JPH0123778B2 - - Google Patents
Info
- Publication number
- JPH0123778B2 JPH0123778B2 JP20871181A JP20871181A JPH0123778B2 JP H0123778 B2 JPH0123778 B2 JP H0123778B2 JP 20871181 A JP20871181 A JP 20871181A JP 20871181 A JP20871181 A JP 20871181A JP H0123778 B2 JPH0123778 B2 JP H0123778B2
- Authority
- JP
- Japan
- Prior art keywords
- nitrile rubber
- light
- antistatic
- weight
- shielding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000203 mixture Substances 0.000 claims description 18
- 239000002216 antistatic agent Substances 0.000 claims description 17
- 229920000459 Nitrile rubber Polymers 0.000 claims description 15
- 230000000873 masking effect Effects 0.000 claims description 8
- 229920003023 plastic Polymers 0.000 claims description 6
- 239000004033 plastic Substances 0.000 claims description 6
- -1 polyethylene terephthalate Polymers 0.000 description 11
- 239000011248 coating agent Substances 0.000 description 10
- 238000000576 coating method Methods 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 229920001577 copolymer Polymers 0.000 description 5
- 239000000975 dye Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 239000000049 pigment Substances 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000000020 Nitrocellulose Substances 0.000 description 2
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229920001220 nitrocellulos Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 229920001897 terpolymer Polymers 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- DHKHKXVYLBGOIT-UHFFFAOYSA-N 1,1-Diethoxyethane Chemical compound CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical class OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical group CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- 229920002433 Vinyl chloride-vinyl acetate copolymer Polymers 0.000 description 1
- SMEGJBVQLJJKKX-HOTMZDKISA-N [(2R,3S,4S,5R,6R)-5-acetyloxy-3,4,6-trihydroxyoxan-2-yl]methyl acetate Chemical compound CC(=O)OC[C@@H]1[C@H]([C@@H]([C@H]([C@@H](O1)O)OC(=O)C)O)O SMEGJBVQLJJKKX-HOTMZDKISA-N 0.000 description 1
- 239000011354 acetal resin Substances 0.000 description 1
- 229940081735 acetylcellulose Drugs 0.000 description 1
- 125000005599 alkyl carboxylate group Chemical class 0.000 description 1
- 229940045714 alkyl sulfonate alkylating agent Drugs 0.000 description 1
- 150000008052 alkyl sulfonates Chemical class 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- HGAZMNJKRQFZKS-UHFFFAOYSA-N chloroethene;ethenyl acetate Chemical compound ClC=C.CC(=O)OC=C HGAZMNJKRQFZKS-UHFFFAOYSA-N 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- KWIUHFFTVRNATP-UHFFFAOYSA-N glycine betaine Chemical class C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 description 1
- 150000002357 guanidines Chemical class 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 150000002462 imidazolines Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229940083254 peripheral vasodilators imidazoline derivative Drugs 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
Description
【発明の詳細な説明】
本発明は、プラスチツク支持体上に帯電防止さ
れた遮光性の剥離層を設けてなる帯電防止された
遮光性マスキングフイルムに関する。
本発明で得られる遮光性マスキングフイルムの
使用目的の一つは写真製版用に用いることにあ
り、必要部分を剥離することにより直ちに種々の
原図を作製することができる。
従来、この目的に用いられているマスキングフ
イルムの剥離層の材質としては、塩化ビニル樹
脂、塩化ビニル系共重合体、ニトロセルロース、
アセチルセルロース等の樹脂の他に可塑剤等が使
用されているが、剥離層の表面のべとつきが大き
く、且つ剥離強度が小さく、作業性に難点があ
る。本発明者等は前記の欠点を改良するために、
剥離層としてプラスチツク支持体に良好な接着性
を有するニトリルゴムと、これと相溶性があり、
且つ室温でべとつきのない物質及び遮光性の染顔
料との混合物を用いることを特開昭54−104902に
