JPH0150894B2 - - Google Patents

Info

Publication number
JPH0150894B2
JPH0150894B2 JP22761182A JP22761182A JPH0150894B2 JP H0150894 B2 JPH0150894 B2 JP H0150894B2 JP 22761182 A JP22761182 A JP 22761182A JP 22761182 A JP22761182 A JP 22761182A JP H0150894 B2 JPH0150894 B2 JP H0150894B2
Authority
JP
Japan
Prior art keywords
group
phenyl
benzyl
methyl
acetoxy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP22761182A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59121042A (ja
Inventor
Yasuhiro Yoneda
Tateo Kitamura
Masashi Myagawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP22761182A priority Critical patent/JPS59121042A/ja
Publication of JPS59121042A publication Critical patent/JPS59121042A/ja
Publication of JPH0150894B2 publication Critical patent/JPH0150894B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP22761182A 1982-12-28 1982-12-28 ネガ型レジスト組成物 Granted JPS59121042A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22761182A JPS59121042A (ja) 1982-12-28 1982-12-28 ネガ型レジスト組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22761182A JPS59121042A (ja) 1982-12-28 1982-12-28 ネガ型レジスト組成物

Publications (2)

Publication Number Publication Date
JPS59121042A JPS59121042A (ja) 1984-07-12
JPH0150894B2 true JPH0150894B2 (en, 2012) 1989-11-01

Family

ID=16863645

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22761182A Granted JPS59121042A (ja) 1982-12-28 1982-12-28 ネガ型レジスト組成物

Country Status (1)

Country Link
JP (1) JPS59121042A (en, 2012)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022172929A1 (ja) 2021-02-09 2022-08-18 信越化学工業株式会社 ゼラチン含有デバイス

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2571072B2 (ja) * 1987-10-16 1997-01-16 日本電信電話株式会社 パターン形成材料及びそれを用いた多層配線板
JP2794607B2 (ja) * 1990-03-22 1998-09-10 ソニー株式会社 光消色性材料組成物を使用したパターン形成方法
JP2850460B2 (ja) * 1990-03-24 1999-01-27 ソニー株式会社 パターン形成方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022172929A1 (ja) 2021-02-09 2022-08-18 信越化学工業株式会社 ゼラチン含有デバイス

Also Published As

Publication number Publication date
JPS59121042A (ja) 1984-07-12

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