JPH0576539B2 - - Google Patents

Info

Publication number
JPH0576539B2
JPH0576539B2 JP62124548A JP12454887A JPH0576539B2 JP H0576539 B2 JPH0576539 B2 JP H0576539B2 JP 62124548 A JP62124548 A JP 62124548A JP 12454887 A JP12454887 A JP 12454887A JP H0576539 B2 JPH0576539 B2 JP H0576539B2
Authority
JP
Japan
Prior art keywords
sample
magnetic field
electrons
electron
electron source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP62124548A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63290265A (ja
Inventor
Kazunori Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anelva Corp filed Critical Anelva Corp
Priority to JP62124548A priority Critical patent/JPS63290265A/ja
Publication of JPS63290265A publication Critical patent/JPS63290265A/ja
Publication of JPH0576539B2 publication Critical patent/JPH0576539B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP62124548A 1987-05-21 1987-05-21 電子銃装置 Granted JPS63290265A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62124548A JPS63290265A (ja) 1987-05-21 1987-05-21 電子銃装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62124548A JPS63290265A (ja) 1987-05-21 1987-05-21 電子銃装置

Publications (2)

Publication Number Publication Date
JPS63290265A JPS63290265A (ja) 1988-11-28
JPH0576539B2 true JPH0576539B2 (enrdf_load_stackoverflow) 1993-10-22

Family

ID=14888201

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62124548A Granted JPS63290265A (ja) 1987-05-21 1987-05-21 電子銃装置

Country Status (1)

Country Link
JP (1) JPS63290265A (enrdf_load_stackoverflow)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6169963A (ja) * 1984-09-14 1986-04-10 Anelva Corp 蒸着用電子銃装置

Also Published As

Publication number Publication date
JPS63290265A (ja) 1988-11-28

Similar Documents

Publication Publication Date Title
US20020144903A1 (en) Focused magnetron sputtering system
JPS6330987B2 (enrdf_load_stackoverflow)
US5126029A (en) Apparatus and method for achieving via step coverage symmetry
KR870002748A (ko) 플라즈마 마그네트론 스퍼터링장치
JP3481953B2 (ja) 基板をコーティングするための装置
JPH0456761A (ja) 薄膜形成装置
JP2003160858A (ja) カソーディックアーク成膜装置
JPH0576539B2 (enrdf_load_stackoverflow)
JPH03194841A (ja) 電子シャワー
JPH0352535B2 (enrdf_load_stackoverflow)
JPH10330935A (ja) スパッタ装置
JPH0214426B2 (enrdf_load_stackoverflow)
JPS60202645A (ja) イオンビ−ム照射装置
JPH08127869A (ja) イオンビームスパッタリング装置
JP2990970B2 (ja) ドライエッチング装置
JPS62185875A (ja) 気相成膜装置
JPS5915385Y2 (ja) 電子顕微鏡
JP3901365B2 (ja) スパッタ装置
JPH051974B2 (enrdf_load_stackoverflow)
JPH0222464A (ja) イオンプレーティング装置
JP3088560B2 (ja) イオンプレーティング装置
JP2021085080A (ja) 電子ビーム蒸発源、真空蒸着装置
JPH062117A (ja) 電子ビーム加熱式蒸着装置および蒸着方法
JPH09231911A (ja) イオン源装置及び真空装置並びに処理方法
JP2001020062A (ja) 電子ビーム蒸発装置

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees