JPH01162234U - - Google Patents
Info
- Publication number
- JPH01162234U JPH01162234U JP5521188U JP5521188U JPH01162234U JP H01162234 U JPH01162234 U JP H01162234U JP 5521188 U JP5521188 U JP 5521188U JP 5521188 U JP5521188 U JP 5521188U JP H01162234 U JPH01162234 U JP H01162234U
- Authority
- JP
- Japan
- Prior art keywords
- heat treatment
- semiconductor
- heat
- treatment apparatus
- area
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 claims description 11
- 238000010438 heat treatment Methods 0.000 claims description 10
- 238000007789 sealing Methods 0.000 claims description 3
- 235000012431 wafers Nutrition 0.000 claims 3
- 239000012780 transparent material Substances 0.000 claims 1
- 238000009792 diffusion process Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988055211U JPH0614480Y2 (ja) | 1988-04-26 | 1988-04-26 | 半導体熱処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988055211U JPH0614480Y2 (ja) | 1988-04-26 | 1988-04-26 | 半導体熱処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01162234U true JPH01162234U (ar) | 1989-11-10 |
| JPH0614480Y2 JPH0614480Y2 (ja) | 1994-04-13 |
Family
ID=31281109
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1988055211U Expired - Lifetime JPH0614480Y2 (ja) | 1988-04-26 | 1988-04-26 | 半導体熱処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0614480Y2 (ar) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001031694A1 (fr) * | 1999-10-28 | 2001-05-03 | Applied Materials Inc. | Appareil destine a la fabrication d'un dispositif a semiconducteur |
| JP2005150573A (ja) * | 2003-11-19 | 2005-06-09 | Kyocera Corp | 不純物拡散装置 |
Citations (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5434753A (en) * | 1977-08-24 | 1979-03-14 | Hitachi Ltd | Thermal balancing jig |
| JPS5623741A (en) * | 1979-08-06 | 1981-03-06 | Toshiba Ceramics Co Ltd | Quartz glass furnace core tube for manufacturing semiconductor |
| JPS5674923A (en) * | 1979-11-22 | 1981-06-20 | Oki Electric Ind Co Ltd | Core tube device for furnace |
| JPS5748270U (ar) * | 1980-08-30 | 1982-03-18 | ||
| JPS57162329A (en) * | 1981-03-30 | 1982-10-06 | Fujitsu Ltd | Heat treatment of semiconductor substrate |
| JPS5810354U (ja) * | 1981-07-15 | 1983-01-22 | 株式会社日立製作所 | 電界放射型陰極 |
| JPS58148427A (ja) * | 1982-10-20 | 1983-09-03 | Toshiba Ceramics Co Ltd | 半導体製造用石英ガラス製炉芯管 |
| JPS6122454A (ja) * | 1984-07-11 | 1986-01-31 | Canon Inc | 磁気光学記録媒体 |
| JPS62123713A (ja) * | 1985-11-25 | 1987-06-05 | Hitachi Hokkai Semiconductor Ltd | ウエハチヤ−ジ治具及びウエハ表面処理方法 |
| JPS62259434A (ja) * | 1986-04-14 | 1987-11-11 | Shinetsu Sekiei Kk | 石英ガラス製治具 |
| JPS6317300A (ja) * | 1986-07-08 | 1988-01-25 | Shinetsu Sekiei Kk | 石英ガラス製炉芯管 |
| JPS6331530U (ar) * | 1986-08-14 | 1988-03-01 | ||
| JPS6358822A (ja) * | 1986-08-29 | 1988-03-14 | Shinetsu Sekiei Kk | 石英ガラス製ウエ−ハ搬送・保持用治具 |
-
1988
- 1988-04-26 JP JP1988055211U patent/JPH0614480Y2/ja not_active Expired - Lifetime
Patent Citations (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5434753A (en) * | 1977-08-24 | 1979-03-14 | Hitachi Ltd | Thermal balancing jig |
| JPS5623741A (en) * | 1979-08-06 | 1981-03-06 | Toshiba Ceramics Co Ltd | Quartz glass furnace core tube for manufacturing semiconductor |
| JPS5674923A (en) * | 1979-11-22 | 1981-06-20 | Oki Electric Ind Co Ltd | Core tube device for furnace |
| JPS5748270U (ar) * | 1980-08-30 | 1982-03-18 | ||
| JPS57162329A (en) * | 1981-03-30 | 1982-10-06 | Fujitsu Ltd | Heat treatment of semiconductor substrate |
| JPS5810354U (ja) * | 1981-07-15 | 1983-01-22 | 株式会社日立製作所 | 電界放射型陰極 |
| JPS58148427A (ja) * | 1982-10-20 | 1983-09-03 | Toshiba Ceramics Co Ltd | 半導体製造用石英ガラス製炉芯管 |
| JPS6122454A (ja) * | 1984-07-11 | 1986-01-31 | Canon Inc | 磁気光学記録媒体 |
| JPS62123713A (ja) * | 1985-11-25 | 1987-06-05 | Hitachi Hokkai Semiconductor Ltd | ウエハチヤ−ジ治具及びウエハ表面処理方法 |
| JPS62259434A (ja) * | 1986-04-14 | 1987-11-11 | Shinetsu Sekiei Kk | 石英ガラス製治具 |
| JPS6317300A (ja) * | 1986-07-08 | 1988-01-25 | Shinetsu Sekiei Kk | 石英ガラス製炉芯管 |
| JPS6331530U (ar) * | 1986-08-14 | 1988-03-01 | ||
| JPS6358822A (ja) * | 1986-08-29 | 1988-03-14 | Shinetsu Sekiei Kk | 石英ガラス製ウエ−ハ搬送・保持用治具 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001031694A1 (fr) * | 1999-10-28 | 2001-05-03 | Applied Materials Inc. | Appareil destine a la fabrication d'un dispositif a semiconducteur |
| JP2005150573A (ja) * | 2003-11-19 | 2005-06-09 | Kyocera Corp | 不純物拡散装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0614480Y2 (ja) | 1994-04-13 |