JPH0378054U - - Google Patents
Info
- Publication number
- JPH0378054U JPH0378054U JP13936689U JP13936689U JPH0378054U JP H0378054 U JPH0378054 U JP H0378054U JP 13936689 U JP13936689 U JP 13936689U JP 13936689 U JP13936689 U JP 13936689U JP H0378054 U JPH0378054 U JP H0378054U
- Authority
- JP
- Japan
- Prior art keywords
- film formation
- substrates
- held
- target
- interposed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 4
- 238000004544 sputter deposition Methods 0.000 claims description 2
- 230000015572 biosynthetic process Effects 0.000 claims 2
Landscapes
- Physical Vapour Deposition (AREA)
Description
図面は本考案の一実施例を示し、第1図はスパ
ツタリング装置の模式的な平面図、第2図は放電
場における装置横断面図である。
2……基板、3,4,5……ターゲツト、13
……シーズヒータ。
The drawings show an embodiment of the present invention, and FIG. 1 is a schematic plan view of a sputtering device, and FIG. 2 is a cross-sectional view of the device in a discharge field. 2...Substrate, 3, 4, 5...Target, 13
...Sheath heater.
Claims (1)
た基板を搬入し、各基板の成膜面を対応するター
ゲツトに臨ませることにより同時に成膜を行い得
るように構成されたものであつて、両基板がター
ゲツトと対峙する位置において、それらの基板間
にアース電位に保持したシーズヒータを介在させ
ていることを特徴とするスパツタリング装置。 A pair of substrates held between opposing targets is carried in, and the film formation surface of each substrate faces the corresponding target, so that film formation can be performed simultaneously. A sputtering apparatus characterized in that a sheathed heater held at ground potential is interposed between the substrates at a position facing the target.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13936689U JPH0378054U (en) | 1989-11-30 | 1989-11-30 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13936689U JPH0378054U (en) | 1989-11-30 | 1989-11-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0378054U true JPH0378054U (en) | 1991-08-07 |
Family
ID=31686417
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13936689U Pending JPH0378054U (en) | 1989-11-30 | 1989-11-30 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0378054U (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01268870A (en) * | 1988-04-18 | 1989-10-26 | Anelva Corp | Vertical tray conveying-type sputtering device |
-
1989
- 1989-11-30 JP JP13936689U patent/JPH0378054U/ja active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01268870A (en) * | 1988-04-18 | 1989-10-26 | Anelva Corp | Vertical tray conveying-type sputtering device |