JPH01278800A - Static electricity and electromagnetic wave shielding material - Google Patents
Static electricity and electromagnetic wave shielding materialInfo
- Publication number
- JPH01278800A JPH01278800A JP63109330A JP10933088A JPH01278800A JP H01278800 A JPH01278800 A JP H01278800A JP 63109330 A JP63109330 A JP 63109330A JP 10933088 A JP10933088 A JP 10933088A JP H01278800 A JPH01278800 A JP H01278800A
- Authority
- JP
- Japan
- Prior art keywords
- transparent
- thin film
- film layer
- base material
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title claims abstract description 75
- 230000005611 electricity Effects 0.000 title claims abstract description 28
- 230000003068 static effect Effects 0.000 title claims abstract description 28
- 239000010409 thin film Substances 0.000 claims abstract description 73
- 239000010410 layer Substances 0.000 claims abstract description 72
- 239000010408 film Substances 0.000 claims abstract description 54
- 229910052751 metal Inorganic materials 0.000 claims abstract description 44
- 239000002184 metal Substances 0.000 claims abstract description 44
- 239000012790 adhesive layer Substances 0.000 claims abstract description 23
- 239000000758 substrate Substances 0.000 claims description 26
- 238000000034 method Methods 0.000 abstract description 9
- 239000000853 adhesive Substances 0.000 abstract description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 230000000694 effects Effects 0.000 description 12
- 238000002834 transmittance Methods 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 5
- 239000011521 glass Substances 0.000 description 4
- 230000007774 longterm Effects 0.000 description 4
- 206010052128 Glare Diseases 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 239000004417 polycarbonate Substances 0.000 description 3
- 229920000515 polycarbonate Polymers 0.000 description 3
- -1 polyethylene terephthalate Polymers 0.000 description 3
- 238000007738 vacuum evaporation Methods 0.000 description 3
- 229920000049 Carbon (fiber) Polymers 0.000 description 2
- 239000004696 Poly ether ether ketone Substances 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 239000003522 acrylic cement Substances 0.000 description 2
- 239000004917 carbon fiber Substances 0.000 description 2
- 229920002678 cellulose Polymers 0.000 description 2
- 239000001913 cellulose Substances 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 230000004313 glare Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 229920006267 polyester film Polymers 0.000 description 2
- 229920002530 polyetherether ketone Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 238000009751 slip forming Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 208000019695 Migraine disease Diseases 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 208000003464 asthenopia Diseases 0.000 description 1
- JUPQTSLXMOCDHR-UHFFFAOYSA-N benzene-1,4-diol;bis(4-fluorophenyl)methanone Chemical compound OC1=CC=C(O)C=C1.C1=CC(F)=CC=C1C(=O)C1=CC=C(F)C=C1 JUPQTSLXMOCDHR-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 238000009125 cardiac resynchronization therapy Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005421 electrostatic potential Methods 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 230000005923 long-lasting effect Effects 0.000 description 1
- 229910001512 metal fluoride Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052976 metal sulfide Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000013464 silicone adhesive Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000005118 spray pyrolysis Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Laminated Bodies (AREA)
- Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)
- Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
- Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
- Elimination Of Static Electricity (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、各種電子、通信装置、たとえばデイスプレ
ィデバイスなどを備えた装置に取付けられる静電気、電
磁波シールド材に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a static electricity and electromagnetic shielding material that is attached to various electronic and communication devices, such as devices equipped with display devices and the like.
〔従来の技術］
近年、上記電子、通信装置は、業務用だけでなく、一般
家庭にも導入されるようになってきている。そして、こ
れらの装置は、その有用な機能などにより各種業務や家
事などを効率よく処理し社会の発展あるいは生活向上に
役立つものとして評価されている。[Prior Art] In recent years, the above-mentioned electronic and communication devices have been introduced not only for business use but also for general households. Due to their useful functions, these devices efficiently process various tasks and household chores, and are valued as being useful for the development of society and the improvement of people's lives.
しかし、その反面、これらの装置から発生する静電気や
電磁波ノイズなどにより、人体あるいは他の備品などが
影響を受は支障をきたすという問題が起こる。たとえば
、デイスプレィなどを備えた上記装置を操作する作業員
などが経験する目積疲労、目の充血、肩こり、偏頭痛な
どの障害や、家庭におけるテレビやラジオの画像の乱れ
やノイズの発生といった障害が現れる。However, on the other hand, problems arise in that the human body or other equipment may be affected by static electricity or electromagnetic noise generated by these devices. For example, problems such as eye fatigue, bloodshot eyes, stiff shoulders, and migraines experienced by workers who operate the above-mentioned devices equipped with displays, etc., and problems such as distorted images and noise on TVs and radios at home. appears.
このため、従来より上記静電気や電磁波ノイズをシール
ドするシールド材を各種装置内に組込んで該装置類から
発生する静電気や電磁波ノイズをシールドすることが行
われている。For this reason, shielding materials for shielding the static electricity and electromagnetic noise described above have been built into various devices to shield the static electricity and electromagnetic noise generated from the devices.
このシールド材、たとえば上記デイスプレィデバイスな
どを備えた装置における窓材などとして用いられるシー
ルド材としては、外部からデイスプレィ内部を目視でき
るような高い可視光線透過能、つまりすぐれた透明性（
視認性）を有しているとともに、デイスプレィデバイス
などから発生する静電気（高電圧）または電磁波などを
長期間持続してシールドしうる良好なシールド特性を有
していることが要求される。This shielding material, for example used as a window material in a device equipped with the above-mentioned display device, must have high visible light transmittance, that is, excellent transparency (
It is required to have good shielding properties that can sustain long-term shielding from static electricity (high voltage) or electromagnetic waves generated from display devices and the like.
