JPH0123778B2 - - Google Patents

Info

Publication number
JPH0123778B2
JPH0123778B2 JP20871181A JP20871181A JPH0123778B2 JP H0123778 B2 JPH0123778 B2 JP H0123778B2 JP 20871181 A JP20871181 A JP 20871181A JP 20871181 A JP20871181 A JP 20871181A JP H0123778 B2 JPH0123778 B2 JP H0123778B2
Authority
JP
Japan
Prior art keywords
nitrile rubber
light
antistatic
weight
shielding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP20871181A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58108537A (ja
Inventor
Keiji Kubo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daicel Corp
Original Assignee
Daicel Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daicel Chemical Industries Ltd filed Critical Daicel Chemical Industries Ltd
Priority to JP56208711A priority Critical patent/JPS58108537A/ja
Publication of JPS58108537A publication Critical patent/JPS58108537A/ja
Publication of JPH0123778B2 publication Critical patent/JPH0123778B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP56208711A 1981-12-22 1981-12-22 遮光性マスキングフイルム Granted JPS58108537A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56208711A JPS58108537A (ja) 1981-12-22 1981-12-22 遮光性マスキングフイルム

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56208711A JPS58108537A (ja) 1981-12-22 1981-12-22 遮光性マスキングフイルム

Publications (2)

Publication Number Publication Date
JPS58108537A JPS58108537A (ja) 1983-06-28
JPH0123778B2 true JPH0123778B2 (enrdf_load_stackoverflow) 1989-05-08

Family

ID=16560810

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56208711A Granted JPS58108537A (ja) 1981-12-22 1981-12-22 遮光性マスキングフイルム

Country Status (1)

Country Link
JP (1) JPS58108537A (enrdf_load_stackoverflow)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60103351A (ja) * 1983-11-11 1985-06-07 Daicel Chem Ind Ltd 遮光性マスキングフイルム
JPS62163054A (ja) * 1986-01-11 1987-07-18 Shinko Kagaku Kogyo Kk 帯電防止型遮光性マスキングフイルム
JPS62262851A (ja) * 1986-05-09 1987-11-14 Fujitsu Ltd パタ−ン形成方法
JPS6374052A (ja) * 1986-09-18 1988-04-04 Fuji Photo Film Co Ltd 画像形成材料
JPS63188651U (enrdf_load_stackoverflow) * 1987-05-25 1988-12-02
JPH07120035B2 (ja) * 1987-07-31 1995-12-20 ソマ−ル株式会社 遮光性マスキングフイルム
JPS6446738A (en) * 1987-08-17 1989-02-21 Fuaintetsuku Kenkyusho Kk Antistatic photosensitive laminated film
JPH07111577B2 (ja) * 1988-02-16 1995-11-29 ソマール株式会社 マスキングフィルム
JP2866386B2 (ja) * 1989-01-18 1999-03-08 株式会社きもと 遮光性マスキングフイルム
GB2301050B (en) * 1995-05-12 1999-06-23 Kimoto Company Limited Masking films

Also Published As

Publication number Publication date
JPS58108537A (ja) 1983-06-28

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