JPH0145739B2 - - Google Patents

Info

Publication number
JPH0145739B2
JPH0145739B2 JP17567281A JP17567281A JPH0145739B2 JP H0145739 B2 JPH0145739 B2 JP H0145739B2 JP 17567281 A JP17567281 A JP 17567281A JP 17567281 A JP17567281 A JP 17567281A JP H0145739 B2 JPH0145739 B2 JP H0145739B2
Authority
JP
Japan
Prior art keywords
pattern
taper
resist
mask
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP17567281A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5877231A (ja
Inventor
Takashi Ookoda
Akira Eda
Hideki Nishida
Hisao Nozawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP56175672A priority Critical patent/JPS5877231A/ja
Publication of JPS5877231A publication Critical patent/JPS5877231A/ja
Publication of JPH0145739B2 publication Critical patent/JPH0145739B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Weting (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP56175672A 1981-11-04 1981-11-04 レジストパタ−ンのテ−パ形成方法 Granted JPS5877231A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56175672A JPS5877231A (ja) 1981-11-04 1981-11-04 レジストパタ−ンのテ−パ形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56175672A JPS5877231A (ja) 1981-11-04 1981-11-04 レジストパタ−ンのテ−パ形成方法

Publications (2)

Publication Number Publication Date
JPS5877231A JPS5877231A (ja) 1983-05-10
JPH0145739B2 true JPH0145739B2 (enrdf_load_stackoverflow) 1989-10-04

Family

ID=16000211

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56175672A Granted JPS5877231A (ja) 1981-11-04 1981-11-04 レジストパタ−ンのテ−パ形成方法

Country Status (1)

Country Link
JP (1) JPS5877231A (enrdf_load_stackoverflow)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60135949A (ja) * 1983-12-23 1985-07-19 Matsushita Electric Works Ltd 光成形体の製造方法
JPS61111533A (ja) * 1984-11-05 1986-05-29 Mitsubishi Electric Corp 感光性樹脂のパタ−ン形成方法
JPH0691066B2 (ja) * 1988-03-25 1994-11-14 日本電信電話株式会社 感光性有機樹脂膜の形成方法
KR100313191B1 (ko) * 1993-10-13 2002-04-06 사와무라 시코 초점평가용패턴및초점평가방법
US6114071A (en) * 1997-11-24 2000-09-05 Asml Masktools Netherlands B.V. Method of fine feature edge tuning with optically-halftoned mask
JP4565711B2 (ja) * 2000-07-26 2010-10-20 リコー光学株式会社 濃度分布マスクの製造方法
JP4521694B2 (ja) * 2004-03-09 2010-08-11 Ｈｏｙａ株式会社 グレートーンマスク及び薄膜トランジスタの製造方法
JP5194925B2 (ja) * 2008-03-25 2013-05-08 オムロン株式会社 レジスト露光方法

Also Published As

Publication number Publication date
JPS5877231A (ja) 1983-05-10

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