JPH0122725B2 - - Google Patents
Info
- Publication number
- JPH0122725B2 JPH0122725B2 JP10192284A JP10192284A JPH0122725B2 JP H0122725 B2 JPH0122725 B2 JP H0122725B2 JP 10192284 A JP10192284 A JP 10192284A JP 10192284 A JP10192284 A JP 10192284A JP H0122725 B2 JPH0122725 B2 JP H0122725B2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- patterns
- exposure amount
- independent
- photomask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59101922A JPS60245226A (ja) | 1984-05-21 | 1984-05-21 | パタ−ン形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59101922A JPS60245226A (ja) | 1984-05-21 | 1984-05-21 | パタ−ン形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60245226A JPS60245226A (ja) | 1985-12-05 |
| JPH0122725B2 true JPH0122725B2 (enrdf_load_stackoverflow) | 1989-04-27 |
Family
ID=14313399
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59101922A Granted JPS60245226A (ja) | 1984-05-21 | 1984-05-21 | パタ−ン形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60245226A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL8502624A (nl) * | 1985-09-26 | 1987-04-16 | Philips Nv | Werkwijze voor het bepalen van de belichtingsdosis van een lichtgevoelige laklaag. |
-
1984
- 1984-05-21 JP JP59101922A patent/JPS60245226A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60245226A (ja) | 1985-12-05 |
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