従来のこの種シールド材としては、一般にガラス基板や
ポリカーボネート基板などの透明プラスチック基板上に
メツシュタイプのカーボン繊維や金属コーティング繊維
を貼り合わせたものや、上記透明基板上に金属薄膜を直
接的に形成させたものなどが汎用されている。Conventional shielding materials of this type are generally made by laminating mesh-type carbon fibers or metal-coated fibers onto a transparent plastic substrate such as a glass substrate or polycarbonate substrate, or by directly forming a metal thin film on the transparent substrate. It is widely used.
しかるに、上記従来のシールド材のうち、メツシュタイ
プのカーボン繊維や金属コーティング繊維を用いたもの
は、基板を透過する像や物体が該メツシュ部で切断され
たり、光の反射による散乱によりゆらぎを生じ視認性を
悪くさせるといった問題があり、またメツシュタイプの
ため静電気、電磁波シールド効果が低い。However, among the above-mentioned conventional shielding materials, those using mesh-type carbon fibers or metal-coated fibers may cause images or objects that pass through the substrate to be cut at the mesh portion, or cause fluctuations due to scattering due to light reflection, making it difficult to see. There are problems such as poor performance, and because it is a mesh type, it has low static electricity and electromagnetic shielding effect.
一方、金属薄膜を用いたものは、基板上に金属薄膜が外
部に露出された状態で形成されるため、長期使用中には
この表面が酸化されシールド能が低下するので、シール
ド効果の持続性、つまり耐久性の悪いものとなる。On the other hand, with metal thin films, the metal thin film is formed on the substrate with it exposed to the outside, so during long-term use, this surface will oxidize and the shielding ability will decrease, so the sustainability of the shielding effect will be limited. , that is, the durability is poor.
このため、上記金属薄膜を基板上に厚膜として形成させ
、シールド能を持続させることも試みられたが、この場
合には厚膜によって金属層の透明性が低下するのでシー
ルド材として不適となるなどの問題があり、したがって
、シールド性あるいは透明性のどちらも同時に満足させ
るものができないものとなっていた。For this reason, attempts have been made to form the above-mentioned thin metal film as a thick film on the substrate to maintain the shielding ability, but in this case, the thick film reduces the transparency of the metal layer, making it unsuitable as a shielding material. Therefore, it has become impossible to simultaneously satisfy both shielding properties and transparency.
また、上述のように、金属薄膜を透明基板上に直接的に
形成させ、かつこの金属薄膜が外部に露出しているため
、このようなシールド材を用いて上記装置などへ取付け
あるいは取はずし時には該金属薄膜が損傷され易く、耐
擦傷性が悪いものとなっていた。In addition, as mentioned above, since the metal thin film is formed directly on the transparent substrate and this metal thin film is exposed to the outside, it is difficult to install or remove it from the above device using such a shielding material. The metal thin film was easily damaged and had poor scratch resistance.
したがって、この発明は、上記従来の問題点の解消のた
め、高い可視光線透過能を有するとともに、上記装置の
デイスプレィデバイスなどから発生する静電気や電磁波
などを長期にわたりシールドしうるすぐれたシールド能
を有し、かつその作製時の作業性および耐擦傷性の良好
な静電気、電磁波シールド材を提供することを目的とす
る。Therefore, in order to solve the above-mentioned conventional problems, the present invention has a high visible light transmitting ability and an excellent shielding ability that can shield static electricity and electromagnetic waves generated from the display device of the above-mentioned device for a long period of time. It is an object of the present invention to provide a static electricity and electromagnetic shielding material that has the same properties as the above and has good workability and scratch resistance during production.
この発明者らは、上記の目的を達成するために鋭意検討
した結果、透明なフィルム基材の一方の面に透明な金属
薄膜層を設け、この金属薄膜層上にさらに透明な誘電体
薄膜層を設けて、誘電体で保護された透明導電フィルム
を構成させ、この透明４電フィルムの金属薄膜層、誘電
体薄膜層を有しない開放面に粘着剤層を設けるとともに
、他の透明基板をこの粘着剤層を介して貼り合わせるこ
とにより、可視光線透過能、耐久性、静電気および電磁
波に対するシールド能のいずれの機能をも兼ね備えた部
材が得られて、しかもその作製時の作業性および耐擦傷
性が良好なものであることを知り、この発明を完成させ
るに至った。As a result of intensive studies to achieve the above object, the inventors provided a transparent metal thin film layer on one side of a transparent film base material, and further formed a transparent dielectric thin film layer on this metal thin film layer. A transparent conductive film protected by a dielectric is formed by providing an adhesive layer on the open surface of this transparent 4-electric film that does not have a metal thin film layer or a dielectric thin film layer, and attaching another transparent substrate to this transparent conductive film. By bonding them together via an adhesive layer, it is possible to obtain a member that has the functions of visible light transmission, durability, and shielding ability against static electricity and electromagnetic waves, as well as workability and scratch resistance during production. This led to the completion of this invention.
すなわち、この発明は、透明なフィルム基材と、このフ
ィルム基材の一方の面に設けられた透明な金属薄膜層と
、さらにこの金属薄膜層上に設けられた透明な誘電体薄
膜層と、上記フィルム基材の他面に設けられた透明な粘
着剤層と、この粘着剤層を介して上記フィルム基材と貼
り合わされた透明基板とからなることを特徴とする静電
気、電磁波シールド材に係るものである。That is, the present invention includes a transparent film base material, a transparent metal thin film layer provided on one side of the film base material, and a transparent dielectric thin film layer provided on the metal thin film layer, A static electricity and electromagnetic shielding material comprising a transparent adhesive layer provided on the other surface of the film base material and a transparent substrate bonded to the film base material via the adhesive layer. It is something.
