JPH01306569A - 薄膜形成方法とその装置 - Google Patents

薄膜形成方法とその装置

Info

Publication number
JPH01306569A
JPH01306569A JP63138630A JP13863088A JPH01306569A JP H01306569 A JPH01306569 A JP H01306569A JP 63138630 A JP63138630 A JP 63138630A JP 13863088 A JP13863088 A JP 13863088A JP H01306569 A JPH01306569 A JP H01306569A
Authority
JP
Japan
Prior art keywords
substrate
plasma
thin film
film forming
atmospheric pressure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP63138630A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0248626B2 (enExample
Inventor
Sachiko Okazaki
幸子 岡崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Science and Technology Agency
Original Assignee
Research Development Corp of Japan
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Research Development Corp of Japan filed Critical Research Development Corp of Japan
Priority to JP63138630A priority Critical patent/JPH01306569A/ja
Priority to EP89305671A priority patent/EP0346055B1/en
Priority to DE68922244T priority patent/DE68922244T2/de
Publication of JPH01306569A publication Critical patent/JPH01306569A/ja
Priority to US07/522,462 priority patent/US5126164A/en
Publication of JPH0248626B2 publication Critical patent/JPH0248626B2/ja
Priority to US07/774,143 priority patent/US5275665A/en
Priority to US08/401,290 priority patent/US5733610A/en
Granted legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
JP63138630A 1988-06-06 1988-06-06 薄膜形成方法とその装置 Granted JPH01306569A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP63138630A JPH01306569A (ja) 1988-06-06 1988-06-06 薄膜形成方法とその装置
EP89305671A EP0346055B1 (en) 1988-06-06 1989-06-06 Method for causing plasma reaction under atmospheric pressure
DE68922244T DE68922244T2 (de) 1988-06-06 1989-06-06 Verfahren zur Durchführung einer Plasmareaktion bei Atmosphärendruck.
US07/522,462 US5126164A (en) 1988-06-06 1990-05-14 Method of forming a thin polymeric film by plasma reaction under atmospheric pressure
US07/774,143 US5275665A (en) 1988-06-06 1991-10-15 Method and apparatus for causing plasma reaction under atmospheric pressure
US08/401,290 US5733610A (en) 1988-06-06 1995-03-09 Atmospheric pressure plasma reaction method of forming a hydrophobic film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63138630A JPH01306569A (ja) 1988-06-06 1988-06-06 薄膜形成方法とその装置

Publications (2)

Publication Number Publication Date
JPH01306569A true JPH01306569A (ja) 1989-12-11
JPH0248626B2 JPH0248626B2 (enExample) 1990-10-25

Family

ID=15226546

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63138630A Granted JPH01306569A (ja) 1988-06-06 1988-06-06 薄膜形成方法とその装置

Country Status (1)

Country Link
JP (1) JPH01306569A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5225659A (en) * 1991-04-12 1993-07-06 Bridgestone Corporation Method and apparatus for surface treating an axially symmetric substrate at atmosphere pressure
US5284543A (en) * 1990-03-14 1994-02-08 Bridgestone Corporation Method for preparing a rubber-based composite material
US5290378A (en) * 1990-03-14 1994-03-01 Bridgestone Corporation Method for preparing a rubber-based composite material
US6429400B1 (en) 1997-12-03 2002-08-06 Matsushita Electric Works Ltd. Plasma processing apparatus and method
US6465964B1 (en) 1999-10-25 2002-10-15 Matsushita Electric Works, Ltd. Plasma treatment apparatus and plasma generation method using the apparatus

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003041372A (ja) * 2001-08-02 2003-02-13 Konica Corp 大気圧プラズマ処理装置及び大気圧プラズマ処理方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5284543A (en) * 1990-03-14 1994-02-08 Bridgestone Corporation Method for preparing a rubber-based composite material
US5290378A (en) * 1990-03-14 1994-03-01 Bridgestone Corporation Method for preparing a rubber-based composite material
US5225659A (en) * 1991-04-12 1993-07-06 Bridgestone Corporation Method and apparatus for surface treating an axially symmetric substrate at atmosphere pressure
US6429400B1 (en) 1997-12-03 2002-08-06 Matsushita Electric Works Ltd. Plasma processing apparatus and method
US6465964B1 (en) 1999-10-25 2002-10-15 Matsushita Electric Works, Ltd. Plasma treatment apparatus and plasma generation method using the apparatus

Also Published As

Publication number Publication date
JPH0248626B2 (enExample) 1990-10-25

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