提案した。しかし、プラスチツク支持体やニトリ
ルゴムを含む組成物はいずれも電気絶縁性を有す
る為に、遮光性マスキングフイルムの製造時、あ
るいは使用時にマスキングフイルム同志あるいは
マスキングフイルムと他の物質との間での摩擦や
剥離によつて帯電し、塵埃などが付着して種々の
障害を生じ、特に写真感光材料の場合、放電する
際に写真感光層が感光してスタチツクマークを生
ずる欠点があつた。
この解決策として、通常ニトリルゴムを含有す
る組成物溶液に帯電防止剤を添加したものを塗布
する方法が採られているが、帯電防止剤の中には
帯電防止性能は十分なるも、帯電防止剤を添加し
た塗工液の粘度が経時的に上昇し、塗工困難にな
るものがあつた。
本発明者等は、剥離層の剥離性、柔軟性、成膜
性、遮光性及び帯電防止性を損うことなく、且つ
塗工液粘度の経時安定性に優れた帯電防止剤につ
き鋭意検討した結果、イオン性帯電防止剤が好ま
しいことを発見した。
即ち、本発明はプラスチツク支持体上にイオン
性帯電防止剤を含有するニトリルゴム系組成物を
塗布した帯電防止処理された遮光性マスキングフ
イルムに関するものである。
以下に本発明を更に詳しく説明する。
本発明で使用されるプラスチツク支持体として
は、例えばポリエチレンテレフタレート、ポリブ
チレンテレフタレート、ポリオキシベンゾエート
などのポリエステルフイルムあるいはポリカーボ
ネートフイルム等であつて、延伸又は無延伸フイ
ルムが挙げられる。
ニトルゴム系組成物としては、ニトリルゴムあ
るいはニトリルゴムと相溶性があり、且つ室温で
べとつきのない物質との混合物が用いられる。
ニトリルゴムとしては、アクリロニトリル含有
量が19〜51重量%のアクリロニトリル−ブタジエ
ン共重合体又はアクリロニトリル−ブタジエン−
カルボキシル基含有単量体の三元共重合体等が挙
げられる。又、ニトリルゴムと混合して使用する
物質としてはポリ塩化ビニル、塩化ビニル−酢酸
ビニル共重合体、ニトロセルロース、ポリスチレ
ン系樹脂、ポリアクリレート系樹脂、ポリアミド
系樹脂、ポリビニルアセタール系樹脂などが挙げ
られる。特に好ましいものの1例は塩化ビニル−
酢酸ビニル共重合体であり、塩化ビニル単量体と
酢酸ビニル単量体の共重合比は重量比で91〜93:
9〜17の範囲が好ましく、他にカルボキシル基又
はヒドロキシル基を含有する単量体を含む三元共
重合体樹脂であつてもよい。
次に本発明のニトリルゴム系組成物に使用する
イオン性帯電防止剤は、ニトリルゴム系組成物に
用いる溶剤に溶解するものであれば何等さしつか
えない。例えばアルキルスルホン酸塩、アリルス
ルホン酸塩、アルキルスルホコハク酸エステル
塩、硫酸エステルのアミン塩、リン酸エステル
塩、アルキルカルボン酸塩などのアニオン系帯電
防止剤、アルキルアミン塩、アミドアミン又はそ
の塩、エステルアミン第4アンモニウム塩などの
カチオン系帯電防止剤及びグアニジン塩、ベタイ
ン誘導体、イミダゾリン誘導体などの両性帯電防
止剤などがある。これらの帯電防止剤の添加量
は、ニトリルゴム系組成物中の固形分に対し0.5
〜5.0重量%、好ましくは1.0〜4.0重量%である。
添加量が0.5重量%より少ないと帯電防止効果が
なく、5.0重量%より多く添加しても帯電防止効
果は変らず、逆に表面にブリードしてべとつき、
ブロツキングしやすくなり好ましくない。
帯電防止剤にノニオン系帯電防止剤あるいはこ
れとイオン性帯電防止剤との混合物を使用した場
合、調製した塗工液の粘度は経時的に上昇し、約
2週間から1カ月で塗工困難になつてしまう。
遮光性を付与するためにニトリルゴム系組成物
に加える着色剤としては、染料又は顔料及び染料
と顔料との混合物を使用することができ、染料と
してはオイル可溶型染料であつて、ニトリルゴム
系組成物と相溶性が良好で熱及び紫外線に対し色
調の変化の少ないものであればよい。
溶剤としては、アセトン、メチルエチルケト
ン、メチルイソブチルケトン、シクロヘキサノ
ン、酢酸エチル、酢酸ブチル等及びこれらとベン
ゼン、トルエン、キシレン等との混合物が使用で
きる。次に本発明を実施例により具体的に説明す
る。
実施例1〜3、比較例1〜3
下記組成からなる帯電防止剤を含まない遮光性
塗工液を調製した。
塩化ビニル−酢酸ビニル(90:10)共重合体
140重量部
ニトリルゴム(AN含量=33%) 60重量部
ネオザポンレツドGEとネオザポンオレンジGRの
3:1混合物(染料) 16重量部
メチルエチルケトン/トルエン(7:3)の混合
物 1220重量部
上の塗工液に表−1記載の各種帯電防止剤を
4.3重量部添加し、帯電防止性のある遮光性塗工
液を調製した。該塗工液を20℃で放置し、粘度変
化を経時的に測定したところ、実施例1〜3のイ
オン性帯電防止剤を含有した系の粘度は1カ月経
過しても殆んど変化しなかつたが、比較例1〜3
のノニオン系帯電防止剤を含有した系は経時的な
粘度上昇が認められた。
実施例1〜3の塗工液(調製後1カ月経過した
もの)を100μの厚みを有する二軸延伸ポリエチ
レンテレフタレートフイルム上に乾燥後の厚味が
25μになるように塗布、乾燥してルビー色の透明
フイルムを得た。得られたフイルムはいずれも優
れた帯電防止性、ベースフイルムとの適当な剥離
強度、良好な遮光性を有し表面のべとつきは認め
られなかつた。
比較例1〜3の塗工液は粘度が高く塗工できな
かつた。
【表】DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an antistatic, light-shielding masking film comprising an antistatic, light-shielding release layer provided on a plastic support. One of the purposes of using the light-shielding masking film obtained in the present invention is to use it for photolithography, and by peeling off the required portion, various original images can be produced immediately. Conventionally, materials for the release layer of masking films used for this purpose include vinyl chloride resin, vinyl chloride copolymer, nitrocellulose,
Plasticizers and the like are used in addition to resins such as acetyl cellulose, but the surface of the release layer is highly sticky, the peel strength is low, and there are difficulties in workability. In order to improve the above-mentioned drawbacks, the present inventors
Compatible with nitrile rubber which has good adhesion to the plastic support as a release layer;