この発明において使用する透明なフィルム基材としては
、透明性を有するフィルムであれば広く適用でき、たと
えばポリエチレンテレフタレート（ＰＥＴ）、ポリイミ
ド（ＰＩ）、ポリエーテルサルフオン（ＰＥＳ）、ポリ
エーテルエーテルケトン（ＰＥＥＫ） 、ポリカーボネ
ート （Ｐ Ｃ）、ポリプロピレン（ＰＰ）、ポリアミ
ド、アクリル、セルロースプロピオーネ（ＣＰ）などの
フィルムが挙げられ、この厚みはフレキシブル性と機械
的強度とを保持しうる５〜３００μｍ程度のものが好ま
しく用いられる。The transparent film substrate used in this invention can be widely applied as long as it has transparency, such as polyethylene terephthalate (PET), polyimide (PI), polyether sulfonate (PES), polyether ether ketone ( PEEK), polycarbonate (PC), polypropylene (PP), polyamide, acrylic, cellulose propione (CP), etc., and the thickness is about 5 to 300 μm to maintain flexibility and mechanical strength. is preferably used.
上記フィルムの厚みが薄くなりすぎると、フィルムの機
械的強度が不足し、また厚くなりすぎるとフィルムのフ
レキシブル性が欠如し、たとえば、ロール状として連続
的に該フィルム表面に上記透明金属薄膜層、透明誘電体
薄膜層あるいは粘着剤層を形成させることが難しくなる
。また、フレキシブル性がないために、上記透明基板を
貼り合わせる際、両者間に浮き現象や気泡が生じ易くな
り密着性を阻害するので好ましくない。If the thickness of the film is too thin, the mechanical strength of the film will be insufficient, and if it is too thick, the film will lack flexibility. It becomes difficult to form a transparent dielectric thin film layer or an adhesive layer. In addition, due to the lack of flexibility, when the transparent substrates are bonded together, floating phenomena and bubbles tend to occur between the two, which impairs adhesion, which is not preferable.
この発明においては上述のように透明なフィルム基材を
ロール状として、このフィルム基材上に連続して金属薄
膜層、誘電体薄膜層あるいは粘着剤層を形成させること
ができ、またこの状態において上記透明基板と貼り合わ
せることができるので、従来のように遂−透明基板上に
金属薄膜層を形成させる単一操作を繰り返して行うとい
った手数を要することもなく、作業容易性と生産性の向
上が実現できる。In this invention, as described above, a transparent film base material is formed into a roll, and a metal thin film layer, a dielectric thin film layer, or an adhesive layer can be continuously formed on this film base material, and in this state, Since it can be bonded to the transparent substrate mentioned above, there is no need to repeat the single operation of forming a metal thin film layer on the transparent substrate as in the past, improving workability and productivity. can be realized.
この発明において上記フィルム基材の一方の面に設けら
れる透明な金属薄膜層は、静電気および電磁波シールド
能を備えてなるもので、その材料としては、Ａｇ、Ａｕ
、Ｃｕ、ＡＩ、Ｐｄ、Ｐｔ。In this invention, the transparent metal thin film layer provided on one side of the film base material has static electricity and electromagnetic shielding ability, and its material includes Ag, Au.
, Cu, AI, Pd, Pt.
Ｓ ｎ ％ Ｉ ｎ ＳＺ ｎ ％ Ｔ １％ Ｃｄ
ｓ Ｆ ｅ ％ Ｃｏ、Ｃｒ、Ｎｉなどの金属または合
金などが挙げられる。S n % I n SZ n % T 1% Cd
Examples include metals or alloys such as s F e % Co, Cr, and Ni.
このような金属７ｉＪ膜層は、たとえば真空蒸着法、ス
パッタリング法、イオンブレーティング法、化学蒸着法
、スプレー熱分解法、化学メツキ法、電気メツキ法また
はこれらの組み合わせ法などの公知の薄膜形成技術によ
り容易に形成することができるが、このうち析出）Ｗ膜
の均一性、膜形成速度および作業性の面からみて真空蒸
着法がもっとも好ましい。Such a metal 7iJ film layer can be formed using known thin film forming techniques such as vacuum evaporation, sputtering, ion blating, chemical vapor deposition, spray pyrolysis, chemical plating, electroplating, or a combination thereof. Among them, the vacuum evaporation method is the most preferable in terms of uniformity of the precipitated W film, film formation speed, and workability.
この金属薄膜層の厚みは、目的により適宜設定できるが
、この発明の用途などから勘案して一般に３０〜６００
人程度とするのがよく、これより薄すぎると膜構造上の
欠陥により静電気や電磁波シールド能が低下し、かつ膜
の安定性に欠け、逆に厚くなりすぎると可視光線透過能
が低下するため、いずれの場合もシールド材として適さ
なくなる。The thickness of this metal thin film layer can be set appropriately depending on the purpose, but it is generally 30 to 600 mm in consideration of the application of this invention.
It is best to make it about the same thickness as a human body.If it is too thin, the electrostatic and electromagnetic wave shielding ability will decrease due to defects in the membrane structure, and the membrane will lack stability.On the other hand, if it is too thick, the visible light transmittance will decrease. In either case, it becomes unsuitable as a shielding material.
上記金属薄膜層の表面抵抗は、特に静電シールド用とし
て用いる場合は、１０９Ω／口以下、また電磁波シール
ド用として用いる場合は、１０３Ω／口以下が好ましい
。なお、透明性を保持させる必要から、上記表面抵抗は
１Ω／口以上であることが好ましく、一般には１〜１０
３Ω／口の範囲にあるものが特に好ましく用いられる。The surface resistance of the metal thin film layer is preferably 10 9 Ω/or less when used for electrostatic shielding, and 10 3 Ω/or less when used for electromagnetic shielding. In addition, since it is necessary to maintain transparency, the above-mentioned surface resistance is preferably 1 Ω/mouth or more, and generally 1 to 10
Those in the range of 3Ω/mouth are particularly preferably used.
