JPH01214863A - Developing device - Google Patents
Developing deviceInfo
- Publication number
- JPH01214863A JPH01214863A JP3871688A JP3871688A JPH01214863A JP H01214863 A JPH01214863 A JP H01214863A JP 3871688 A JP3871688 A JP 3871688A JP 3871688 A JP3871688 A JP 3871688A JP H01214863 A JPH01214863 A JP H01214863A
- Authority
- JP
- Japan
- Prior art keywords
- developer
- pure water
- master
- master disk
- nozzle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 42
- 238000000034 method Methods 0.000 claims abstract description 19
- 238000005406 washing Methods 0.000 claims abstract description 6
- 238000004140 cleaning Methods 0.000 claims description 9
- 229920002120 photoresistant polymer Polymers 0.000 claims description 7
- 238000011161 development Methods 0.000 abstract description 18
- 239000007788 liquid Substances 0.000 abstract description 6
- 238000012545 processing Methods 0.000 abstract description 3
- 239000000243 solution Substances 0.000 description 7
- 230000003287 optical effect Effects 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- 239000008367 deionised water Substances 0.000 description 4
- 229910021641 deionized water Inorganic materials 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000012670 alkaline solution Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000010137 moulding (plastic) Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Manufacturing Optical Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
[発明の目的〕
(産業上の利用分野)
本発明は、光ディスク等の情報記憶媒体の原盤製造時に
おける現像処理工程で使用する現像装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Industrial Field of Application) The present invention relates to a developing device used in a developing process during the production of master discs for information storage media such as optical discs.
(従来の技術)
近年、光ディスク等の情報記憶媒体が画像情報記憶検索
装置や、音楽あるいは映像再生装置等で広く用いられる
ようになっている。この情報記憶媒体は、通常原盤から
形成されるスタンパを成形型として大量に複製される。(Prior Art) In recent years, information storage media such as optical disks have come to be widely used in image information storage and retrieval devices, music or video playback devices, and the like. This information storage medium is usually reproduced in large quantities using a stamper formed from a master as a mold.
以下、簡単に情報記憶媒体である光ディスクの!IJ*
工程を第3図、第4図および第5図を参照して簡単に説
明する。Below is a brief explanation of optical discs, which are information storage media! IJ*
The process will be briefly explained with reference to FIGS. 3, 4, and 5.
第5図(1)に示される原盤101は、円盤状のガラス
基板103の表面を精密研磨及び、洗浄し、さらに露光
転写用のフォトレジスト105を均一な膜厚、例えば0
.1μm程度になるように塗布し、その後乾燥したもの
である。The master 101 shown in FIG. 5(1) is prepared by precisely polishing and cleaning the surface of a disk-shaped glass substrate 103, and then applying a photoresist 105 for exposure transfer to a uniform film thickness, for example, 0.
.. It was applied to a thickness of about 1 μm and then dried.
この原盤101を第5図(2)に示される様に、スピン
ドルモータ等によって回転するターンテーブルに載lし
て、例えば1800rpmで定速度回転させるとともに
、この原盤101の所定位置に対物レンズ122によっ
てスポット状に集束されたアルゴンレーザやHe−Cd
レーザ等のレーザ光120を所定の時間、照射、露光す
る。この露光によって7オドレジスト105wR内に潜
像107を得る。As shown in FIG. 5(2), this master disc 101 is placed on a turntable rotated by a spindle motor or the like, and rotated at a constant speed of, for example, 1800 rpm. Argon laser or He-Cd focused into a spot
Laser light 120 such as a laser is irradiated and exposed for a predetermined time. By this exposure, a latent image 107 is obtained in the 7-odd resist 105wR.