In addition, the use of a mixture of a substance that is not sticky at room temperature and a light-shielding dye and pigment was proposed in Japanese Patent Application Laid-Open No. 104902/1983. However, since plastic supports and compositions containing nitrile rubber all have electrical insulating properties, friction between masking films or between masking films and other substances occurs during the production or use of light-shielding masking films. When the material is electrostatically charged and peeled off, various problems occur due to the adhesion of dust and the like. Particularly in the case of photographic light-sensitive materials, the photographic light-sensitive layer is exposed to light during discharge, resulting in the formation of static marks. As a solution to this problem, a method is usually adopted in which an antistatic agent is added to a composition solution containing nitrile rubber. The viscosity of the coating solution to which the agent was added increased over time, making coating difficult in some cases. The present inventors have conducted extensive studies on antistatic agents that do not impair the releasability, flexibility, film formability, light shielding properties, and antistatic properties of the release layer and have excellent stability of coating liquid viscosity over time. As a result, it was discovered that ionic antistatic agents are preferable. That is, the present invention relates to an antistatically treated light-shielding masking film in which a nitrile rubber composition containing an ionic antistatic agent is coated on a plastic support. The present invention will be explained in more detail below. Examples of the plastic support used in the present invention include polyester films such as polyethylene terephthalate, polybutylene terephthalate, and polyoxybenzoate, or polycarbonate films, which may be stretched or unstretched. As the nitrile rubber composition, nitrile rubber or a mixture with a substance that is compatible with nitrile rubber and is not sticky at room temperature is used. As the nitrile rubber, an acrylonitrile-butadiene copolymer or an acrylonitrile-butadiene copolymer having an acrylonitrile content of 19 to 51% by weight is used.
Examples include terpolymers of carboxyl group-containing monomers. Further, substances to be used in combination with nitrile rubber include polyvinyl chloride, vinyl chloride-vinyl acetate copolymer, nitrocellulose, polystyrene resin, polyacrylate resin, polyamide resin, polyvinyl acetal resin, etc. . One particularly preferred example is vinyl chloride-
It is a vinyl acetate copolymer, and the copolymerization ratio of vinyl chloride monomer and vinyl acetate monomer is 91 to 93 by weight.
It is preferably in the range of 9 to 17, and may also be a terpolymer resin containing a monomer containing a carboxyl group or a hydroxyl group. Next, any ionic antistatic agent used in the nitrile rubber composition of the present invention may be used as long as it is soluble in the solvent used for the nitrile rubber composition. For example, anionic antistatic agents such as alkyl sulfonates, allyl sulfonates, alkyl sulfosuccinates, amine salts of sulfuric acid esters, phosphate ester salts, alkyl carboxylates, alkyl amine salts, amidoamine or its salts, and esters. Examples include cationic antistatic agents such as amine quaternary ammonium salts, and amphoteric antistatic agents such as guanidine salts, betaine derivatives, and imidazoline derivatives. The amount of these antistatic agents added is 0.5 to the solid content in the nitrile rubber composition.