この発明においては上記の金属薄膜層上にさらに透明な
誘電体薄膜層を設けることにより、金属薄膜層を単独で
設ける場合に比し可視光線透過可能を著しく向上させる
ことができる。また、この誘電体薄膜層は、金属薄膜層
の保護膜としての機能をも有し、長期間使用による金属
薄膜層の酸化を防止し、金属薄膜層の静電気シールド能
や電磁波シールド能を長期的に持続させるための耐久性
の向上にも寄与するものである。In the present invention, by further providing a transparent dielectric thin film layer on the metal thin film layer, visible light transmission can be significantly improved compared to the case where only a metal thin film layer is provided. In addition, this dielectric thin film layer also functions as a protective film for the metal thin film layer, preventing the metal thin film layer from oxidizing due to long-term use, and improving the electrostatic shielding ability and electromagnetic shielding ability of the metal thin film layer over the long term. This also contributes to improving durability so that it can last for a long time.
このような誘電体薄膜層としては、誘電体としての機能
を有する公知の金属酸化物、金属硫化物、金属弗化物な
どが広く適用できる。この発明においては、特に可視光
に対して１．３〜２．３の屈折率を有し、かつ可視光線
透過率が５０％以上、好適には７０％以上であるものが
選択使用される。この代表的な誘電体材料としては、Ｍ
ｇＦｚ、５ｔＯＸ（０＜Ｘ≦２）、Ｓ、、ＯＸ （０く
ｘ≦２）、ＺｎＳなどがあり、その他Ｓ ｉｚ ０３
、ＡＮｚ Ｏ、、Ｔｉｅ、 、Ｔｉ０１Ｂｉ２０３、Ｉ
ｎ２０．〜１、ｚｒｏ□なども使用できる。これらは１
種であっても２種以上を併用してもよい。As such a dielectric thin film layer, a wide range of well-known metal oxides, metal sulfides, metal fluorides, etc. that have a dielectric function can be used. In this invention, those having a refractive index of 1.3 to 2.3 for visible light and a visible light transmittance of 50% or more, preferably 70% or more are selected and used. This typical dielectric material is M
gFz, 5tOX (0<X≦2), S, OX (0x≦2), ZnS, etc., and others S iz 03
,ANz O, ,Tie, ,Ti01Bi203,I
n20. ~1, zro□, etc. can also be used. These are 1
Even if it is a species, two or more kinds may be used in combination.
これら誘電体薄膜層の形成に際しては、真空蒸着法、ス
パッタリング法、イオンブレーティング法などの公知の
薄膜形成技術を採用できる。この薄膜層の厚みは、通常
１００Å以上とするのがよく、薄すぎると連続被膜とな
りにくいため、透明性の向上および下地となる金属薄膜
層の保護を確実に図れない。一方、上限としては６０，
０００Å以下、特に好ましくは１０，０００Å以下とす
るのがよい。この理由は、誘電体薄膜層が厚くなりすぎ
るとフィルム基材と誘電体薄膜層との線膨張率の差異に
よってこの誘電体薄膜層自体にクラック、はがれなどが
発生しやすくなるからである。In forming these dielectric thin film layers, known thin film forming techniques such as vacuum evaporation, sputtering, and ion blasting can be employed. The thickness of this thin film layer is usually preferably 100 Å or more; if it is too thin, it will be difficult to form a continuous film, making it impossible to reliably improve transparency and protect the underlying metal thin film layer. On the other hand, the upper limit is 60,
000 Å or less, particularly preferably 10,000 Å or less. The reason for this is that if the dielectric thin film layer becomes too thick, the dielectric thin film layer itself is likely to crack or peel due to the difference in coefficient of linear expansion between the film base material and the dielectric thin film layer.
なお、誘電体薄膜層の厚さの最適範囲は、使用する誘電
体薄膜層の材質や透明フィルム基材の種類、あるいは金
属薄膜層の材質などにより、また用途上望まれる透明性
、耐久性などの特性に応じて適宜法められるものである
。The optimal range of the thickness of the dielectric thin film layer depends on the material of the dielectric thin film layer used, the type of transparent film base material, the material of the metal thin film layer, etc., and the desired transparency and durability for the purpose of use. The law shall be regulated as appropriate depending on the characteristics of the property.
この発明において、透明フィルム基材の金属薄膜層およ
び誘電体薄膜層を有しない片面に設けられる粘着剤層と
しては、透明性を有するものであれば特に限定なく使用
できるが、たとえばアクリル系粘着剤、シリコン系粘着
剤、ゴム系粘着剤などが好ましく用いられる。この粘着
剤層の弾性係数および厚さは、この発明のシールド材に
おいてかなり重要な要素となるもので、弾性係数として
は１０５〜１０？ｄｙｎ ７ｃｍの範囲、厚さとしては
２μｍ以上、通常５〜５００μｍの範囲とするのが好ま
しい。In this invention, as the adhesive layer provided on one side of the transparent film substrate that does not have a metal thin film layer and a dielectric thin film layer, any transparent material can be used without particular limitation, but for example, an acrylic adhesive can be used. , a silicone adhesive, a rubber adhesive, and the like are preferably used. The elastic modulus and thickness of this adhesive layer are quite important factors in the shield material of the present invention, and the elastic modulus is 105 to 10? It is preferable that the dyn is in the range of 7 cm and the thickness is 2 μm or more, usually in the range of 5 to 500 μm.