次に現像処理工程を説明する。第3図(A)に示すよう
に、スピンドルモータ等を回転駆動源として回転するタ
ーンテーブル1に固定された原盤101に純水ノズル1
05から純水を流出させて原518101の洗浄、すな
わちプレリンスを行なう(第4図ステップ41)。次に
現像液ノズル105から現像液(エツチング液)を吹き
つけてフォトレジスト105の露光部分を除去すること
で、潜像107から第5図(3)に示すような連続溝あ
るいは不連続溝からなる案内溝であるプレグルーブや、
情報に従って形成されるビット(以下。Next, the development process will be explained. As shown in FIG. 3(A), a pure water nozzle 1 is attached to a master 101 fixed to a turntable 1 which rotates using a spindle motor or the like as a rotational drive source.
The original 518101 is cleaned, ie, pre-rinsed, by letting pure water flow out from the original 518101 (step 41 in FIG. 4). Next, a developer (etching solution) is sprayed from the developer nozzle 105 to remove the exposed portion of the photoresist 105, thereby converting the latent image 107 into continuous or discontinuous grooves as shown in FIG. 5(3). The pre-groove is a guide groove,
Bits formed according to information (below).
これらプレグルーブやビット等を総称して単にグループ
9という)を得る(ステップ43)。さらにこの現像処
理の終了した原盤101の表面に純水ノズル105から
純水を流出させて、原盤101に付着した現像液を洗浄
、すなわちポストリンスを行ない(ステップ45)、現
像を停止した後に乾燥して(ステップ47)、現像処理
を終了する。These pregrooves, bits, etc. are collectively referred to as group 9) (step 43). Furthermore, pure water is flowed out from the pure water nozzle 105 onto the surface of the master disk 101 that has been subjected to the development process to wash away the developer adhering to the master disk 101, that is, perform post-rinsing (step 45), and after stopping the development, it is dried. (Step 47), and the development process is completed.
尚、このとき純水ノズル105は第3図(B)に示すよ
うに、アーム105Aによって揺動自在に支持され、原
盤101の略半径方向に水平に移動して純水が原11!
101の全面に渡って流れるように構成される。At this time, as shown in FIG. 3(B), the deionized water nozzle 105 is swingably supported by the arm 105A, and moves horizontally approximately in the radial direction of the master 101, so that the deionized water is sprayed onto the master 11!
101 so that it flows over the entire surface.
次に、第5図(4)に示すように、この原盤101にニ
ッケルメッキを施して樹脂成形の型となるスタンパ11
1を成形する。Next, as shown in FIG. 5 (4), this master 101 is nickel-plated to form a stamper 11 that will become a mold for resin molding.
Mold 1.
さらに第5図(5)に示すようにこのスタンパ111を
もとにした射出成形等のプラスチック成形によってレプ
リカ113を成形する。Furthermore, as shown in FIG. 5(5), a replica 113 is molded by plastic molding such as injection molding based on this stamper 111.
この後に第5図(6)に示すように、蒸着等によりアル
ミニウム反射膜や記録g1115を形成し、さらに−こ
の上面を透明な保護層117で被覆等して、光ディスク
が完成する。Thereafter, as shown in FIG. 5(6), an aluminum reflective film and a recording layer 1115 are formed by vapor deposition or the like, and the upper surface is further covered with a transparent protective layer 117 to complete the optical disc.
尚、上述した現像処理は通常、処理時間を目安にして行
なわれるが、通常例えば原盤101の回転速度、現像液
濃度および現像液濃度等によって現像速度が異なり、従
って現像処理時間が同じであっても、グループ109の
形成状況、例えばグループ109の幅、深さが異なるも
のである。Note that the above-mentioned development process is usually performed using the processing time as a guide, but the development speed usually varies depending on, for example, the rotational speed of the master 101, the developer concentration, and the developer concentration, so the development process time may be the same. Also, the formation conditions of the groups 109, for example, the width and depth of the groups 109, are different.
