JPH0147007B2 - - Google Patents

Info

Publication number
JPH0147007B2
JPH0147007B2 JP55033882A JP3388280A JPH0147007B2 JP H0147007 B2 JPH0147007 B2 JP H0147007B2 JP 55033882 A JP55033882 A JP 55033882A JP 3388280 A JP3388280 A JP 3388280A JP H0147007 B2 JPH0147007 B2 JP H0147007B2
Authority
JP
Japan
Prior art keywords
substrate
flexible plate
exposed surface
deformation
chuck
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55033882A
Other languages
English (en)
Japanese (ja)
Other versions
JPS56130738A (en
Inventor
Nobuyuki Akyama
Yukio Kenbo
Yasuo Nakagawa
Susumu Aiuchi
Mineo Nomoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP3388280A priority Critical patent/JPS56130738A/ja
Priority to DE3110341A priority patent/DE3110341C2/de
Priority to US06/245,193 priority patent/US4391511A/en
Publication of JPS56130738A publication Critical patent/JPS56130738A/ja
Publication of JPH0147007B2 publication Critical patent/JPH0147007B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP3388280A 1980-03-19 1980-03-19 Method and device for exposure Granted JPS56130738A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP3388280A JPS56130738A (en) 1980-03-19 1980-03-19 Method and device for exposure
DE3110341A DE3110341C2 (de) 1980-03-19 1981-03-17 Verfahren und Vorrichtung zum Ausrichten eines dünnen Substrats in der Bildebene eines Kopiergerätes
US06/245,193 US4391511A (en) 1980-03-19 1981-03-18 Light exposure device and method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3388280A JPS56130738A (en) 1980-03-19 1980-03-19 Method and device for exposure

Publications (2)

Publication Number Publication Date
JPS56130738A JPS56130738A (en) 1981-10-13
JPH0147007B2 true JPH0147007B2 (zh) 1989-10-12

Family

ID=12398887

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3388280A Granted JPS56130738A (en) 1980-03-19 1980-03-19 Method and device for exposure

Country Status (1)

Country Link
JP (1) JPS56130738A (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4344160A (en) * 1980-05-02 1982-08-10 The Perkin-Elmer Corporation Automatic wafer focusing and flattening system
JPS5815237A (ja) * 1981-07-21 1983-01-28 Seiko Epson Corp 半導体製造装置
JPS5867026A (ja) * 1981-10-19 1983-04-21 Hitachi Ltd ステップアンドリピート方式の露光装置
JPS59106118A (ja) * 1982-12-10 1984-06-19 Hitachi Ltd 薄板変形装置
JPS61112121A (ja) * 1984-10-24 1986-05-30 Ushio Inc 露光装置
JPS6336526A (ja) * 1986-07-30 1988-02-17 Oki Electric Ind Co Ltd ウエハ露光装置
US20050035514A1 (en) * 2003-08-11 2005-02-17 Supercritical Systems, Inc. Vacuum chuck apparatus and method for holding a wafer during high pressure processing
NL2006565A (en) 2010-06-30 2012-01-02 Asml Holding Nv Reticle clamping system.

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4888871A (zh) * 1972-02-02 1973-11-21
JPS50152670A (zh) * 1974-05-28 1975-12-08
JPS5314425A (en) * 1976-07-27 1978-02-09 Sharp Corp Liquid fuel combustion device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4888871A (zh) * 1972-02-02 1973-11-21
JPS50152670A (zh) * 1974-05-28 1975-12-08
JPS5314425A (en) * 1976-07-27 1978-02-09 Sharp Corp Liquid fuel combustion device

Also Published As

Publication number Publication date
JPS56130738A (en) 1981-10-13

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