すなわち、上記粘着剤層の弾性係数が１０５ｄｙｎ／ｃ
１１１未満の場合には、上記２種の薄膜層を有する透明
フィルム基材と後述する透明基板との貼り合わせ後にお
いて、この粘着剤層が側面にはみ出てくるおそれがあり
、一方１０ ’ ｄｙｎ ７ｃｍを超えると、粘着剤層
自体の硬度が増大しクツション作用が小さくなるので、
上記の透明フィルム基材と透明基板との貼り合わせ時あ
るいはデイスプレィデバイスなどを備えた装置へこのシ
ールド材を取り付けるとき、または取りはずし作業時な
どに、該シールド材の誘電体薄膜層や金属薄膜層を損傷
させ易くなるとといった弊害がでるため、いずれも好ま
しくない。That is, the elastic modulus of the adhesive layer is 105 dyn/c.
If it is less than 111, there is a risk that this adhesive layer will protrude from the side surface after bonding the transparent film base material having the above two types of thin film layers and the transparent substrate described below. If it exceeds , the hardness of the adhesive layer itself will increase and the cushioning effect will be reduced.
When bonding the above-mentioned transparent film base material and transparent substrate together, or when attaching or removing this shielding material to a device equipped with a display device, etc., the dielectric thin film layer or metal thin film layer of the shielding material may be removed. Both are undesirable because they can cause problems such as easy damage to the material.
また、上記粘着剤層の厚みを２μｍ未満とした場合には
、デイスプレィデバイスなどを備えた装置への取付けな
どの際、該シールド材における粘着剤層のクツション作
用が期待できないため、透明フィルム基材上の金属薄膜
層、誘電体薄膜層が押圧操作などにより容易に損傷され
るといった弊害につながり、一方厚くしすぎると、クツ
ション効果は保有するものの、可視光線透過性や作業性
あるいはコストの面で好ましくないといった問題がある
。In addition, if the thickness of the adhesive layer is less than 2 μm, the cushioning effect of the adhesive layer in the shielding material cannot be expected when it is attached to a device equipped with a display device, etc., so the transparent film base This can lead to problems such as the metal thin film layer and dielectric thin film layer on the material being easily damaged by pressing operations, etc. On the other hand, if the thickness is too thick, although the cushioning effect is maintained, the visible light transmittance, workability, and cost are reduced. There is a problem that it is not desirable.
この発明における上記金属薄膜層、誘電体薄膜層を設け
たフィルム基材の担体となる透明基板は、その形状が平
板状または曲形状などのものが採用され、たとえば厚み
が通常１〜１０ｍｍ程度のガラス板や、ポリカーボネー
ト（ＰＣ）、セルロースブロピオーネ（ＣＰ）、アクリ
ルなどの透明なプラスチック板などが用いられる。In the present invention, the transparent substrate serving as a carrier for the film base material provided with the metal thin film layer and the dielectric thin film layer has a flat or curved shape, and has a thickness of usually about 1 to 10 mm. A glass plate, a transparent plastic plate such as polycarbonate (PC), cellulose bropione (CP), or acrylic is used.
なお、上記ガラス板とプラスチック板とを積層させて透
明基板を構成させてもよく、この場合には比較的脆く破
損され易いガラス板の破損時の飛散防止効果が付加され
る。Note that a transparent substrate may be constructed by laminating the above-mentioned glass plate and a plastic plate, and in this case, the glass plate, which is relatively brittle and easily broken, has an added effect of preventing scattering when broken.
第１図は、この発明の静電気、電磁波シールド材の構成
を示すもので、図中１は透明なフィルム基材、２はこの
フィルム基材１の一方の面に設けられた透明な金属薄膜
層、３はこの金属薄膜層２上に設けられた透明な誘電体
薄膜層であり、４は上記フィルム基材２の他面に設けら
れた透明な粘着剤層である。そして、５は上記粘着剤層
４を介してフィルム基材１に貼り合わされた透明基板で
ある。FIG. 1 shows the structure of the static electricity and electromagnetic shielding material of the present invention, in which 1 is a transparent film base material, and 2 is a transparent metal thin film layer provided on one side of this film base material 1. , 3 is a transparent dielectric thin film layer provided on the metal thin film layer 2, and 4 is a transparent adhesive layer provided on the other surface of the film base material 2. Further, 5 is a transparent substrate bonded to the film base material 1 via the adhesive layer 4.
このようなシールド材においてたとえば上記した透明基
板５の表面にアンチグレア−処理、すなわち成形、サン
ドマット、塗工法などにより基板５表面を凹凸形状にし
、光の表面散乱および吸収を増加させることにより表面
反射を少なくさせ、まぶしさをなくするようにして該基
板５の視認性をさらに向上させるようにしてもよい。In such a shielding material, for example, anti-glare treatment is applied to the surface of the transparent substrate 5 described above, that is, the surface of the substrate 5 is made uneven by molding, sand matting, coating, etc., and surface reflection is achieved by increasing surface scattering and absorption of light. The visibility of the substrate 5 may be further improved by reducing the glare and eliminating glare.
以上のように、この発明の静電気、電磁波シールド材は
、すぐれた可視光線透過能、耐久性、静電気および電磁
波シールド能のいずれの機能をも兼ね備えたものである
ため、たとえばデイスプレィデバイスなどを備えた装置
の窓材として適用されれば、その透明性により装置内部
の目視が容易となるとともに、保護層を有する耐久性の
よい金属薄膜層の作用により装置内部から発生する静電
気あるいは電磁波を好適にシールドするという格別の効
果が奏し得られるものとなる。As described above, the static electricity and electromagnetic wave shielding material of the present invention has excellent visible light transmission ability, durability, and static electricity and electromagnetic wave shielding ability, so it can be used in display devices, etc. If used as a window material for equipment, its transparency makes it easy to see the inside of the equipment, and the durable thin metal film layer with a protective layer effectively protects against static electricity and electromagnetic waves generated inside the equipment. This provides an exceptional shielding effect.