(発明が解決しようとする課題)
一方、上述した現像処理で使用される現像液は、通常粘
着性を有するアルカリ溶液であって、そのため純水で洗
浄した際にも、現像によって形成されるグループ109
内等に付着して残留し易く、この現像液の洗浄には多聞
の純水と時間を費やさなければならなかった。(Problems to be Solved by the Invention) On the other hand, the developer used in the above-mentioned development process is usually an alkaline solution with viscosity. 109
The developing solution tends to adhere and remain on the inside, etc., and it is necessary to spend a lot of time and pure water to clean the developing solution.
本発明は上記に鑑みてなされたもので、その目的として
は、現像液を短時間で完全に除去し得る現像@置を提供
することにある。The present invention has been made in view of the above, and an object thereof is to provide a development @ which can completely remove the developer in a short period of time.
[発明の構成]
(課題を解決するための手段)
上記目的を達成するため、本発明は原盤のフォトレジス
ト層に形成される潜像に現像液を液液して現像処理を施
した後、洗浄液を流して現像液を洗浄する現像手段と、
前記洗浄液の水圧を高める加圧手段とを具備した。[Structure of the Invention] (Means for Solving the Problems) In order to achieve the above object, the present invention provides a method of applying a developer to a latent image formed on a photoresist layer of a master and then performing a development process. a developing means for washing the developing solution by flowing a washing solution;
and a pressurizing means for increasing the water pressure of the cleaning liquid.
(作用)
本発明の現像装置においては、原像手段によって、原盤
のフォトレジストに形成された潜像に対する現像処理を
施した後に、原盤に付着した現像液を洗浄する際に、加
圧手段を用いて洗浄液に圧力を加えることによって、洗
浄液を原盤に向けて所定の圧力で噴出するようにしたの
で、通常粘着性を有して原盤に強く付着している現像液
を短時間にかつ完璧に洗浄するものである。(Function) In the developing device of the present invention, after the original image means performs a development process on the latent image formed on the photoresist of the master, the pressurizing means is used to clean the developing solution adhering to the master. By applying pressure to the cleaning liquid using a 3D printer, the cleaning liquid is sprayed out at a predetermined pressure toward the master disc, allowing the developer, which is normally sticky and strongly adhered to the master disc, to be completely removed in a short period of time. It is something to be cleaned.
(実施例)
以下、図面を用いて本発明の一実施例を詳細に説明する
。(Example) Hereinafter, an example of the present invention will be described in detail using the drawings.
第1図の概略構成図に示されるように、本実施例の現像
装置は、ターンテーブル1に固定され、一定速度で回転
する原511i101に向けて、現像液を吐出する現像
液ノズル3と、純水を流出する純水ノズル5と、高水圧
の純水を噴出する高圧水用ノズル7を備えている。これ
ら3種類のノズル3.5.7は、それぞれ原盤の概半径
方向に、水平に、移動自在であるように構成される。As shown in the schematic configuration diagram of FIG. 1, the developing device of this embodiment includes a developer nozzle 3 that is fixed to the turntable 1 and discharges the developer toward an original 511i101 that rotates at a constant speed; It is equipped with a pure water nozzle 5 that discharges pure water, and a high-pressure water nozzle 7 that spouts high-pressure pure water. These three types of nozzles 3.5.7 are each configured to be movable horizontally in the approximate radial direction of the master.
この高圧水用ノズル7は、高圧水圧力レギュレータ9を
介して高圧ポンプ11に接続される。This high-pressure water nozzle 7 is connected to a high-pressure pump 11 via a high-pressure water pressure regulator 9.
高圧水圧力レギュレータ9は、高圧水用ノズル7から噴
出する純水の圧力を調整する水圧調整弁を備え、フォト
レジスト105を損傷しない範囲で効率的に現像液を洗
浄しつる最適な水圧の純水が原盤に到達するように調整
する。The high-pressure water pressure regulator 9 is equipped with a water pressure adjustment valve that adjusts the pressure of pure water jetted from the high-pressure water nozzle 7, and maintains the optimum water pressure to efficiently wash the developer without damaging the photoresist 105. Adjust so that water reaches the master.
