JPH01106561U

JPH01106561U -

Info

Publication number: JPH01106561U
Application number: JP20090687U
Authority: JP
Priority date: 1987-12-29
Filing date: 1987-12-29
Publication date: 1989-07-18

Description

[Brief explanation of the drawing]

第１図は本考案の一実施例による移動成膜方式
のスパツタリング装置の断面構成図、第２図はそ
の一部斜視図、第３図は本考案の他の実施例を示
す図、第４図は従来装置を示す図、第５図は他の
従来装置を示す図である。１…真空容器、３…ターゲツト、４…搬送カー
ト、５…基板、８ａ，８ｂ…側壁部、９…蓋部、
９ａ…開口部、１０…マスク。 FIG. 1 is a cross-sectional configuration diagram of a moving film forming sputtering apparatus according to an embodiment of the present invention, FIG. 2 is a partial perspective view thereof, FIG. 3 is a diagram showing another embodiment of the present invention, and FIG. The figure shows a conventional device, and FIG. 5 shows another conventional device. DESCRIPTION OF SYMBOLS 1... Vacuum container, 3... Target, 4... Transport cart, 5... Substrate, 8a, 8b... Side wall part, 9... Lid part,
9a...opening, 10...mask.

Claims

[Scope of utility model registration request]

In a moving film-forming sputtering apparatus in which a target and a substrate are disposed facing each other in a vacuum container, and sputtered particles of the target are attached to the surface of the substrate while the substrate is being moved, In between, a mask is provided to prevent scattering of the discharge and to prevent sputtering particles from adhering to the substrate surface in areas other than the film forming area, and the mask covers the area around the discharge area above the target. and a side wall portion disposed on the side wall portion, and a region above the side wall portion excluding the film forming region, protruding by a predetermined amount toward the film forming region side so as to serve as a counter electrode to the target, and close to the surface of the moving substrate. What is claimed is: 1. A moving film-forming sputtering apparatus, characterized in that it is comprised of a lid provided with a lid.