JPH01168042A - Semiconductor integrated circuit device - Google Patents
Semiconductor integrated circuit deviceInfo
- Publication number
- JPH01168042A JPH01168042A JP32776787A JP32776787A JPH01168042A JP H01168042 A JPH01168042 A JP H01168042A JP 32776787 A JP32776787 A JP 32776787A JP 32776787 A JP32776787 A JP 32776787A JP H01168042 A JPH01168042 A JP H01168042A
- Authority
- JP
- Japan
- Prior art keywords
- pads
- buffer
- power supply
- cells
- integrated circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 16
- 239000000872 buffer Substances 0.000 claims abstract description 40
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 5
- 229910052782 aluminium Inorganic materials 0.000 abstract 5
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 230000007423 decrease Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/10—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration
- H01L27/118—Masterslice integrated circuits
- H01L27/11898—Input and output buffer/driver structures
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Semiconductor Integrated Circuits (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は半導体集積回路装置に関し、電源供給用パッド
又は接地用パッドを数多く必要とする半導体集積回路装
置、特にセミカスタムLSI、すなわちゲートアレイ方
式の集積回路装置に関するものである。[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to semiconductor integrated circuit devices, and particularly semiconductor integrated circuit devices that require a large number of power supply pads or grounding pads, particularly semi-custom LSIs, that is, gate array type devices. The present invention relates to an integrated circuit device.
ゲートアレイ方式とは、あらかじめ拡散工程を終えて能
動素子あるいは受動素子を作り込んだ内部セル及びバッ
ファセルを半導体基板に形成しておき、その後に実現し
友いJ!能に応じて配線のみを設計し、完成させるもの
である。In the gate array method, internal cells and buffer cells with active or passive elements are formed on a semiconductor substrate after completing a diffusion process in advance, and then realized. Only the wiring is designed and completed according to the performance.
ゲートアレイ方式LSIの一例を第2図に示す。FIG. 2 shows an example of a gate array type LSI.
第2図に於いて半導体チップ1の中央部に内部セル領域
2を配置し、その周囲に入出力バッファセル3を複数個
配置している。こ几らのバッファセル列の上に電源フィ
ン4、電源フィン5を設けている。そしてパップアセル
列と平行にパッド6を複数個配置し、隣り合うバッファ
セル3とパッド6を接読している。In FIG. 2, an internal cell region 2 is arranged in the center of a semiconductor chip 1, and a plurality of input/output buffer cells 3 are arranged around it. A power supply fin 4 and a power supply fin 5 are provided above these buffer cell rows. A plurality of pads 6 are arranged in parallel with the buffer cell row, and adjacent buffer cells 3 and pads 6 are closely read.
近年、入出力インターフェイスに関して、入出力バッフ
ァセルの出力駆動能力の向上が要求されている。入出力
バッファセルの最大駆動能力はバッファセル内に配置さ
れるトランジスタの数に依存する。すなわち駆動能力を
大きく設計すれば、バッファセル内に配置するトランジ
スタの数が多くなり、必然的に入出力バッファセル自体
が大きくなる。しかし第蔑図に示すように各バッファセ
ル3を1対1にパッド6に対応させて配置すると、バッ
ファセル3の配置ピッチとパッド6の配置ピッチが同じ
である念めに、パッドとパッド間の距mがバッファセル
3のピッチに影響されて、ワイヤボンディングの際に受
ける制限から決まる距離以上に大きくなる。また駆動能
力が大きくなれば、パッドを電源供給用パッド又は接地
用パッドとして数多く用いる必要が生じる。このために
、電源供給用パッド又は接地用パッドに対応する電源供
給用バッファ又は接地用バッファが増え、入出力バッフ
ァとして使えるバッファ数が減少し、半導体集積回路装
置としての機能低下を余儀無くされるという問題点があ
った。In recent years, with regard to input/output interfaces, there has been a demand for improvement in the output driving ability of input/output buffer cells. The maximum drive capability of an input/output buffer cell depends on the number of transistors arranged within the buffer cell. In other words, if the drive capacity is designed to be large, the number of transistors arranged in the buffer cell will increase, and the input/output buffer cell itself will inevitably become larger. However, when each buffer cell 3 is arranged in one-to-one correspondence with the pad 6 as shown in the diagram, in order to ensure that the arrangement pitch of the buffer cells 3 and the arrangement pitch of the pads 6 are the same, it is necessary to The distance m is influenced by the pitch of the buffer cells 3 and becomes larger than the distance determined by the restrictions imposed upon wire bonding. Further, as the driving capacity increases, it becomes necessary to use a large number of pads as power supply pads or grounding pads. For this reason, the number of power supply buffers or grounding buffers corresponding to the power supply pads or grounding pads increases, reducing the number of buffers that can be used as input/output buffers, and forcing a decline in the functionality of the semiconductor integrated circuit device. There was a problem.
