JPH0145896B2 - - Google Patents

Info

Publication number
JPH0145896B2
JPH0145896B2 JP56181747A JP18174781A JPH0145896B2 JP H0145896 B2 JPH0145896 B2 JP H0145896B2 JP 56181747 A JP56181747 A JP 56181747A JP 18174781 A JP18174781 A JP 18174781A JP H0145896 B2 JPH0145896 B2 JP H0145896B2
Authority
JP
Japan
Prior art keywords
layer
metal
photosensitive resin
image
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56181747A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5883846A (ja
Inventor
Nobumasa Sasa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP56181747A priority Critical patent/JPS5883846A/ja
Priority to US06/439,427 priority patent/US4455364A/en
Priority to GB08232192A priority patent/GB2113152B/en
Priority to DE19823241980 priority patent/DE3241980A1/de
Publication of JPS5883846A publication Critical patent/JPS5883846A/ja
Priority to GB08428642A priority patent/GB2155861A/en
Priority to GB8428641A priority patent/GB2156088B/en
Publication of JPH0145896B2 publication Critical patent/JPH0145896B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP56181747A 1981-11-14 1981-11-14 金属画像形成材料 Granted JPS5883846A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP56181747A JPS5883846A (ja) 1981-11-14 1981-11-14 金属画像形成材料
US06/439,427 US4455364A (en) 1981-11-14 1982-11-05 Process for forming metallic image, composite material for the same
GB08232192A GB2113152B (en) 1981-11-14 1982-11-11 Process for forming metallic image composite material for the same and treating solution for the same(
DE19823241980 DE3241980A1 (de) 1981-11-14 1982-11-12 Verfahren zur erzeugung eines metallischen bildes sowie verbundmaterial und behandlungsloesung dafuer
GB08428642A GB2155861A (en) 1981-11-14 1984-11-13 A treating solution for use in forming metallic images
GB8428641A GB2156088B (en) 1981-11-14 1984-11-13 A composite material for forming metallic images

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56181747A JPS5883846A (ja) 1981-11-14 1981-11-14 金属画像形成材料

Publications (2)

Publication Number Publication Date
JPS5883846A JPS5883846A (ja) 1983-05-19
JPH0145896B2 true JPH0145896B2 (enrdf_load_html_response) 1989-10-05

Family

ID=16106171

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56181747A Granted JPS5883846A (ja) 1981-11-14 1981-11-14 金属画像形成材料

Country Status (1)

Country Link
JP (1) JPS5883846A (enrdf_load_html_response)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0450845A (ja) * 1990-06-14 1992-02-19 Toyo Ink Mfg Co Ltd レリーフ樹脂印刷版

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5630534B2 (enrdf_load_html_response) * 1973-12-24 1981-07-15
ZA743293B (en) * 1974-03-01 1975-05-28 Pennwalt Corp Non-chromated alkaline etching bath and etching process for aluminium
JPS5821257B2 (ja) * 1974-04-25 1983-04-28 富士写真フイルム株式会社 キンゾクガゾウケイセイザイリヨウ
GB1562586A (en) * 1978-05-12 1980-03-12 Pennwalt Corp Aluminium etching
JPS5538510A (en) * 1978-09-11 1980-03-18 Hitachi Ltd Photosensitive composition

Also Published As

Publication number Publication date
JPS5883846A (ja) 1983-05-19

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