JPH01149955A - 薄膜製造装置 - Google Patents

薄膜製造装置

Info

Publication number
JPH01149955A
JPH01149955A JP30898087A JP30898087A JPH01149955A JP H01149955 A JPH01149955 A JP H01149955A JP 30898087 A JP30898087 A JP 30898087A JP 30898087 A JP30898087 A JP 30898087A JP H01149955 A JPH01149955 A JP H01149955A
Authority
JP
Japan
Prior art keywords
thin film
electron beam
electron
materials
vaporized
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP30898087A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0575826B2 (enExample
Inventor
Hisashi Yamamoto
久 山本
Keiji Ishibashi
啓次 石橋
Kazuo Hirata
和男 平田
Masahiko Kobayashi
正彦 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anelva Corp filed Critical Anelva Corp
Priority to JP30898087A priority Critical patent/JPH01149955A/ja
Publication of JPH01149955A publication Critical patent/JPH01149955A/ja
Publication of JPH0575826B2 publication Critical patent/JPH0575826B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP30898087A 1987-12-07 1987-12-07 薄膜製造装置 Granted JPH01149955A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30898087A JPH01149955A (ja) 1987-12-07 1987-12-07 薄膜製造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30898087A JPH01149955A (ja) 1987-12-07 1987-12-07 薄膜製造装置

Publications (2)

Publication Number Publication Date
JPH01149955A true JPH01149955A (ja) 1989-06-13
JPH0575826B2 JPH0575826B2 (enExample) 1993-10-21

Family

ID=17987515

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30898087A Granted JPH01149955A (ja) 1987-12-07 1987-12-07 薄膜製造装置

Country Status (1)

Country Link
JP (1) JPH01149955A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0364457A (ja) * 1989-08-02 1991-03-19 Anelva Corp 電子ビーム蒸着用電子銃
JP2009038973A (ja) * 2007-08-06 2009-02-26 Ygk:Kk 仕掛け用ハリスとこれを用いた釣り用仕掛け

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60181366U (ja) * 1984-05-09 1985-12-02 日本電子株式会社 複数の電子ビ−ムにより材料を加熱する装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60181366U (ja) * 1984-05-09 1985-12-02 日本電子株式会社 複数の電子ビ−ムにより材料を加熱する装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0364457A (ja) * 1989-08-02 1991-03-19 Anelva Corp 電子ビーム蒸着用電子銃
JP2009038973A (ja) * 2007-08-06 2009-02-26 Ygk:Kk 仕掛け用ハリスとこれを用いた釣り用仕掛け

Also Published As

Publication number Publication date
JPH0575826B2 (enExample) 1993-10-21

Similar Documents

Publication Publication Date Title
JP2018527472A (ja) 真空処理装置及び基板を処理するための方法
KR101471269B1 (ko) 성막 속도가 빠른 아크식 증발원, 이 아크식 증발원을 사용한 피막의 제조 방법 및 성막 장치
US3267015A (en) Systems and processes for coating by evaporation
JPH01149955A (ja) 薄膜製造装置
JPH0372067A (ja) 複数の蒸発ルツボを備えたアーク放電型蒸発器
JPH04235276A (ja) 基板をコーティングするための装置
CN216947166U (zh) 一种具有双坩埚结构的真空蒸镀机
US3695217A (en) Vapor deposition apparatus
JP3399570B2 (ja) 連続真空蒸着装置
JPH07138743A (ja) イオンプレーティング装置
JP3409874B2 (ja) イオンプレーティング装置
KR20010021341A (ko) 아크형 이온 플레이팅 장치
KR960005808B1 (ko) 전자비임 증착용 전자총
JP3961158B2 (ja) 電子ビーム蒸発装置
US3274417A (en) Electronic evaporator
JP3079802B2 (ja) プラズマ銃
JP3464998B2 (ja) イオンプレーティング装置及びイオンプレーティングによる蒸着膜の膜厚と組成分布を制御する方法
JPH0762240B2 (ja) 電子ビーム蒸着用電子銃
JPS61195968A (ja) 合金蒸着膜の製造方法
JPS62185875A (ja) 気相成膜装置
JPH11335837A (ja) 磁気媒体製造装置
JPH08283933A (ja) アーク式蒸発源
JPS61194172A (ja) 蒸着装置用電子ビ−ム加熱装置
JP2001176437A (ja) 電子ビーム装置
JPH03294474A (ja) 膜形成装置

Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20081021

Year of fee payment: 15

EXPY Cancellation because of completion of term
FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20081021

Year of fee payment: 15