JPH0147892B2 - - Google Patents

Info

Publication number
JPH0147892B2
JPH0147892B2 JP55104122A JP10412280A JPH0147892B2 JP H0147892 B2 JPH0147892 B2 JP H0147892B2 JP 55104122 A JP55104122 A JP 55104122A JP 10412280 A JP10412280 A JP 10412280A JP H0147892 B2 JPH0147892 B2 JP H0147892B2
Authority
JP
Japan
Prior art keywords
mark
alignment
electron beam
chip
detected
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55104122A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5728333A (en
Inventor
Takayuki Myazaki
Toshihiko Osada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP10412280A priority Critical patent/JPS5728333A/ja
Publication of JPS5728333A publication Critical patent/JPS5728333A/ja
Publication of JPH0147892B2 publication Critical patent/JPH0147892B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Image Analysis (AREA)
  • Image Processing (AREA)
  • Electron Beam Exposure (AREA)
JP10412280A 1980-07-29 1980-07-29 Method for detecting aligning mark Granted JPS5728333A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10412280A JPS5728333A (en) 1980-07-29 1980-07-29 Method for detecting aligning mark

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10412280A JPS5728333A (en) 1980-07-29 1980-07-29 Method for detecting aligning mark

Publications (2)

Publication Number Publication Date
JPS5728333A JPS5728333A (en) 1982-02-16
JPH0147892B2 true JPH0147892B2 (enrdf_load_stackoverflow) 1989-10-17

Family

ID=14372312

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10412280A Granted JPS5728333A (en) 1980-07-29 1980-07-29 Method for detecting aligning mark

Country Status (1)

Country Link
JP (1) JPS5728333A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2687256B2 (ja) * 1991-03-26 1997-12-08 株式会社ソルテック Ｘ線マスク作成方法
JP2007136260A (ja) * 2005-11-14 2007-06-07 Okamura Corp シュレッダ

Also Published As

Publication number Publication date
JPS5728333A (en) 1982-02-16

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