JPH01231937A - Formation of monomolecular film - Google Patents

Abstract

PURPOSE:To form the patterning of a monomolecular film with precision by dipping a substrate on which the patterning is formed in an aq. soln. with a monomolecular film formed on the surface, and forming a monomolecular film on the part of the substrate imparted with hydrophobicity. CONSTITUTION:The patterning is formed in an optional shape on the glass substrate 5 by a photoresist 8, and the substrate is dipped in a soln. 9 of stearyltrichlorodisilane in toluene. The substrate 5 is then dipped in an acetone soln. to release the photoresist 8 by ultrasonic cleaning, and the hydrophobic patterning 10 is formed on the substrate 5. The substrate 5 having the hydrophobic patterning is vertically dipped in an aq. soln. 1 with the monomolecular layer 2 on the surface, and the monomolecular film is deposited on only the hydrophobic part. As a result, the monomolecular film is formed on the substrate 5 in an optional pattern.

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method for forming a monomolecular film on a substrate by the Langmuir-Prodgett method, and particularly to a method for patterning the monomolecular film.

[Conventional technology]

In bioelectronics, which aims to utilize biological molecular functions for sensors and the like, controlling molecules one by one to form them on a substrate is an important issue.

One such method is a monomolecular film forming method called the Langmuir-Fist-Prodget method. This method will be explained below with reference to FIGS. 3 and 4.

A monomolecular layer 2 of the film-formed material is formed on the surface of the aqueous solution 1 . Substances that can form such a monomolecular layer 2 have a hydrophilic group 3, a polar moiety that is easily compatible with the aqueous solution 1, and a hydrophobic group 4, a non-polar moiety that is not compatible with water, coexisting in one molecule. .

When this balanced molecule unfolds on the water surface,
It does not float or sink, but is adsorbed at the interface between water and air, forming a monomolecular layer 2.

Next, the glass substrate 5 is subjected to hydrophobic treatment using stearyltrichlorosilane. When the glass substrate 5 subjected to this hydrophobic treatment is vertically immersed in the aqueous solution 1 containing the monomolecular layer 2 described above, the hydrophobic groups 4 of each monomolecule of the monomolecular layer 2 are immersed.
is attached to the glass substrate 5, and a monomolecular film is formed on the glass substrate 5. In addition, 6 in FIGS. 3 and 4 is a float, and 7 is a weight.

The method for patterning the monomolecular film formed as described above into a predetermined shape is (1) applying mechanical force to peel off unnecessary portions. (2) A photomask is placed on the monomolecular film formed on the glass substrate 5, light is applied to unnecessary parts, and the monomolecular film is destroyed and patterned by the heat. Two methods are used.

[Problem to be solved by the invention]

Among the conventional monolayer patterning methods mentioned above, the former is
Because the monomolecular film is peeled off using mechanical force, it was difficult to accurately draw thin patterns. Further, in the latter method, there was a problem in that the monomolecular film destroyed by light and heat could not be removed from the glass substrate 5 and remained.

The present invention has been made in view of the above, and an object of the present invention is to provide a monomolecular film forming method that enables patterning of a monomolecular film on a glass substrate into an arbitrary pattern with high precision. That is.

[Means and operations for solving the problems] In order to achieve the above object, the method and operations according to the present invention are as follows.

First, a photoresist film is applied onto a glass substrate and patterned using normal photolithography. Photolithography is generally used in the Ic manufacturing process and can perform arbitrary patterning with an accuracy of several microns.

Then, the glass substrate on which the photoresist is patterned is coated with stearyltrichlorosilane CCH3 (CH2).
+7S i CD 3 ) solution to perform hydrophobic treatment on the glass substrate without photoresist. The glass substrate is silicon oxide 5i02, and the surface is hydrophilic due to the presence of OH groups. CH3 (CH2) +
7slcΩ3 reacts with water contained in the solvent in which it is dissolved to form CH3(CH2),,S1(OH)
3, which undergoes a dehydration reaction with the OH groups on the glass surface,
Since the CHs (CH2)r□ group is a hydrophobic group, the surface becomes hydrophobic.

Next, the photoresist film is removed using acetone or alcohol. The surface after photoresist peeling is CH3 (CH
2) +7s i C1) Since it does not react with 3,
It is hydrophilic.