高圧ポンプ11は、純水−次側口17がら供給される純
水を所定の圧力まで加圧するためのポンプであって、空
気圧カー次側口13がら得られる空気圧を口径の大であ
る一次側ピストンシリンダに導入して、この−次側ピス
トンシリンダより口径が小である二次側ピストンシリン
ダ側に高圧を発生させて、この二次側ピストンシリンダ
に導入される純水を加圧するようにするものである。The high-pressure pump 11 is a pump for pressurizing pure water supplied from the pure water outlet 17 to a predetermined pressure. Introduced into the piston cylinder, high pressure is generated on the secondary side piston cylinder side, which has a smaller diameter than this downstream side piston cylinder, and pressurizes the pure water introduced into this secondary side piston cylinder. It is something.
次に第2図のフローチャートに従って、本実施例の現像
処理工程を説明する。Next, the development process of this embodiment will be explained according to the flowchart of FIG.
露光処理によって潜像が形成された原盤101を、ター
ンテーブル1上に載置、固定した後、定速度で回転駆動
する。次に純水ノズル5の先端を原盤の半径方向に移動
させながらこの定速度回転する原盤101に純水ノズル
5から純水を流出させてプレリンスを行なう(ステップ
21)。After the master disc 101 on which a latent image has been formed by exposure processing is mounted and fixed on the turntable 1, it is driven to rotate at a constant speed. Next, while moving the tip of the deionized water nozzle 5 in the radial direction of the master, pure water is flowed out from the deionized water nozzle 5 onto the master 101 rotating at a constant speed for pre-rinsing (step 21).
このプレリンスが終了した後に、現像液を現像液ノズル
3から吐出、あるいはスプレー状に噴出して(ステップ
23)、!光によって形成された潜像部分の7オトレジ
スト105の除去を行なう。After this pre-rinsing is completed, the developer is discharged or sprayed from the developer nozzle 3 (step 23), and! The photoresist 105 in the latent image portion formed by light is removed.
この現像処理の進行状況は、例えば原盤101に照射ユ
たレーザ光による回折光強度をモニタすることによって
監視され、あるいは所定時間の経過によって確認されて
、現像が適正量に達したときに現像液の吐出を終了する
。The progress of this development process is monitored, for example, by monitoring the intensity of the diffracted light from the laser beam irradiated onto the master 101, or it is confirmed by the passage of a predetermined time, and when the appropriate amount of development has been achieved, the developer is Finish dispensing.
次に、この原盤101に付着した現像液を洗浄するため
に、まず純水ノズル5から純水を流出させてポストリン
スを実流しくステップ25)、さらに高圧水用ノズル7
から高水圧の純水を原盤101に向けて噴出して高圧水
リンスを行なう(ステップ27)。Next, in order to wash away the developing solution adhering to this master 101, first, pure water is flowed out from the pure water nozzle 5 and a post-rinse is actually flowed (step 25), and then the high-pressure water nozzle 7
A high-pressure water rinse is performed by spouting high-pressure pure water toward the master disk 101 (step 27).
このとき、高圧で原盤に当った純水は、例えばグループ
109等の微細な窪み内に付着した現像液溜をも、撥ね
飛ばすようにして、洗浄を行なうので、短時間で、かつ
完全に現像液を洗浄することができる。At this time, the pure water that hits the master disc under high pressure splashes off and cleans the developer pool that has adhered to the fine depressions such as group 109, so that the development is completed in a short time. The liquid can be washed.
最後に、この洗浄の終了した原盤101に残留する純水
を乾燥させて(ステップ29)、現像工程を終了させる
。Finally, the pure water remaining on the cleaned master 101 is dried (step 29), and the developing process is completed.
