JPH0378054U - - Google Patents

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Publication number
JPH0378054U
JPH0378054U JP13936689U JP13936689U JPH0378054U JP H0378054 U JPH0378054 U JP H0378054U JP 13936689 U JP13936689 U JP 13936689U JP 13936689 U JP13936689 U JP 13936689U JP H0378054 U JPH0378054 U JP H0378054U
Authority
JP
Japan
Prior art keywords
film formation
substrates
held
target
interposed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13936689U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP13936689U priority Critical patent/JPH0378054U/ja
Publication of JPH0378054U publication Critical patent/JPH0378054U/ja
Pending legal-status Critical Current

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Description

【図面の簡単な説明】[Brief explanation of drawings]

図面は本考案の一実施例を示し、第1図はスパ
ツタリング装置の模式的な平面図、第2図は放電
場における装置横断面図である。 2……基板、3,4,5……ターゲツト、13
……シーズヒータ。
The drawings show an embodiment of the present invention, and FIG. 1 is a schematic plan view of a sputtering device, and FIG. 2 is a cross-sectional view of the device in a discharge field. 2...Substrate, 3, 4, 5...Target, 13
...Sheath heater.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 対向配置されたターゲツト間に一対に保持され
た基板を搬入し、各基板の成膜面を対応するター
ゲツトに臨ませることにより同時に成膜を行い得
るように構成されたものであつて、両基板がター
ゲツトと対峙する位置において、それらの基板間
にアース電位に保持したシーズヒータを介在させ
ていることを特徴とするスパツタリング装置。
A pair of substrates held between opposing targets is carried in, and the film formation surface of each substrate faces the corresponding target, so that film formation can be performed simultaneously. A sputtering apparatus characterized in that a sheathed heater held at ground potential is interposed between the substrates at a position facing the target.
JP13936689U 1989-11-30 1989-11-30 Pending JPH0378054U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13936689U JPH0378054U (en) 1989-11-30 1989-11-30

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13936689U JPH0378054U (en) 1989-11-30 1989-11-30

Publications (1)

Publication Number Publication Date
JPH0378054U true JPH0378054U (en) 1991-08-07

Family

ID=31686417

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13936689U Pending JPH0378054U (en) 1989-11-30 1989-11-30

Country Status (1)

Country Link
JP (1) JPH0378054U (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01268870A (en) * 1988-04-18 1989-10-26 Anelva Corp Vertical tray conveying-type sputtering device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01268870A (en) * 1988-04-18 1989-10-26 Anelva Corp Vertical tray conveying-type sputtering device

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