また、上記シールド材は、上述のように透明フィルム基
材を用いて構成しているため、たとえばロール状となし
た透明フィルム基材を使用し連続的に該フィルム基材上
に金属薄膜層、誘電体薄膜層あるいは粘着剤層を形成さ
せることができ、かつ該金属Ｆｆｆ１ＭＩ層、誘電体薄
膜層と粘着剤層を形成したフィルム基材と、透明基板と
を連続して貼り合わせることも可能となる。In addition, since the above-mentioned shielding material is constructed using a transparent film base material as described above, for example, a roll-shaped transparent film base material is used and a metal thin film layer is continuously formed on the film base material. A dielectric thin film layer or an adhesive layer can be formed, and it is also possible to successively bond the film base material on which the metal Fff1MI layer, dielectric thin film layer and adhesive layer are formed, and a transparent substrate. Become.
したがって、作業能率と、生産性の飛躍的な向上を期待
できるし、また作製されたシールド材は上記すくれた性
能とともに、既述した粘着剤層のクツション効果により
金属薄膜層、誘電体薄膜層の耐擦傷性が良好なものとな
り、従来にない静電気、電磁波シールド材として広い用
途に適用され得るものとなる。Therefore, we can expect a dramatic improvement in work efficiency and productivity, and in addition to the above-mentioned excellent performance, the fabricated shielding material has a metal thin film layer, dielectric thin film layer, etc. due to the cushioning effect of the adhesive layer mentioned above. It has good scratch resistance and can be applied to a wide range of applications as an unprecedented static electricity and electromagnetic shielding material.
以下に、この発明の実施例を記載してより具体的に説明
する。なお、以下の特性試験は、つぎの方法にて行った
ものである。EXAMPLES Below, examples of the present invention will be described in more detail. In addition, the following characteristic tests were conducted using the following method.
く表面抵抗〉 ４端子法にて測定した。Surface resistance Measured using the 4-terminal method.
く可視光線透過率〉
島津製作所製の分光分析装置ＵＶ−２４０を用いて波長
５５０ｎｍにおける透過率を測定した。Visible Light Transmittance> Transmittance at a wavelength of 550 nm was measured using a spectrometer UV-240 manufactured by Shimadzu Corporation.
く静電気シールド特性〉
春日電気社製の集電式電位測定器ＫＳ−３２５を用いて
、テレビのブラウン管（、ＣＲＴ）表面にシールド材を
設置（アース付き）し、シールド材表面の静電気量（テ
レビＯＮ時）を測定した。なお、シールド材を設置しな
い場合は、４０〜５０ｋＶの静電気電位を持つ。Static electricity shielding characteristics〉 Using a current collecting potential measuring device KS-325 manufactured by Kasuga Denki Co., Ltd., a shield material was installed (grounded) on the surface of a cathode ray tube (CRT) of a TV, and the amount of static electricity on the surface of the shield material (TV ON) was measured. Note that if no shielding material is installed, the electrostatic potential will be 40 to 50 kV.
く電磁波シールド特性〉
アトパンテスト社製の電磁波シールド効果測定装置ＴＲ
−１７３０１を用いて周波数１０’、］０８．１０９１
１ｚの電界シールド効果（ｄＢ）を測定した。Electromagnetic shielding characteristics〉 Electromagnetic shielding effect measuring device TR manufactured by Atopan Test Co., Ltd.
-17301 using frequency 10',]08.1091
The electric field shielding effect (dB) of 1z was measured.
〈耐久性〉
シールド材を８５℃、９５％ＲＨの条件下で５０時間放
置する耐湿性試験を行い、この試験を行う前の初期の表
面抵抗値（ＲＯ）に対する試験後の表面抵抗値（Ｒ）の
変化（Ｒ／ＲＯ）を測定した。この変化（Ｒ／ＲＯ）が
小さいほど酸化劣化が低くて耐久性にすぐれていること
を意味している。<Durability> A moisture resistance test was conducted in which the shielding material was left for 50 hours at 85°C and 95% RH, and the surface resistance value (R ) change (R/RO) was measured. The smaller this change (R/RO) is, the lower the oxidative deterioration and the better the durability.
〈耐擦傷性〉
シールド材の薄膜表面をガーゼで強くごすり、この操作
によって傷が著しくつくものを×、僅かにつくものを△
、はとんどつかないものを○、操作前と全く変わらない
ものを◎として評価した。<Scratch resistance> Rub the surface of the thin film of the shielding material vigorously with gauze. If this operation causes significant scratches, mark it as ×, and if it scratches slightly, mark it as △.
, those that were unreliable were evaluated as ○, and those that were completely unchanged from before the operation were evaluated as ◎.
実施例１
真空蒸着装置のベルジャ内を真空度１〜２×１０−’Ｔ
ｏｒｒとなるように排気したのち、タングステンボート
内にＡｇを蒸着材料として収容し、この蒸着源から２０
ｃｍの距離に透明フィルム基材としての厚さ１１００Ｉ
１のポリエステルフィルムをセットして抵抗加熱法によ
りこのフィルム上に蒸着速度数十人／秒にて厚さ１２０
人のＡｇ薄膜層を形成した。Example 1 The vacuum level inside the bell jar of the vacuum evaporation device is 1 to 2×10-'T.
After evacuating the air to a temperature of
Thickness 1100I as a transparent film base material at a distance of cm
A polyester film of No. 1 was set and a thickness of 120 mm was deposited on this film using a resistance heating method at a vapor deposition rate of several tens of people/second.
