JPH01149955A - 薄膜製造装置 - Google Patents

薄膜製造装置

Info

Publication number
JPH01149955A
JPH01149955A JP30898087A JP30898087A JPH01149955A JP H01149955 A JPH01149955 A JP H01149955A JP 30898087 A JP30898087 A JP 30898087A JP 30898087 A JP30898087 A JP 30898087A JP H01149955 A JPH01149955 A JP H01149955A
Authority
JP
Japan
Prior art keywords
thin film
electron
film manufacturing
magnetic field
evaporated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP30898087A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0575826B2 (enrdf_load_stackoverflow
Inventor
Hisashi Yamamoto
久 山本
Keiji Ishibashi
啓次 石橋
Kazuo Hirata
和男 平田
Masahiko Kobayashi
正彦 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anelva Corp filed Critical Anelva Corp
Priority to JP30898087A priority Critical patent/JPH01149955A/ja
Publication of JPH01149955A publication Critical patent/JPH01149955A/ja
Publication of JPH0575826B2 publication Critical patent/JPH0575826B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP30898087A 1987-12-07 1987-12-07 薄膜製造装置 Granted JPH01149955A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30898087A JPH01149955A (ja) 1987-12-07 1987-12-07 薄膜製造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30898087A JPH01149955A (ja) 1987-12-07 1987-12-07 薄膜製造装置

Publications (2)

Publication Number Publication Date
JPH01149955A true JPH01149955A (ja) 1989-06-13
JPH0575826B2 JPH0575826B2 (enrdf_load_stackoverflow) 1993-10-21

Family

ID=17987515

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30898087A Granted JPH01149955A (ja) 1987-12-07 1987-12-07 薄膜製造装置

Country Status (1)

Country Link
JP (1) JPH01149955A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0364457A (ja) * 1989-08-02 1991-03-19 Anelva Corp 電子ビーム蒸着用電子銃
JP2009038973A (ja) * 2007-08-06 2009-02-26 Ygk:Kk 仕掛け用ハリスとこれを用いた釣り用仕掛け

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60181366U (ja) * 1984-05-09 1985-12-02 日本電子株式会社 複数の電子ビ−ムにより材料を加熱する装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60181366U (ja) * 1984-05-09 1985-12-02 日本電子株式会社 複数の電子ビ−ムにより材料を加熱する装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0364457A (ja) * 1989-08-02 1991-03-19 Anelva Corp 電子ビーム蒸着用電子銃
JP2009038973A (ja) * 2007-08-06 2009-02-26 Ygk:Kk 仕掛け用ハリスとこれを用いた釣り用仕掛け

Also Published As

Publication number Publication date
JPH0575826B2 (enrdf_load_stackoverflow) 1993-10-21

Similar Documents

Publication Publication Date Title
US20020144903A1 (en) Focused magnetron sputtering system
KR20180049057A (ko) 진공처리장치 및 진공처리기판 제조방법
JP5318052B2 (ja) 成膜速度が速いアーク式蒸発源、このアーク式蒸発源を用いた皮膜の製造方法及び成膜装置
US3267015A (en) Systems and processes for coating by evaporation
JPH01149955A (ja) 薄膜製造装置
US3695217A (en) Vapor deposition apparatus
JP2946387B2 (ja) イオンプレーティング装置
KR20010021341A (ko) 아크형 이온 플레이팅 장치
JP3409874B2 (ja) イオンプレーティング装置
US3274417A (en) Electronic evaporator
JPS61195968A (ja) 合金蒸着膜の製造方法
JP3961158B2 (ja) 電子ビーム蒸発装置
JPS62185875A (ja) 気相成膜装置
CN111699543B (zh) 用于磁控管溅射的方法和装置
JP3464998B2 (ja) イオンプレーティング装置及びイオンプレーティングによる蒸着膜の膜厚と組成分布を制御する方法
JPH11335837A (ja) 磁気媒体製造装置
JPH0762240B2 (ja) 電子ビーム蒸着用電子銃
JPS61194172A (ja) 蒸着装置用電子ビ−ム加熱装置
JPH08283933A (ja) アーク式蒸発源
JP2001176437A (ja) 電子ビーム装置
JPH04289162A (ja) イオンプレーティング装置
JPH0576539B2 (enrdf_load_stackoverflow)
JPS63162859A (ja) イオンビ−ム蒸着装置
JPS63266065A (ja) 膜作成装置
JPH0559539A (ja) イオンプレーテイング装置

Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20081021

Year of fee payment: 15

EXPY Cancellation because of completion of term
FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20081021

Year of fee payment: 15