JPH0217550U - - Google Patents
Info
- Publication number
- JPH0217550U JPH0217550U JP9368388U JP9368388U JPH0217550U JP H0217550 U JPH0217550 U JP H0217550U JP 9368388 U JP9368388 U JP 9368388U JP 9368388 U JP9368388 U JP 9368388U JP H0217550 U JPH0217550 U JP H0217550U
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- substrate
- vapor deposition
- substrate holder
- source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 6
- 238000007740 vapor deposition Methods 0.000 claims description 3
- 230000008021 deposition Effects 0.000 claims description 2
- 230000002265 prevention Effects 0.000 claims description 2
- 230000008020 evaporation Effects 0.000 claims 1
- 238000001704 evaporation Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Description
第１図ａは本考案の実施例１を示す正面図、第
１図ｂは同底面図、第２図は本考案の実施例２を
示す正面図、第３図ａ，ｂ，ｃ，ｄは本実施例の
蒸着装置を示す外観図、第４図は従来の方向性蒸
着装置を示す正面図、第５図は蒸着膜厚の角度分
布を示す図である。
１……ルツボ、２……蒸着用ソース、３，７…
…基板、４……基板ホルダ、５……防着板、６，
９……開口部、８……絶縁膜、１０……蒸着金属
。
Figure 1a is a front view showing Embodiment 1 of the present invention, Figure 1b is a bottom view of the same, Figure 2 is a front view showing Embodiment 2 of the present invention, Figures 3a, b, c, d. 4 is a front view showing the conventional directional vapor deposition apparatus, and FIG. 5 is a diagram showing the angular distribution of the thickness of the deposited film. 1... Crucible, 2... Source for deposition, 3, 7...
...Substrate, 4...Substrate holder, 5...Adhesion prevention plate, 6,
9... Opening, 8... Insulating film, 10... Vapor deposited metal.
Claims (1)
に対向する位置に基板を設置する基板ホルダと、
前記ルツボと基板ホルダに設置される基板との間
に介装され、前記ルツボから飛来する特定方向の
蒸着ソースのみを通過させる開口部を持つ防着板
とを有することを特徴とする蒸着装置。 a crucible filled with an evaporation source; a substrate holder for placing a substrate at a position facing the crucible;
A vapor deposition apparatus comprising: a deposition prevention plate interposed between the crucible and a substrate installed in a substrate holder, and having an opening through which only a vapor deposition source in a specific direction flying from the crucible passes.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9368388U JPH0217550U (en) | 1988-07-15 | 1988-07-15 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9368388U JPH0217550U (en) | 1988-07-15 | 1988-07-15 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0217550U true JPH0217550U (en) | 1990-02-05 |
Family
ID=31318151
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9368388U Pending JPH0217550U (en) | 1988-07-15 | 1988-07-15 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0217550U (en) |
-
1988
- 1988-07-15 JP JP9368388U patent/JPH0217550U/ja active Pending