A human Ag thin film layer was formed.
次いで、上記真空度に保持された装置内で上記Ａｇ薄膜
層上に抵抗加熱法によりＳｉＯを蒸着速度数十へ／秒に
て真空蒸着し厚さ５００人のＳｉＯ誘電体薄膜層を形成
した。また、上記ポリエステルフィルムの他面側に弾性
係数ｌＸｌ０６ｄｙｎ／ ｃｒｎに調整したアクリル系
の粘着剤を塗布し、約２０μｍ厚の粘着剤層を形成した
。Next, SiO was vacuum deposited on the Ag thin film layer at a deposition rate of several tens of seconds per second on the Ag thin film layer in the apparatus maintained at the vacuum level to form a SiO dielectric thin film layer with a thickness of 500 nm. Further, an acrylic adhesive with an elastic modulus adjusted to lXl06dyn/crn was applied to the other side of the polyester film to form an adhesive layer with a thickness of about 20 μm.
さらに、このフィルムに上記の粘着剤層を介して厚さ２
ｍｍのアクリル板を貼り合わせ、この発明の静電気、
電磁波シールド材とした。Furthermore, this film is coated with a thickness of 2
The static electricity of this invention is
Used as electromagnetic shielding material.
比較例ｌ
５ｉＯ誘電体薄膜層を形成しなかった以外は、実施例１
と同様にして比較用の静電気、電磁波シールド材を作製
した。Comparative Example 1 Example 1 except that the 5iO dielectric thin film layer was not formed.
Comparative static electricity and electromagnetic shielding materials were prepared in the same manner as above.
比較例２
厚さ２龍のアクリル板上に実施例１と同様の方法で厚さ
１２０人のＡｇ薄膜を形成して、比較用の静電気、電磁
波シールド材とした。Comparative Example 2 A thin Ag film with a thickness of 120 mm was formed on an acrylic plate with a thickness of 2 mm in the same manner as in Example 1 to provide a comparative static electricity and electromagnetic shielding material.
上記実施例１と比較例１．２に係る各シールド材の特性
を調べた結果は、つぎの第１表に示されるとおりであっ
た。The results of examining the characteristics of each shielding material according to Example 1 and Comparative Example 1.2 are as shown in Table 1 below.
第 １ 表
実施例２
実施例１と同様の手法にてＡｇ薄膜層に代えて厚さ１２
０人のＡＩ薄膜層を形成し、他は実施例１と全く同様に
してこの発明の静電気、電磁波シールド材を作製した。Table 1 Example 2 The same method as in Example 1 was used to replace the Ag thin film layer with a thickness of 12
A static electricity and electromagnetic shielding material of the present invention was produced in exactly the same manner as in Example 1, except that an AI thin film layer of 0 was formed.
このシールド材の表面抵抗は１５Ω／口、可視光線透過
率は５０％、静電気シールド特性は０．２ＫＶ以下、電
磁波シールド特性は周波数１０’Ｈｚで２０ｄＢ、同１
０８Ｈｚで４０ｄ口、同１０９ｆｉｚで１３ｄＢ、耐久
性（Ｒ／ＲＯ）は２０以下、耐擦傷性は◎であった。The surface resistance of this shielding material is 15Ω/hole, the visible light transmittance is 50%, the electrostatic shielding property is 0.2KV or less, and the electromagnetic shielding property is 20dB at a frequency of 10'Hz, 1
40 dB at 0.08 Hz, 13 dB at 109 Hz, durability (R/RO) was 20 or less, and scratch resistance was ◎.
つぎに、上記の実施例１および実施例２に係る静電気、
電磁波シールド材を、ＣＲＴ、ＬＣＤなどのデイスプレ
ィ前面に取付けて実用テストを行ったところ、良好な視
認性が得られるとともに、耐久性がよいので静電気およ
び電磁波に対するすりしたシールド効果が長期間発揮さ
れることが確認された。さらに、上記デイスプレィ前面
への取付は時においても、傷などの発生はなく、耐擦傷
性も良好であることが証明された。Next, the static electricity according to Example 1 and Example 2 above,
When we conducted practical tests by attaching the electromagnetic shielding material to the front of displays such as CRTs and LCDs, we found that it provided good visibility and was highly durable, providing a long-lasting shielding effect against static electricity and electromagnetic waves. This was confirmed. Furthermore, even when attached to the front surface of the display, no scratches occurred, and the scratch resistance was also proven to be good.
第１図はこの発明の静電気、電磁波シールド材の一例を
示す断面図である。
■・・・透明なフィルム基材、２・・・透明な金属薄膜
層、３・・・透明な誘電体薄膜層、４・・・透明な粘着
剤層、５・・・透明基板
特許出願人 日東電気工業株式会社FIG. 1 is a sectional view showing an example of the static electricity and electromagnetic wave shielding material of the present invention. ■...Transparent film base material, 2...Transparent metal thin film layer, 3...Transparent dielectric thin film layer, 4...Transparent adhesive layer, 5...Transparent substrate patent applicant Nitto Electric Industry Co., Ltd.