-5.0% by weight, preferably 1.0-4.0% by weight.
If the amount added is less than 0.5% by weight, there will be no antistatic effect, and if it is added more than 5.0% by weight, the antistatic effect will not change, but on the contrary, it will bleed onto the surface and become sticky.
Blocking tends to occur, which is undesirable. When a nonionic antistatic agent or a mixture of this and an ionic antistatic agent is used as an antistatic agent, the viscosity of the prepared coating solution increases over time, and coating becomes difficult in about 2 weeks to 1 month. I get used to it. As the coloring agent added to the nitrile rubber composition to impart light-shielding properties, dyes, pigments, and mixtures of dyes and pigments can be used. Any material may be used as long as it has good compatibility with the system composition and has little change in color tone with respect to heat and ultraviolet rays. As the solvent, acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, ethyl acetate, butyl acetate, etc., and mixtures of these with benzene, toluene, xylene, etc. can be used. Next, the present invention will be specifically explained using examples. Examples 1 to 3, Comparative Examples 1 to 3 A light-shielding coating liquid containing no antistatic agent and having the following composition was prepared. Vinyl chloride-vinyl acetate (90:10) copolymer
140 parts by weight Nitrile rubber (AN content = 33%) 60 parts by weight 3:1 mixture of Neozapon Red GE and Neozapon Orange GR (dye) 16 parts by weight Mixture of methyl ethyl ketone/toluene (7:3) 1220 parts by weight Top coat Add various antistatic agents listed in Table 1 to the solution.
A light-shielding coating liquid with antistatic properties was prepared by adding 4.3 parts by weight. When the coating solution was left at 20°C and the viscosity change was measured over time, the viscosity of the systems containing the ionic antistatic agents of Examples 1 to 3 showed almost no change even after one month had passed. However, Comparative Examples 1 to 3
In the system containing the nonionic antistatic agent, an increase in viscosity over time was observed. The coating solutions of Examples 1 to 3 (one month after preparation) were coated on a biaxially stretched polyethylene terephthalate film having a thickness of 100 μm to give a thickness after drying.
It was applied to a thickness of 25μ and dried to obtain a ruby-colored transparent film. All of the obtained films had excellent antistatic properties, appropriate peel strength from the base film, and good light shielding properties, and no stickiness was observed on the surface. The coating liquids of Comparative Examples 1 to 3 had high viscosity and could not be coated. 【table】
Claims (1)
を含有するニトリルゴム系組成物を塗布した帯電
防止処理された遮光性マスキングフイルム。1. A light-shielding masking film that has been subjected to antistatic treatment, in which a nitrile rubber composition containing an ionic antistatic agent is coated on a plastic support.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56208711A JPS58108537A (en) | 1981-12-22 | 1981-12-22 | Light shading masking film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56208711A JPS58108537A (en) | 1981-12-22 | 1981-12-22 | Light shading masking film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58108537A JPS58108537A (en) | 1983-06-28 |
JPH0123778B2 true JPH0123778B2 (en) | 1989-05-08 |
Family
ID=16560810
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56208711A Granted JPS58108537A (en) | 1981-12-22 | 1981-12-22 | Light shading masking film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58108537A (en) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60103351A (en) * | 1983-11-11 | 1985-06-07 | Daicel Chem Ind Ltd | Light shieldable masking film |
JPS62163054A (en) * | 1986-01-11 | 1987-07-18 | Shinko Kagaku Kogyo Kk | Antistatic light shading masking film |
JPS62262851A (en) * | 1986-05-09 | 1987-11-14 | Fujitsu Ltd | Formation of pattern |
JPS6374052A (en) * | 1986-09-18 | 1988-04-04 | Fuji Photo Film Co Ltd | Image forming material |
JPS63188651U (en) * | 1987-05-25 | 1988-12-02 | ||
JPH07120035B2 (en) * | 1987-07-31 | 1995-12-20 | ソマ−ル株式会社 | Light-shielding masking film |
JPS6446738A (en) * | 1987-08-17 | 1989-02-21 | Fuaintetsuku Kenkyusho Kk | Antistatic photosensitive laminated film |
JPH07111577B2 (en) * | 1988-02-16 | 1995-11-29 | ソマール株式会社 | Masking film |
JP2866386B2 (en) * | 1989-01-18 | 1999-03-08 | 株式会社きもと | Shading masking film |
GB2301050B (en) * | 1995-05-12 | 1999-06-23 | Kimoto Company Limited | Masking films |
-
1981
- 1981-12-22 JP JP56208711A patent/JPS58108537A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS58108537A (en) | 1983-06-28 |
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