JPH0140489B2 - - Google Patents
Info
- Publication number
- JPH0140489B2 JPH0140489B2 JP56136762A JP13676281A JPH0140489B2 JP H0140489 B2 JPH0140489 B2 JP H0140489B2 JP 56136762 A JP56136762 A JP 56136762A JP 13676281 A JP13676281 A JP 13676281A JP H0140489 B2 JPH0140489 B2 JP H0140489B2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- control unit
- photomask
- data
- optical system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56136762A JPS5837923A (ja) | 1981-08-31 | 1981-08-31 | フオトマスクの検査装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56136762A JPS5837923A (ja) | 1981-08-31 | 1981-08-31 | フオトマスクの検査装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5837923A JPS5837923A (ja) | 1983-03-05 |
JPH0140489B2 true JPH0140489B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1989-08-29 |
Family
ID=15182906
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56136762A Granted JPS5837923A (ja) | 1981-08-31 | 1981-08-31 | フオトマスクの検査装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5837923A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0675038B2 (ja) * | 1983-03-11 | 1994-09-21 | ケイエルエイ・インストラメンツ・コ−ポレ−シヨン | 光学検査装置 |
JPS6021523A (ja) * | 1983-07-15 | 1985-02-02 | Toshiba Corp | マスク欠陥検査方法 |
JPS60126830A (ja) * | 1983-12-14 | 1985-07-06 | Nippon Jido Seigyo Kk | パタ−ンの欠陥検査装置に用いる走査方法 |
JPS60138921A (ja) * | 1983-12-27 | 1985-07-23 | Toshiba Corp | パタ−ン形状検査装置 |
JPS60210839A (ja) * | 1984-03-05 | 1985-10-23 | Fujitsu Ltd | レチクルおよびその検査方法 |
KR100465710B1 (ko) * | 2002-10-01 | 2005-01-13 | 엘지전자 주식회사 | 포토마스크의 표면 검사장치 및 방법 |
JP2007085746A (ja) * | 2005-09-20 | 2007-04-05 | Yokohama Rubber Co Ltd:The | 周波数選択板、その検査方法および検査装置 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5654038A (en) * | 1979-10-08 | 1981-05-13 | Toshiba Corp | Checking device for shape of photomask |
-
1981
- 1981-08-31 JP JP56136762A patent/JPS5837923A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5837923A (ja) | 1983-03-05 |