Claims (1)
の面に設けられた透明な金属薄膜層と、さらにこの金属
薄膜層上に設けられた透明な誘電体薄膜層と、上記フィ
ルム基材の他面に設けられた透明な粘着剤層と、この粘
着剤層を介して上記フィルム基材と貼り合わされた透明
基板とからなることを特徴とする静電気、電磁波シール
ド材。(1) A transparent film base material, a transparent metal thin film layer provided on one side of this film base material, a transparent dielectric thin film layer provided on this metal thin film layer, and the above film base material. A static electricity and electromagnetic shielding material comprising a transparent adhesive layer provided on the other side of the material, and a transparent substrate bonded to the film base material via the adhesive layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63109330A JP2948591B2 (en) | 1988-05-02 | 1988-05-02 | Static electricity, electromagnetic wave shielding material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63109330A JP2948591B2 (en) | 1988-05-02 | 1988-05-02 | Static electricity, electromagnetic wave shielding material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01278800A true JPH01278800A (en) | 1989-11-09 |
| JP2948591B2 JP2948591B2 (en) | 1999-09-13 |
Family
ID=14507488
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63109330A Expired - Lifetime JP2948591B2 (en) | 1988-05-02 | 1988-05-02 | Static electricity, electromagnetic wave shielding material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2948591B2 (en) |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06139964A (en) * | 1992-10-20 | 1994-05-20 | Mitsubishi Electric Corp | Cathode-ray tube with functional film |
| EP0834898A2 (en) * | 1996-10-01 | 1998-04-08 | Nisshinbo Industries, Inc. | Electromagnetic radiation shield panel and method of producing the same |
| JPH11233991A (en) * | 1998-02-09 | 1999-08-27 | Hitachi Chem Co Ltd | Strippable and removable electromagnetic wave shielding adhesive film and electromagnetic wave shielding component and display using the same |
| US6086979A (en) * | 1997-11-11 | 2000-07-11 | Hitachi Chemical Company, Ltd. | Electromagnetically shielding bonding film, and shielding assembly and display device using such film |
| JP2000208983A (en) * | 1999-01-08 | 2000-07-28 | Teijin Ltd | Transparent electric field wave shielding structure and manufacture thereof |
| US6207266B1 (en) | 1997-06-03 | 2001-03-27 | Hitachi Chemical Company, Ltd. | Electromagnetically shielding bonding film |
| US6733869B2 (en) | 2002-02-21 | 2004-05-11 | Dai Nippon Printing Co., Ltd. | Electromagnetic shielding sheet and method of producing the same |
| US7338752B2 (en) | 2003-05-13 | 2008-03-04 | Samsung Electronics Co., Ltd. | Method for forming metal pattern and electromagnetic interference filter using pattern formed by the method |
| WO2009151056A1 (en) | 2008-06-10 | 2009-12-17 | ダイセル化学工業株式会社 | Layered product having porous layer and functional layered product made with the same |
| US7732038B2 (en) | 2004-07-12 | 2010-06-08 | Dai Nippon Printing Co., Ltd. | Electromagnetic wave shielding filter |
| DE10393020B4 (en) * | 2002-08-08 | 2011-11-17 | Dai Nippon Printing Co., Ltd. | Electromagnetic shielding sheet and method of making the same |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100913307B1 (en) * | 2002-12-12 | 2009-08-26 | 삼성전자주식회사 | Backlight assembly and liquid crystal display device having the same |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60183497U (en) * | 1984-05-15 | 1985-12-05 | 池島 清美 | Transparent sound insulation electromagnetic shielding panel |
| JPS62215202A (en) * | 1986-03-17 | 1987-09-21 | Toray Ind Inc | Transparent plate having electromagnetic-wave shielding property |
-
1988
- 1988-05-02 JP JP63109330A patent/JP2948591B2/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60183497U (en) * | 1984-05-15 | 1985-12-05 | 池島 清美 | Transparent sound insulation electromagnetic shielding panel |
| JPS62215202A (en) * | 1986-03-17 | 1987-09-21 | Toray Ind Inc | Transparent plate having electromagnetic-wave shielding property |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06139964A (en) * | 1992-10-20 | 1994-05-20 | Mitsubishi Electric Corp | Cathode-ray tube with functional film |
| EP0834898A2 (en) * | 1996-10-01 | 1998-04-08 | Nisshinbo Industries, Inc. | Electromagnetic radiation shield panel and method of producing the same |
| EP0834898A3 (en) * | 1996-10-01 | 1998-11-25 | Nisshinbo Industries, Inc. | Electromagnetic radiation shield panel and method of producing the same |
| US6207266B1 (en) | 1997-06-03 | 2001-03-27 | Hitachi Chemical Company, Ltd. | Electromagnetically shielding bonding film |
| US6086979A (en) * | 1997-11-11 | 2000-07-11 | Hitachi Chemical Company, Ltd. | Electromagnetically shielding bonding film, and shielding assembly and display device using such film |
| JPH11233991A (en) * | 1998-02-09 | 1999-08-27 | Hitachi Chem Co Ltd | Strippable and removable electromagnetic wave shielding adhesive film and electromagnetic wave shielding component and display using the same |
| JP2000208983A (en) * | 1999-01-08 | 2000-07-28 | Teijin Ltd | Transparent electric field wave shielding structure and manufacture thereof |
| US6733869B2 (en) | 2002-02-21 | 2004-05-11 | Dai Nippon Printing Co., Ltd. | Electromagnetic shielding sheet and method of producing the same |
| DE10393020B4 (en) * | 2002-08-08 | 2011-11-17 | Dai Nippon Printing Co., Ltd. | Electromagnetic shielding sheet and method of making the same |
| US7338752B2 (en) | 2003-05-13 | 2008-03-04 | Samsung Electronics Co., Ltd. | Method for forming metal pattern and electromagnetic interference filter using pattern formed by the method |
| US7732038B2 (en) | 2004-07-12 | 2010-06-08 | Dai Nippon Printing Co., Ltd. | Electromagnetic wave shielding filter |
| WO2009151056A1 (en) | 2008-06-10 | 2009-12-17 | ダイセル化学工業株式会社 | Layered product having porous layer and functional layered product made with the same |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2948591B2 (en) | 1999-09-13 |
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