[問題点を解決する為の手段]
本発明は従来の問題点を解決する為、半導体チップの中
央部に内部セル領域を設け、その内部セル領域の周囲に
入出力バッファセル列を配置し、そのバッファセル列と
平行にパッド列を配置する構成の半導体集積回路装置に
於いて、パッドの配置ピッチをバッファセル列の配置ピ
ッチより小さくしてバッファセル数よりも多くのパッド
を配置し、各々のバッファセルに対応するパッドを除く
余剰のパッドを電源供給用又は接地用に使用して半導体
集積回路を構成する。[Means for Solving the Problems] In order to solve the conventional problems, the present invention provides an internal cell area in the center of a semiconductor chip, arranges an input/output buffer cell array around the internal cell area, In a semiconductor integrated circuit device having a structure in which a pad row is arranged parallel to the buffer cell row, the pad arrangement pitch is made smaller than the arrangement pitch of the buffer cell row, and more pads than the number of buffer cells are arranged. A semiconductor integrated circuit is constructed by using the surplus pads other than the pads corresponding to the buffer cells for power supply or grounding.
本発明によりバッファセルとパッドが1対1に対応して
いない余剰のパッド′t−電源供給用又は接地用として
使用し、電源供給用又は接地用のバッファセルを使用す
ることがないので、電源供給用又は接地用パッドが増え
ても入出力用として使用するバッファセルが減少するこ
とがない。According to the present invention, the extra pads that do not have a one-to-one correspondence between buffer cells and pads are used for power supply or grounding, and the buffer cells for power supply or grounding are not used. Even if the number of supply or grounding pads increases, the number of buffer cells used for input/output does not decrease.
本発明の実施例を第1図(a)及び(b)に示す。第1
図(a)はチップのサイド部分を第1図(b)はチップ
のコーナ一部分を示すものである。An embodiment of the present invention is shown in FIGS. 1(a) and 1(b). 1st
FIG. 1(a) shows a side portion of the chip, and FIG. 1(b) shows a corner portion of the chip.
半導体チップlO1に於いて内部セル領域102の周囲
にバッファセルフを配置し、そのバッフアセ/L/7列
と平行にパッドlo、10a、s 10az。In the semiconductor chip IO1, a buffer cell is arranged around the internal cell region 102, and pads lo, 10a, s 10az are arranged in parallel with the buffer cell/L/7 column.
10bを配置している。10b is arranged.
ここでパッドの配置ピッチをバッファの配置ピッチよシ
も小さくすることにより、バッファ7に1対1で対応す
るパッド10に加えて、1対1に対応しない余剰のパッ
ド1oale 10a2* 10bが形成できる。前記
バッファセルフ列の上には絶縁層を介して第2層1を用
いて電源フィン(VCCフィン8及びGNDフィン9
) を設ff、/(ツファ7とパッド10はAl配線1
1を介して接続されている。図において余剰のパッド1
0a1は第2層kl配線11af:介°してGNDフィ
ン9と直接に接続され、また余剰パッ、ド10a2はコ
ンタクト12で接続された電1層Al?配線11bと第
2層A4配線11cを介してvCCフィン8と接続され
ている。以上のように余剰パッド10 al 110a
2を直接電源フィンと接続することにより電源供給用パ
ッド又は接地用パッドの数を増加させることができる。Here, by making the arrangement pitch of the pads smaller than the arrangement pitch of the buffers, in addition to the pads 10 that correspond one-to-one to the buffer 7, it is possible to form surplus pads 1oale 10a2*10b that do not correspond one-to-one. . Power supply fins (VCC fins 8 and GND fins 9
) is set, /(Tuff 7 and pad 10 are Al wiring 1
1. In the figure, extra pad 1
0a1 is directly connected to the GND fin 9 through the second layer kl wiring 11af, and the redundant pad 10a2 is connected to the first layer Al? through the contact 12. It is connected to the vCC fin 8 via the wiring 11b and the second layer A4 wiring 11c. As above, surplus pad 10 al 110a
2 can be directly connected to the power supply fin, thereby increasing the number of power supply pads or grounding pads.
