JPH0155445B2 - - Google Patents

Info

Publication number
JPH0155445B2
JPH0155445B2 JP57085060A JP8506082A JPH0155445B2 JP H0155445 B2 JPH0155445 B2 JP H0155445B2 JP 57085060 A JP57085060 A JP 57085060A JP 8506082 A JP8506082 A JP 8506082A JP H0155445 B2 JPH0155445 B2 JP H0155445B2
Authority
JP
Japan
Prior art keywords
acid
substrate
photosensitive
solution
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57085060A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57198450A (en
Inventor
Aasaa Chandorosu Edoin
Reihimanisu Erusa
Uorutaa Uirukinsu Junya Kuretasu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Inc
Original Assignee
AT&T Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AT&T Technologies Inc filed Critical AT&T Technologies Inc
Publication of JPS57198450A publication Critical patent/JPS57198450A/ja
Publication of JPH0155445B2 publication Critical patent/JPH0155445B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP57085060A 1981-05-22 1982-05-21 Photosensitive base Granted JPS57198450A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/265,554 US4400461A (en) 1981-05-22 1981-05-22 Process of making semiconductor devices using photosensitive bodies

Publications (2)

Publication Number Publication Date
JPS57198450A JPS57198450A (en) 1982-12-06
JPH0155445B2 true JPH0155445B2 (enExample) 1989-11-24

Family

ID=23010940

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57085060A Granted JPS57198450A (en) 1981-05-22 1982-05-21 Photosensitive base

Country Status (5)

Country Link
US (1) US4400461A (enExample)
JP (1) JPS57198450A (enExample)
CA (1) CA1164262A (enExample)
DE (1) DE3219438A1 (enExample)
GB (1) GB2099168B (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4551416A (en) * 1981-05-22 1985-11-05 At&T Bell Laboratories Process for preparing semiconductors using photosensitive bodies
DE3231145A1 (de) * 1982-08-21 1984-02-23 Basf Ag, 6700 Ludwigshafen Negativ arbeitendes verfahren zur herstellung von reliefbildern oder resistmustern
DE3231457A1 (de) * 1982-08-24 1984-03-01 Siemens AG, 1000 Berlin und 8000 München Verfahren zum erzeugen von strukturen fuer integrierte halbleiterschaltungen durch reaktives ionenaetzen
US4572886A (en) * 1983-11-03 1986-02-25 Texas Instruments Incorporated Optical method for integrated circuit bar identification
DE3340154A1 (de) * 1983-11-07 1985-05-15 Basf Ag, 6700 Ludwigshafen Verfahren zur herstellung von bildmaessig strukturierten resistschichten und fuer dieses verfahren geeigneter trockenfilmresist
US4524121A (en) * 1983-11-21 1985-06-18 Rohm And Haas Company Positive photoresists containing preformed polyglutarimide polymer
US4735885A (en) * 1985-12-06 1988-04-05 Allied Corporation Deep UV photoresist composition with 1,3-disubstituted-5-diazobarbituric acids
DE3642184A1 (de) * 1986-12-10 1988-06-23 Basf Ag Copolymerisate mit o-nitrocarbinolestergruppierungen und deren verwendung
US5158855A (en) * 1987-09-24 1992-10-27 Hitachi, Ltd. α-diazoacetoacetates and photosensitive resin compositions containing the same
JP2540199B2 (ja) * 1988-02-25 1996-10-02 アメリカン テレフォン アンド テレグラフ カムパニー デバイスの製造方法
JP2654339B2 (ja) * 1992-11-24 1997-09-17 インターナショナル・ビジネス・マシーンズ・コーポレイション 感光性レジスト組成物及び基板上にレジスト像を形成する方法
JPH0736196A (ja) * 1993-07-23 1995-02-07 Mitsubishi Electric Corp パターン形成方法
US6124074A (en) * 1999-03-11 2000-09-26 International Business Machines Corporation Photoresist compositions with cyclic olefin polymers and hydrophobic non-steroidal multi-alicyclic additives
US6251560B1 (en) 2000-05-05 2001-06-26 International Business Machines Corporation Photoresist compositions with cyclic olefin polymers having lactone moiety
US6627391B1 (en) 2000-08-16 2003-09-30 International Business Machines Corporation Resist compositions containing lactone additives
US7479362B2 (en) * 2004-04-29 2009-01-20 Seiko Epson Corporation UV decomposable molecules and a photopatternable monomolecular film formed therefrom

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2150691C2 (de) * 1971-10-12 1982-09-09 Basf Ag, 6700 Ludwigshafen Lichtempfindliches Gemisch und Verwendung eines lichtempfindlichen Gemisches zur Herstellung einer Flachdruckplatte
US3949143A (en) * 1973-02-09 1976-04-06 American Can Company Epoxy resin coatings cured with phototropic aromatic nitro compounds
US4086210A (en) * 1976-05-10 1978-04-25 Eastman Kodak Company Radiation sensitive polymeric o-nitrophenyl acetals
US4108839A (en) * 1977-01-21 1978-08-22 E. I. Du Pont De Nemours And Company Photosensitive polyaldehydes and use in photoimaging

Also Published As

Publication number Publication date
GB2099168B (en) 1985-03-06
JPS57198450A (en) 1982-12-06
CA1164262A (en) 1984-03-27
GB2099168A (en) 1982-12-01
US4400461A (en) 1983-08-23
DE3219438A1 (de) 1982-12-09

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