JPS57131360A - Electric field evaporation type ion source using liquid alloy - Google Patents

Electric field evaporation type ion source using liquid alloy

Info

Publication number
JPS57131360A
JPS57131360A JP1472181A JP1472181A JPS57131360A JP S57131360 A JPS57131360 A JP S57131360A JP 1472181 A JP1472181 A JP 1472181A JP 1472181 A JP1472181 A JP 1472181A JP S57131360 A JPS57131360 A JP S57131360A
Authority
JP
Japan
Prior art keywords
electric field
evaporation type
field evaporation
ion source
alloy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1472181A
Other languages
Japanese (ja)
Other versions
JPH0158613B2 (en
Inventor
Susumu Nanba
Kenji Gamo
Takeshi Ukegawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RIKEN Institute of Physical and Chemical Research
Original Assignee
RIKEN Institute of Physical and Chemical Research
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RIKEN Institute of Physical and Chemical Research filed Critical RIKEN Institute of Physical and Chemical Research
Priority to JP1472181A priority Critical patent/JPS57131360A/en
Publication of JPS57131360A publication Critical patent/JPS57131360A/en
Publication of JPH0158613B2 publication Critical patent/JPH0158613B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/221—Ion beam deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon

Abstract

PURPOSE:To manufacture an electric field evaporation type B ion beam source having a low m.p. and high efficiency by regulating the compositional percentage of B in an Ni-Pt-B alloy obtd. by mixing Ni-B and Pt-B which are eutectic alloys of B to a specified range. CONSTITUTION:Ni-B and Pt-B which are eutectic alloys of B each having a low m.p. are mixed to manufacture a ternary Ni-Pt-B alloy contg. 20-45% B. This Ni-Pt-B alloy has a low m.p. such as about 600-700 deg.C as an electric field evaporation type ion source and wets well a W wire as an emitter tip to efficiently generate B ion beams. The intensity of B ion beams reaches about 30% of the total intensity of ion beams.
JP1472181A 1981-02-03 1981-02-03 Electric field evaporation type ion source using liquid alloy Granted JPS57131360A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1472181A JPS57131360A (en) 1981-02-03 1981-02-03 Electric field evaporation type ion source using liquid alloy

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1472181A JPS57131360A (en) 1981-02-03 1981-02-03 Electric field evaporation type ion source using liquid alloy

Publications (2)

Publication Number Publication Date
JPS57131360A true JPS57131360A (en) 1982-08-14
JPH0158613B2 JPH0158613B2 (en) 1989-12-12

Family

ID=11868988

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1472181A Granted JPS57131360A (en) 1981-02-03 1981-02-03 Electric field evaporation type ion source using liquid alloy

Country Status (1)

Country Link
JP (1) JPS57131360A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1984004202A1 (en) * 1983-04-15 1984-10-25 Hitachi Ltd Alloy containing liquid metal ion species
JPH04230447A (en) * 1990-08-31 1992-08-19 Trw Repa Gmbh Clamping device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1984004202A1 (en) * 1983-04-15 1984-10-25 Hitachi Ltd Alloy containing liquid metal ion species
JPH04230447A (en) * 1990-08-31 1992-08-19 Trw Repa Gmbh Clamping device

Also Published As

Publication number Publication date
JPH0158613B2 (en) 1989-12-12

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