JPH0147007B2 - - Google Patents
Info
- Publication number
- JPH0147007B2 JPH0147007B2 JP55033882A JP3388280A JPH0147007B2 JP H0147007 B2 JPH0147007 B2 JP H0147007B2 JP 55033882 A JP55033882 A JP 55033882A JP 3388280 A JP3388280 A JP 3388280A JP H0147007 B2 JPH0147007 B2 JP H0147007B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- flexible plate
- exposed surface
- deformation
- chuck
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 122
- 238000006073 displacement reaction Methods 0.000 claims description 37
- 238000000034 method Methods 0.000 claims description 19
- 238000003384 imaging method Methods 0.000 claims description 11
- 238000005259 measurement Methods 0.000 claims description 7
- 235000012431 wafers Nutrition 0.000 description 40
- 238000010586 diagram Methods 0.000 description 8
- 230000003287 optical effect Effects 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 6
- 230000007246 mechanism Effects 0.000 description 5
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 4
- 230000007723 transport mechanism Effects 0.000 description 4
- 238000012546 transfer Methods 0.000 description 3
- 239000010408 film Substances 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005489 elastic deformation Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3388280A JPS56130738A (en) | 1980-03-19 | 1980-03-19 | Method and device for exposure |
DE3110341A DE3110341C2 (de) | 1980-03-19 | 1981-03-17 | Verfahren und Vorrichtung zum Ausrichten eines dünnen Substrats in der Bildebene eines Kopiergerätes |
US06/245,193 US4391511A (en) | 1980-03-19 | 1981-03-18 | Light exposure device and method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3388280A JPS56130738A (en) | 1980-03-19 | 1980-03-19 | Method and device for exposure |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56130738A JPS56130738A (en) | 1981-10-13 |
JPH0147007B2 true JPH0147007B2 (zh) | 1989-10-12 |
Family
ID=12398887
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3388280A Granted JPS56130738A (en) | 1980-03-19 | 1980-03-19 | Method and device for exposure |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56130738A (zh) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4344160A (en) * | 1980-05-02 | 1982-08-10 | The Perkin-Elmer Corporation | Automatic wafer focusing and flattening system |
JPS5815237A (ja) * | 1981-07-21 | 1983-01-28 | Seiko Epson Corp | 半導体製造装置 |
JPS5867026A (ja) * | 1981-10-19 | 1983-04-21 | Hitachi Ltd | ステップアンドリピート方式の露光装置 |
JPS59106118A (ja) * | 1982-12-10 | 1984-06-19 | Hitachi Ltd | 薄板変形装置 |
JPS61112121A (ja) * | 1984-10-24 | 1986-05-30 | Ushio Inc | 露光装置 |
JPS6336526A (ja) * | 1986-07-30 | 1988-02-17 | Oki Electric Ind Co Ltd | ウエハ露光装置 |
US20050035514A1 (en) * | 2003-08-11 | 2005-02-17 | Supercritical Systems, Inc. | Vacuum chuck apparatus and method for holding a wafer during high pressure processing |
NL2006565A (en) | 2010-06-30 | 2012-01-02 | Asml Holding Nv | Reticle clamping system. |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4888871A (zh) * | 1972-02-02 | 1973-11-21 | ||
JPS50152670A (zh) * | 1974-05-28 | 1975-12-08 | ||
JPS5314425A (en) * | 1976-07-27 | 1978-02-09 | Sharp Corp | Liquid fuel combustion device |
-
1980
- 1980-03-19 JP JP3388280A patent/JPS56130738A/ja active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4888871A (zh) * | 1972-02-02 | 1973-11-21 | ||
JPS50152670A (zh) * | 1974-05-28 | 1975-12-08 | ||
JPS5314425A (en) * | 1976-07-27 | 1978-02-09 | Sharp Corp | Liquid fuel combustion device |
Also Published As
Publication number | Publication date |
---|---|
JPS56130738A (en) | 1981-10-13 |
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