JPH0158613B2 - - Google Patents

Info

Publication number
JPH0158613B2
JPH0158613B2 JP1472181A JP1472181A JPH0158613B2 JP H0158613 B2 JPH0158613 B2 JP H0158613B2 JP 1472181 A JP1472181 A JP 1472181A JP 1472181 A JP1472181 A JP 1472181A JP H0158613 B2 JPH0158613 B2 JP H0158613B2
Authority
JP
Japan
Prior art keywords
ion
ion beam
alloy
melting point
field evaporation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1472181A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57131360A (en
Inventor
Susumu Nanba
Kenji Gamo
Takeshi Ukegawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RIKEN
Original Assignee
RIKEN
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RIKEN filed Critical RIKEN
Priority to JP1472181A priority Critical patent/JPS57131360A/ja
Publication of JPS57131360A publication Critical patent/JPS57131360A/ja
Publication of JPH0158613B2 publication Critical patent/JPH0158613B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/221—Ion beam deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP1472181A 1981-02-03 1981-02-03 Electric field evaporation type ion source using liquid alloy Granted JPS57131360A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1472181A JPS57131360A (en) 1981-02-03 1981-02-03 Electric field evaporation type ion source using liquid alloy

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1472181A JPS57131360A (en) 1981-02-03 1981-02-03 Electric field evaporation type ion source using liquid alloy

Publications (2)

Publication Number Publication Date
JPS57131360A JPS57131360A (en) 1982-08-14
JPH0158613B2 true JPH0158613B2 (OSRAM) 1989-12-12

Family

ID=11868988

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1472181A Granted JPS57131360A (en) 1981-02-03 1981-02-03 Electric field evaporation type ion source using liquid alloy

Country Status (1)

Country Link
JP (1) JPS57131360A (OSRAM)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59191225A (ja) * 1983-04-15 1984-10-30 Hitachi Ltd 液体金属イオン種合金
EP0472773A1 (de) * 1990-08-31 1992-03-04 Trw Repa Gmbh Befestigung eines schwenkbaren Verankerungsbeschlages in einem Sicherheitsgurtsystem

Also Published As

Publication number Publication date
JPS57131360A (en) 1982-08-14

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