JPH01150873A - Testing method for semiconductor storage device - Google Patents

Testing method for semiconductor storage device

Info

Publication number
JPH01150873A
JPH01150873A JP62310240A JP31024087A JPH01150873A JP H01150873 A JPH01150873 A JP H01150873A JP 62310240 A JP62310240 A JP 62310240A JP 31024087 A JP31024087 A JP 31024087A JP H01150873 A JPH01150873 A JP H01150873A
Authority
JP
Japan
Prior art keywords
memory cell
data
written
memory
memory cells
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62310240A
Other languages
Japanese (ja)
Inventor
Katsumi Fukumoto
福本 克巳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP62310240A priority Critical patent/JPH01150873A/en
Publication of JPH01150873A publication Critical patent/JPH01150873A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To efficiently execute a test without deteriorating failure detecting capacity by writing a checker board pattern in all memory cells, converting the data of the memory cell of a diagonal line to '1' and reading out the data which has been written in cell line and rows in the X direction and the Y direction to which each memory cell on the diagonal line belongs in this state. CONSTITUTION:First of all, a checker board pattern in which '0' and '1' are stored alternately is written in all memory cells. Subsequently, a data 1 is written in a memory cell (i, i) on one diagonal line of a memory cell matrix. Next, data which have been written in memory cell rows and lines in the X direction and the Y direction to which the memory cell (i, i) on the diagonal line belongs are read out alternately, while returning to an origin. In this state, by advancing successively this (i) to (N<1/2>-1) from '0', the memory cell is tested.

Description

【発明の詳細な説明】 ぐ産業上の利用分野〉 本発明は半導体記憶装置のテスト方法に関する。[Detailed description of the invention] Industrial application fields The present invention relates to a method for testing a semiconductor memory device.

〈従来の技術〉 半導体製造技術の著しい進歩によって集積回路の高密度
化、高信頼性化が進められ、特に記憶容の傾向が現われ
ている。
<Prior Art> With remarkable progress in semiconductor manufacturing technology, integrated circuits are becoming more dense and highly reliable, and there is a particular trend in storage capacity.

このように高度な技術によって製造された半導体記憶装
置は、製造工程を終えるにあたってメモリセルが所定の
機能を果し得るかテストされる。
Semiconductor memory devices manufactured using such advanced technology are tested to see if the memory cells can perform a predetermined function at the end of the manufacturing process.

テストに際しては、テストパターンとして全面に0又は
1を書き込んで行なうNY或いはN2系試験法が採用さ
れている。即ち全記憶容量をNピッ) C#行×F行〕
とするとき、基本となるNテストパターンを行(又は列
〕方向へ移動してテストすると、NX&=N”パターン
となる。
For testing, the NY or N2 system test method is adopted, in which 0 or 1 is written over the entire surface as a test pattern. In other words, the total storage capacity is N pi) C# line x F line]
When the basic N test pattern is moved in the row (or column) direction and tested, an NX&=N'' pattern is obtained.

〈発明が解決しようとする問題点〉 メモリセルの数Nからなる半導体記憶装置に、ユ 上記N2或いはN2系試験法を適用してテストを行っf
c場合、N系試験法に比べて複雑なテストが可能になる
が、所要試験時間が指数関数的に増加し、大容量の半導
体記憶装置では実用的でなくなりつつある。
<Problems to be Solved by the Invention> A test was conducted by applying the above-mentioned N2 or N2-based test method to a semiconductor memory device consisting of N memory cells.
In case c, more complex tests are possible than in the N-based test method, but the required test time increases exponentially, making it impractical for large-capacity semiconductor storage devices.

本発明は上記問題点に鑑みてなされたもので、不良検出
能力を低下させることなく試験の効率化を図った半導体
記憶装置のテスト方法を提供する。
The present invention has been made in view of the above-mentioned problems, and provides a method for testing semiconductor memory devices that improves test efficiency without reducing defect detection ability.

