JPH0159961B2 - - Google Patents
Info
- Publication number
- JPH0159961B2 JPH0159961B2 JP58049708A JP4970883A JPH0159961B2 JP H0159961 B2 JPH0159961 B2 JP H0159961B2 JP 58049708 A JP58049708 A JP 58049708A JP 4970883 A JP4970883 A JP 4970883A JP H0159961 B2 JPH0159961 B2 JP H0159961B2
- Authority
- JP
- Japan
- Prior art keywords
- reaction
- chlorine
- solution
- sodium hypochlorite
- sodium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 72
- 238000006243 chemical reaction Methods 0.000 claims description 46
- 239000000460 chlorine Substances 0.000 claims description 43
- 229910052801 chlorine Inorganic materials 0.000 claims description 42
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 40
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 claims description 36
- 239000005708 Sodium hypochlorite Substances 0.000 claims description 35
- 239000000243 solution Substances 0.000 claims description 22
- 238000003756 stirring Methods 0.000 claims description 20
- 239000007788 liquid Substances 0.000 claims description 18
- 239000007864 aqueous solution Substances 0.000 claims description 15
- 239000012295 chemical reaction liquid Substances 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 54
- 239000011780 sodium chloride Substances 0.000 description 27
- 238000000034 method Methods 0.000 description 17
- 239000013078 crystal Substances 0.000 description 16
- 239000002994 raw material Substances 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 5
- 239000002244 precipitate Substances 0.000 description 5
- 238000001914 filtration Methods 0.000 description 4
- 238000000354 decomposition reaction Methods 0.000 description 3
- 239000000706 filtrate Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- XTEGARKTQYYJKE-UHFFFAOYSA-M Chlorate Chemical compound [O-]Cl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-M 0.000 description 2
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- BZSXEZOLBIJVQK-UHFFFAOYSA-N 2-methylsulfonylbenzoic acid Chemical compound CS(=O)(=O)C1=CC=CC=C1C(O)=O BZSXEZOLBIJVQK-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000005660 chlorination reaction Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 239000012456 homogeneous solution Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 231100000989 no adverse effect Toxicity 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000002912 waste gas Substances 0.000 description 1
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4970883A JPS59182204A (ja) | 1983-03-26 | 1983-03-26 | 高濃度次亜塩素酸ナトリウム水溶液の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4970883A JPS59182204A (ja) | 1983-03-26 | 1983-03-26 | 高濃度次亜塩素酸ナトリウム水溶液の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59182204A JPS59182204A (ja) | 1984-10-17 |
JPH0159961B2 true JPH0159961B2 (de) | 1989-12-20 |
Family
ID=12838685
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4970883A Granted JPS59182204A (ja) | 1983-03-26 | 1983-03-26 | 高濃度次亜塩素酸ナトリウム水溶液の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59182204A (de) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103241713B (zh) * | 2013-05-15 | 2015-01-14 | 乳源东阳光电化厂 | 一种次氯酸钠的制备方法 |
JP6190718B2 (ja) | 2013-12-26 | 2017-08-30 | 昭和電工株式会社 | 次亜塩素酸ナトリウム水溶液の製造方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5328382A (en) * | 1976-07-27 | 1978-03-16 | Mitsubishi Electric Corp | Production method of semiconductor devi ce |
-
1983
- 1983-03-26 JP JP4970883A patent/JPS59182204A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5328382A (en) * | 1976-07-27 | 1978-03-16 | Mitsubishi Electric Corp | Production method of semiconductor devi ce |
Also Published As
Publication number | Publication date |
---|---|
JPS59182204A (ja) | 1984-10-17 |
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