JPH03115660U - - Google Patents
Info
- Publication number
- JPH03115660U JPH03115660U JP2305190U JP2305190U JPH03115660U JP H03115660 U JPH03115660 U JP H03115660U JP 2305190 U JP2305190 U JP 2305190U JP 2305190 U JP2305190 U JP 2305190U JP H03115660 U JPH03115660 U JP H03115660U
- Authority
- JP
- Japan
- Prior art keywords
- target
- film
- sputtering
- magnet
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004544 sputter deposition Methods 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 230000004907 flux Effects 0.000 claims 1
- 239000002245 particle Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
Description
第１図はスパツタ装置の構成図、第２図は本考
案によるターゲツトの平面図、第３図は第２図の
Ａ−Ａ線に沿う断面図、第４図は本考案による膜
厚の分布を示した膜厚分布曲線図、第５図は同じ
く膜厚の分布を示した膜厚分布曲線図、第６図は
従来のスパツタ装置のターゲツトの平面図、第７
図は従来のスパツタ装置によつて成膜される膜厚
分布曲線図を示す。
２……真空容器、６……ターゲツト、３……被
成膜基体、８……電動モータ。
Fig. 1 is a configuration diagram of the sputtering device, Fig. 2 is a plan view of the target according to the present invention, Fig. 3 is a sectional view taken along line A-A in Fig. 2, and Fig. 4 is the distribution of film thickness according to the present invention. FIG. 5 is a film thickness distribution curve diagram showing the film thickness distribution. FIG. 6 is a plan view of a target of a conventional sputtering device.
The figure shows a film thickness distribution curve formed by a conventional sputtering device. 2... Vacuum vessel, 6... Target, 3... Film-forming substrate, 8... Electric motor.
Claims (1)
てこの磁石からの磁束を透過させることによつて
スパツタリングに必要なプラズマを収束して成膜
用のスパツタ粒子を放出するターゲツト； 該ターゲツトに対向する位置に配設された被成
膜基体；および、 該被成膜基体を回転駆動する電動モータを備え
るスパツタ装置において、 前記プラズマが収束する前記ターゲツト面を扇
状としたことを特徴とするスパツタ装置。[Claims for Utility Model Registration] A vacuum container defining a closed space; A magnet is disposed in the vacuum container and behind it, and the plasma necessary for sputtering is generated by transmitting the magnetic flux from the magnet. A sputtering apparatus comprising: a target for converging sputter particles for film formation; a substrate to be film-formed disposed at a position opposite to the target; and an electric motor for rotationally driving the substrate to be film-formed. A sputtering device characterized in that the target surface on which the plasma converges has a fan shape.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2305190U JPH03115660U (en) | 1990-03-07 | 1990-03-07 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2305190U JPH03115660U (en) | 1990-03-07 | 1990-03-07 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03115660U true JPH03115660U (en) | 1991-11-29 |
Family
ID=31526050
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2305190U Pending JPH03115660U (en) | 1990-03-07 | 1990-03-07 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03115660U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101531409B1 (en) * | 2013-11-20 | 2015-06-24 | 함덕성 | Food containers made with silicon coated papers |
-
1990
- 1990-03-07 JP JP2305190U patent/JPH03115660U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101531409B1 (en) * | 2013-11-20 | 2015-06-24 | 함덕성 | Food containers made with silicon coated papers |