以上のように本発明によれば、チップ面積を大きくする
ことなく、マた半導体回路装置としての機能を低下させ
ることなく、電源供給用パッド又は接地用パッドを増加
させることが可能である。As described above, according to the present invention, it is possible to increase the number of power supply pads or grounding pads without increasing the chip area or reducing the functionality of the semiconductor circuit device.
第1図会≠春÷暴は本発明の一実施例の要部を!示す平
面図、第呑図は従来のゲートアレイLSIの形状を示す
平面図である。
7・・・バッファセル、 8・・・vCCフィン、 9
・・・GNDフィン、 10・・・パッド、 10 a
1 el 0 a 2 * 10 b ・・・余剰
の゛バッド、 11 ・AI配線、 lla・・・第
二層Al配線、 llb・・・第−層AI配線、 11
c・・・第二層Al配線、12・・・第−層AA’、!
:第二層とのコンタクト、101・・・半導体チップ、
102・・・内部セル領域。Figure 1 ≠ Spring ÷ Vio shows the main part of an embodiment of the present invention! The plan view shown in FIG. 1 is a plan view showing the shape of a conventional gate array LSI. 7... Buffer cell, 8... vCC fin, 9
...GND fin, 10...pad, 10 a
1 el 0 a 2 * 10 b... Surplus bad, 11 - AI wiring, lla... Second layer Al wiring, llb... Third layer AI wiring, 11
c...Second layer Al wiring, 12...-th layer AA',!
: Contact with second layer, 101... semiconductor chip,
102... Internal cell area.
Claims (1)
セル領域の周囲にバッファセル列を配置し、該バッファ
セル列と平行にパッド列を配置してなるゲートアレイ式
半導体集積回路装置に於いて、 パッドの配置ピッチをバッファセル列の配置ピッチより
小さくしてバッファセル数より多くのパッドを設け、余
剰パッドを電源供給用フィン或いは接地フィンに接続し
たことを特徴とする半導体集積回路装置。[Claims] 1. A gate array type in which an internal cell region is provided in the center of a semiconductor chip, a buffer cell row is arranged around the internal cell region, and a pad row is arranged parallel to the buffer cell row. In a semiconductor integrated circuit device, the arrangement pitch of the pads is made smaller than the arrangement pitch of the buffer cell rows to provide more pads than the number of buffer cells, and the surplus pads are connected to power supply fins or grounding fins. Semiconductor integrated circuit device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32776787A JPH01168042A (en) | 1987-12-23 | 1987-12-23 | Semiconductor integrated circuit device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32776787A JPH01168042A (en) | 1987-12-23 | 1987-12-23 | Semiconductor integrated circuit device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01168042A true JPH01168042A (en) | 1989-07-03 |
Family
ID=18202760
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP32776787A Pending JPH01168042A (en) | 1987-12-23 | 1987-12-23 | Semiconductor integrated circuit device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01168042A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04171843A (en) * | 1990-11-05 | 1992-06-19 | Nec Ic Microcomput Syst Ltd | Gate array system lsi |
EP0563973A2 (en) * | 1992-04-01 | 1993-10-06 | Nec Corporation | Master slice integrated circuit having a reduced chip size and a reduced power supply noise |
WO1994029902A1 (en) * | 1993-06-07 | 1994-12-22 | National Semiconductor Corporation | Flexcell gate array |
-
1987
- 1987-12-23 JP JP32776787A patent/JPH01168042A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04171843A (en) * | 1990-11-05 | 1992-06-19 | Nec Ic Microcomput Syst Ltd | Gate array system lsi |
EP0563973A2 (en) * | 1992-04-01 | 1993-10-06 | Nec Corporation | Master slice integrated circuit having a reduced chip size and a reduced power supply noise |
EP0563973A3 (en) * | 1992-04-01 | 1994-08-10 | Nec Corp | Master slice integrated circuit having a reduced chip size and a reduced power supply noise |
US5422441A (en) * | 1992-04-01 | 1995-06-06 | Nec Corporation | Master slice integrated circuit having a reduced chip size and a reduced power supply noise |
WO1994029902A1 (en) * | 1993-06-07 | 1994-12-22 | National Semiconductor Corporation | Flexcell gate array |
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