 1994-10-28 1997-09-26 Motorola Inc Procede destine a reduire le temps de demarrage dans un bain autocatalytique
US6207351B1 (en) 1995-06-07 2001-03-27 International Business Machines Corporation Method for pattern seeding and plating of high density printed circuit boards
US5997997A (en) * 1997-06-13 1999-12-07 International Business Machines Corp. Method for reducing seed deposition in electroless plating
US6265075B1 (en) 1999-07-20 2001-07-24 International Business Machines Corporation Circuitized semiconductor structure and method for producing such
SG107593A1 (en) * 2002-06-04 2004-12-29 Agency Science Tech & Res Method for electroless metalisation of polymer substrate

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3011920A (en) * 1959-06-08 1961-12-05 Shipley Co Method of electroless deposition on a substrate and catalyst solution therefor
GB1304387A (enExample) * 1970-08-10 1973-01-24
US3798050A (en) * 1971-05-28 1974-03-19 Ppg Industries Inc Catalytic sensitization of substrates for metallization
US4187198A (en) * 1972-08-07 1980-02-05 Kollmorgen Technologies Corp. Novel precious metal sensitizing solutions
US4020009A (en) * 1975-09-30 1977-04-26 Shipley Company, Inc. Catalyst composition and method of preparation
DE2743768C3 (de) * 1977-09-29 1980-11-13 Bayer Ag, 5090 Leverkusen Metallisiertes Textilmaterial
US4600699A (en) * 1983-02-14 1986-07-15 Enthone, Incorporated Reclamation of a palladium-tin based electroless plating catalyst from the exhausted catalyst solution and accompanying rinse waters
JPS59155602A (ja) * 1983-02-25 1984-09-04 Sumitomo Heavy Ind Ltd エヤシリンダの速度調整装置

Also Published As

Publication number Publication date
JPS62247078A (ja) 1987-10-28
DE3664646D1 (en) 1989-08-31
US4640718A (en) 1987-02-03
EP0221359A1 (en) 1987-05-13
EP0221359B1 (en) 1989-07-26

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