JPH0145737B2 - - Google Patents

Info

Publication number
JPH0145737B2
JPH0145737B2 JP58015146A JP1514683A JPH0145737B2 JP H0145737 B2 JPH0145737 B2 JP H0145737B2 JP 58015146 A JP58015146 A JP 58015146A JP 1514683 A JP1514683 A JP 1514683A JP H0145737 B2 JPH0145737 B2 JP H0145737B2
Authority
JP
Japan
Prior art keywords
aperture
hole
forming
conductive thin
rectangular
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58015146A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59141224A (ja
Inventor
Fujio Komata
Kiichi Takamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP58015146A priority Critical patent/JPS59141224A/ja
Priority to US06/515,304 priority patent/US4550258A/en
Publication of JPS59141224A publication Critical patent/JPS59141224A/ja
Publication of JPH0145737B2 publication Critical patent/JPH0145737B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP58015146A 1982-07-27 1983-02-01 荷電ビ−ム露光装置用成形絞り Granted JPS59141224A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP58015146A JPS59141224A (ja) 1983-02-01 1983-02-01 荷電ビ−ム露光装置用成形絞り
US06/515,304 US4550258A (en) 1982-07-27 1983-07-19 Aperture structure for charged beam exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58015146A JPS59141224A (ja) 1983-02-01 1983-02-01 荷電ビ−ム露光装置用成形絞り

Publications (2)

Publication Number Publication Date
JPS59141224A JPS59141224A (ja) 1984-08-13
JPH0145737B2 true JPH0145737B2 (enrdf_load_stackoverflow) 1989-10-04

Family

ID=11880660

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58015146A Granted JPS59141224A (ja) 1982-07-27 1983-02-01 荷電ビ−ム露光装置用成形絞り

Country Status (1)

Country Link
JP (1) JPS59141224A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS59141224A (ja) 1984-08-13

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