Finally, when the glass substrate is vertically immersed into the water in which the monomolecular layer has been formed, a monomolecular film is formed only on the portions of the glass substrate that have been subjected to the phobic treatment.

〔Example〕

Embodiments of the present invention will be described based on the drawings.

Figure Ts1 is a process chart showing an example of the method of the present invention.

First, as shown in FIG. 1(A), a photoresist 8 is formed on a glass substrate 5 using a normal photolithography technique.
pattern into any shape. However, at this time, the photoresist is pre-baked at 80° C. for 30 minutes, and post-baked at 60° C. for 30 minutes. This condition is a slightly lower temperature than normal conditions, and when the photoresist 8 is to be peeled off later, it can be easily peeled off at room temperature.

Next, as shown in FIG. 1B, the glass substrate 5 on which the photoresist 8 has been patterned is immersed in a toluene solution 9 containing stearyltrichlorosilane at a ratio of 1 mmol/N for about 1 hour.

As a result, the surface of the glass substrate 5 where the photoresist 2 is not present is subjected to hydrophobic treatment. After the treatment, the glass substrate 5 is cleaned with toluene.

Then, as shown in FIG. 1C, the glass substrate 5 is immersed in an acetone solution and subjected to ultrasonic cleaning to peel off the photoresist 8. Since the pre-baking and post-baking were performed at a temperature lower than that for ordinary photoresists, the photoresist 8 can be peeled off at room temperature.

As a result, a hydrophobic pattern 10 is formed on the glass substrate 5.
will be done.

Finally, as shown in FIG. 4, the hydrophobically patterned glass substrate 5 is vertically immersed in the aqueous solution 1 in which a monomolecular layer 2 is formed on the water surface, and the hydrophobically treated surface is only to attach a monolayer.

In this way, a monomolecular film is formed on the glass M[5 in an arbitrary pattern as shown in FIG. 1(D).

By the way, hydrophobic treatment is performed by C
H3 (CH2) + □S i Trichlorosilane agent CH3 (CH2) +7 that reacted with water in the solvent that dissolves C03
The dehydration reaction between s i (OH) a and the 10H group on the glass substrate makes the glass substrate 5 hydrophobic as shown in TS2 diagram (B).

Therefore, the substrate used is not limited to glass, but also substrates with 10H groups on the surface, such as 5n02, I
It can also be applied to electrodes such as nO2 and ITO. Furthermore, the trichlorosilane agent that performs hydrophobic treatment is not limited to stearyltrichlorosilane, but also CH3 (CH2) +
Those with different alkyl chain lengths, such as oS i C11, can also be used in the same way.

〔Effect of the invention〕

According to the present invention, since patterning is performed using a photoresist film for hydrophobic treatment, any pattern can be formed with high precision. Therefore, it becomes possible to design elements freely, and the application to sensors and bioelectronics is expanded.

[Brief explanation of the drawing]

Figures 1 (A), (B), (C), and (D) are process diagrams of examples of the present invention, Figures 2 (A) and (B) are diagrams explaining the principle of hydrophobic treatment, and Figure 3 ( A), (B), Figure 4 shows Langmuir
FIG. 3 is an explanatory diagram showing a monomolecular film manufacturing process by the Projectet method. 1 is an aqueous solution, 2 is a monomolecular layer, 3 is a hydrophilic group, 4 is a hydrophobic group,
5 is a glass substrate, 9 is a photoresist. Figure 1 (A) Figure 2) (B) Figure 3 Figure 4

Claims (1)

[Claims] In the step of forming a monomolecular film on a substrate by the Langmuir-Prodgett method, the first step is to pattern a photoresist film on the substrate, and the substrate on which the photoresist is patterned is coated with stearyltrichlorosilane (
The second step is to perform hydrophobic treatment by immersing the substrate in a hydrophobic treatment solution such as CH_3 (CH_2)_1_7SiCl_3) solution, the third step is to peel off the photoresist film on the substrate with acetone or alcohol, and the monomolecular film is formed on the water surface. A method for forming a monomolecular film, comprising a fourth step of immersing the substrate in the formed aqueous solution and forming a monomolecular film on the hydrophobically treated portion of the surface.