JPH0155447B2 - - Google Patents
Info
- Publication number
- JPH0155447B2 JPH0155447B2 JP56078358A JP7835881A JPH0155447B2 JP H0155447 B2 JPH0155447 B2 JP H0155447B2 JP 56078358 A JP56078358 A JP 56078358A JP 7835881 A JP7835881 A JP 7835881A JP H0155447 B2 JPH0155447 B2 JP H0155447B2
- Authority
- JP
- Japan
- Prior art keywords
- etching
- light
- silicon wafer
- metal film
- time
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H10P74/203—
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
-
- H10P74/238—
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- ing And Chemical Polishing (AREA)
- Weting (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56078358A JPS57192954A (en) | 1981-05-23 | 1981-05-23 | Surface processing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56078358A JPS57192954A (en) | 1981-05-23 | 1981-05-23 | Surface processing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57192954A JPS57192954A (en) | 1982-11-27 |
| JPH0155447B2 true JPH0155447B2 (OSRAM) | 1989-11-24 |
Family
ID=13659759
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56078358A Granted JPS57192954A (en) | 1981-05-23 | 1981-05-23 | Surface processing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57192954A (OSRAM) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6216523A (ja) * | 1985-07-16 | 1987-01-24 | Toshiba Corp | レジストパタ−ンの現像方法および現像装置 |
| JPS62193247A (ja) * | 1986-02-20 | 1987-08-25 | Fujitsu Ltd | 現像終点決定方法 |
| JPS6412529A (en) * | 1987-07-07 | 1989-01-17 | Sumitomo Gca Kk | Development of wafer |
| KR100452918B1 (ko) * | 2002-04-12 | 2004-10-14 | 한국디엔에스 주식회사 | 두께측정시스템이 구비된 회전식각장치 |
| JP7791677B2 (ja) * | 2021-09-16 | 2025-12-24 | 株式会社Screenホールディングス | 基板処理装置および基板処理方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5120676A (en) * | 1974-08-14 | 1976-02-19 | Dainippon Printing Co Ltd | Fuotomasukuno fushokudoaino kenshutsuhohooyobisochi |
| JPS5197380A (OSRAM) * | 1975-02-21 | 1976-08-26 |
-
1981
- 1981-05-23 JP JP56078358A patent/JPS57192954A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57192954A (en) | 1982-11-27 |
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