く問題点を解決するための手段〉 本発明はNビットのメモリセルからなる半導体記憶装置
において、全メモリセルにチェッカーボードパターンを
書込み、次に対角線のメモリセルのデータを1に変換し
、この状態で上記対角線上の各メモリセルを起点にして
、同メモリセルが属するX方向及びY方向のセル行、列
に書込まれたデータを読出して全メモリセルを試験する
Means for Solving Problems> The present invention writes a checkerboard pattern to all memory cells in a semiconductor memory device consisting of N-bit memory cells, then converts data in diagonal memory cells to 1, and In this state, starting from each memory cell on the diagonal line, data written in cell rows and columns in the X and Y directions to which the memory cell belongs is read out to test all memory cells.

く作 用〉 本発明はNビット(J1行×5列)からなる半導体記憶
装置について、0及び1のデータが交互に格納されたチ
エッカボードパターン及ヒ対角線上のメモリセルに等し
くデータ1が書込まれるダイアゴナルパターンを用いる
ことによす、基本となるNテストパターンのみを行うだ
けで、行(又は列)方向への移動が不要となり、N2テ
ストパターンをNテストパターンに変換することができ
る。
Function> The present invention applies to a semiconductor memory device consisting of N bits (J1 rows x 5 columns), in which data 1 is stored equally in a checker board pattern in which data 0 and 1 are stored alternately, and in memory cells on the diagonal. By using the diagonal pattern to be written, by simply performing the basic N test pattern, there is no need to move in the row (or column) direction, and the N2 test pattern can be converted to the N test pattern. .

〈笑施例〉 第1図はN個(J行xJ列)のメモリセルをxY力方向
マトリクスに配列してなるDRAMを模式的に示す。マ
トリクス状の半導体記憶装置はデバイス試験する手順の
第1段階として、まず全面に、データ0.1が交互に出
現するチエッカボ−トパターンを書く。次に上記メモリ
マトリクヌの内一方の対角線上に位置するメモリセル(
i、i)について、書込まれているデータを1に変換す
る。
<Example> FIG. 1 schematically shows a DRAM in which N memory cells (J rows x J columns) are arranged in an xY force direction matrix. As the first step in testing a matrix semiconductor memory device, a checker board pattern in which data 0.1 appears alternately is written on the entire surface. Next, the memory cells located on one diagonal of the memory matrix (
For i, i), the written data is converted to 1.

上記チエッカボートパターン及びダイアゴナルパターン
を書込んだ半導体記憶装置について、書込まれたデータ
を順次読み出して不良メモリセルを検出する。即ち第2
図のフローチャートに示す如く、アドレス(0,0)の
メモリセルに書込まれたデータを読み、次にY方向に位
置するアドレス(0,1)のメモリセルのデータを読む
。続いて再びアドレス(0,0)のメモリセルのデータ
を読みその後X方向に位置するアドレス(1,0)のメ
モリセルのデータを読みアドレス(0,0)に戻る。同
様にアドレス(0,0)を起点にシテ同じY方向に位置
するアドレス(0,i)及び同じX方向に位置するアド
レス(i、0)(i=1〜tpぐ−1))のメモリセル
のデータを順次読み出して、各メモリセルのデータは予
め設定された期待値と比較し、不良メモリセルを検出す
る。
For the semiconductor memory device into which the checkerboard pattern and diagonal pattern have been written, written data is sequentially read out to detect defective memory cells. That is, the second
As shown in the flowchart in the figure, the data written in the memory cell at address (0, 0) is read, and then the data in the memory cell at address (0, 1) located in the Y direction is read. Next, the data in the memory cell at address (0,0) is read again, and then the data in the memory cell at address (1,0) located in the X direction is read and the process returns to address (0,0). Similarly, the memory of address (0, i) located in the same Y direction and address (i, 0) (i = 1 to tp - 1) located in the same Y direction starting from address (0, 0) The data of each memory cell is sequentially read out, and the data of each memory cell is compared with a preset expected value to detect a defective memory cell.

アドレス(0,0)を起点した行、列に属するメモリセ
ルのテストを終えた後起点をアドレス(1゜1)のメモ
リセルに移し、Y方向のメモリセル(1,i)及びX方
向のメモリセル(i、1)(i=2〜J”W−1)につ
いて上記テスト動作と同様に対角線上のメモリセル(1
,1)に戻シながらY方向、X方向のメモリセルを順次
交互に読み出して検査する。起点となるメモリセルを(
fW−1,グー1)まで移して同様のテスト動作を実行
することによりN個のメモリセルの不良検査ができる。
After completing the test of the memory cells belonging to the row and column starting at address (0,0), move the starting point to the memory cell at address (1°1), and test the memory cell (1,i) in the Y direction and the memory cell (1,i) in the X direction. For memory cell (i, 1) (i=2~J''W-1), memory cell (1) on the diagonal line is
, 1), the memory cells in the Y direction and the X direction are sequentially and alternately read and inspected. Set the memory cell as the starting point (
By moving up to fW-1, goo1) and executing a similar test operation, N memory cells can be tested for defects.