上述したように、本実施例においては、原盤101に付
着した現像液が短時間で全面に渡って完全に除去される
ので、現像ムラ等の防止とともに、現像処理工程におけ
る時間の短縮を計ることができる。As described above, in this embodiment, the developer attached to the master 101 is completely removed over the entire surface in a short period of time, so that it is possible to prevent uneven development and reduce the time in the development process. Can be done.
[発明の効果]
以上説明したように、本発明によれば現像処理における
現像液の洗浄を、加圧された洗浄液によって行なうよう
にしたので、洗浄処理を短時間で、かつ完全に行なうこ
とができる等の効果を奏する。[Effects of the Invention] As explained above, according to the present invention, the cleaning of the developer during the development process is carried out using a pressurized cleaning liquid, so that the cleaning process can be completed in a short time and completely. It has the effect of being able to do things.
第1図は本発明の一実施例の要部を示す概略構成図で、
第2図は第1図に係るフローチャート、第3図は従来例
の概略構成図、第4図は第3図に係るフローチャート、
第5図は光ディスクの製造工程を説明するための説明図
である。
7・・・高圧水用ノズル
11・・・高圧ポンプ
13・・・空気圧カー次側口FIG. 1 is a schematic configuration diagram showing the main parts of an embodiment of the present invention.
2 is a flowchart related to FIG. 1, FIG. 3 is a schematic configuration diagram of a conventional example, FIG. 4 is a flowchart related to FIG. 3,
FIG. 5 is an explanatory diagram for explaining the manufacturing process of an optical disc. 7... High pressure water nozzle 11... High pressure pump 13... Pneumatic car next side port
Claims (1)
被液して現像処理を施した後、洗浄液を流して現像液を
洗浄する現像手段と、 前記洗浄液の水圧を高める加圧手段とを具備したことを
特徴とする現像装置。[Scope of Claims] A developing means for applying a developing solution to a latent image formed on a photoresist layer of a master and performing a developing process, and then washing the developing solution by flowing a cleaning solution, and controlling the water pressure of the cleaning solution. 1. A developing device comprising: a means for increasing pressure.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3871688A JPH01214863A (en) | 1988-02-23 | 1988-02-23 | Developing device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3871688A JPH01214863A (en) | 1988-02-23 | 1988-02-23 | Developing device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01214863A true JPH01214863A (en) | 1989-08-29 |
Family
ID=12533047
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3871688A Pending JPH01214863A (en) | 1988-02-23 | 1988-02-23 | Developing device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01214863A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0262549A (en) * | 1988-08-29 | 1990-03-02 | Tokyo Electron Ltd | Spin developer |
JPH03274505A (en) * | 1990-03-26 | 1991-12-05 | Matsushita Electron Corp | Method for forming coloring base layer |
US5759749A (en) * | 1995-02-28 | 1998-06-02 | Pioneer Electronic Corporation | Developing method and developing apparatus for optical record medium |
KR100539188B1 (en) * | 1998-11-18 | 2005-12-27 | 동경 엘렉트론 주식회사 | Development processing apparatus and development processing method |
JP2009216779A (en) * | 2008-03-07 | 2009-09-24 | Fujifilm Corp | Image forming method, color filter and display device |
-
1988
- 1988-02-23 JP JP3871688A patent/JPH01214863A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0262549A (en) * | 1988-08-29 | 1990-03-02 | Tokyo Electron Ltd | Spin developer |
JPH03274505A (en) * | 1990-03-26 | 1991-12-05 | Matsushita Electron Corp | Method for forming coloring base layer |
US5759749A (en) * | 1995-02-28 | 1998-06-02 | Pioneer Electronic Corporation | Developing method and developing apparatus for optical record medium |
KR100539188B1 (en) * | 1998-11-18 | 2005-12-27 | 동경 엘렉트론 주식회사 | Development processing apparatus and development processing method |
JP2009216779A (en) * | 2008-03-07 | 2009-09-24 | Fujifilm Corp | Image forming method, color filter and display device |
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