即ち、対角線上のメモリセルを起点して、同メモリセル
が属するX方向及びY方向のメモリセルを交互に順次読
出してテストすることにより、N個のメモリセルからな
る半導体記憶装置についてN系試験法としてテストする
ことができる。
That is, starting from a diagonal memory cell, memory cells in the X and Y directions to which the same memory cell belongs are sequentially read and tested, thereby performing an N-system test on a semiconductor memory device consisting of N memory cells. can be tested as a law.

〈発明の効果〉 以上本発明によれば、N2 テストパターンをNテスト
パターンにすることができテスト所要時間の短縮を図る
ことができ、特に大容量化するDRAMについてテスト
の効率化を図ることができる。
<Effects of the Invention> As described above, according to the present invention, it is possible to change the N2 test pattern to the N test pattern, thereby reducing the time required for testing, and in particular, improving the efficiency of testing for DRAMs whose capacity is increasing. can.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明による一実施例のテストパターンを書込
んだ模式図、第2図は同実施例のテスト手順を説明する
フロー−ヤードである。
FIG. 1 is a schematic diagram in which a test pattern is written according to an embodiment of the present invention, and FIG. 2 is a flow yard for explaining the test procedure of the embodiment.

Claims (1)

【特許請求の範囲】 1、メモリセルがXYマトリクスに配列されてなる半導
体記憶装置のテスト方法において、 全メモリセルに0及び1が交互に格納されるチェッカー
ボードパターンを書込む工程と、上記メモリセルマトリ
スクの一方の対角線上のメモリセル(i、i)にデータ
1を書込む工程と、 対角線上のメモリセル(i、i)が属するX方向及びY
方向のメモリセル列、行に書込まれたデータを、上記メ
モリセル(i、i)を起点に戻りながら交互に読み出す
工程とからなり上記iを0から(√(N)−1)まで順
次進めてメモリセルをテストすることを特徴とする半導
体記憶装置のテスト方法。
[Claims] 1. A method for testing a semiconductor memory device in which memory cells are arranged in an The process of writing data 1 to the memory cell (i, i) on one diagonal of the cell matrix, and the process of writing data 1 to the memory cell (i, i) on the diagonal, and
The data written in the memory cell columns and rows in the direction are read out alternately while returning from the memory cell (i, i) as the starting point, and the data written in the memory cell columns and rows in the direction are sequentially read from the memory cell (i, i) from 0 to (√(N)-1). 1. A method for testing a semiconductor memory device, characterized by testing memory cells in advance.
JP62310240A 1987-12-07 1987-12-07 Testing method for semiconductor storage device Pending JPH01150873A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62310240A JPH01150873A (en) 1987-12-07 1987-12-07 Testing method for semiconductor storage device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62310240A JPH01150873A (en) 1987-12-07 1987-12-07 Testing method for semiconductor storage device

Publications (1)

Publication Number Publication Date
JPH01150873A true JPH01150873A (en) 1989-06-13

Family

ID=18002865

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62310240A Pending JPH01150873A (en) 1987-12-07 1987-12-07 Testing method for semiconductor storage device

Country Status (1)

Country Link
JP (1) JPH01150873A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103093832A (en) * 2013-02-26 2013-05-08 上海宏力半导体制造有限公司 Failure testing method of embedded flash memory

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55122298A (en) * 1979-03-09 1980-09-19 Chiyou Lsi Gijutsu Kenkyu Kumiai Memory test method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55122298A (en) * 1979-03-09 1980-09-19 Chiyou Lsi Gijutsu Kenkyu Kumiai Memory test method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103093832A (en) * 2013-02-26 2013-05-08 上海宏力半导体制造有限公司 Failure testing method of embedded flash memory

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