JP7817523B2 - 筐体及びプローバ - Google Patents
筐体及びプローバInfo
- Publication number
- JP7817523B2 JP7817523B2 JP2021196404A JP2021196404A JP7817523B2 JP 7817523 B2 JP7817523 B2 JP 7817523B2 JP 2021196404 A JP2021196404 A JP 2021196404A JP 2021196404 A JP2021196404 A JP 2021196404A JP 7817523 B2 JP7817523 B2 JP 7817523B2
- Authority
- JP
- Japan
- Prior art keywords
- side frame
- story
- prober
- housing
- floor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/073—Multiple probes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2893—Handling, conveying or loading, e.g. belts, boats, vacuum fingers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/04—Housings; Supporting members; Arrangements of terminals
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/26—Testing of individual semiconductor devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2886—Features relating to contacting the IC under test, e.g. probe heads; chucks
- G01R31/2887—Features relating to contacting the IC under test, e.g. probe heads; chucks involving moving the probe head or the IC under test; docking stations
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2886—Features relating to contacting the IC under test, e.g. probe heads; chucks
- G01R31/2891—Features relating to contacting the IC under test, e.g. probe heads; chucks related to sensing or controlling of force, position, temperature
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Engineering & Computer Science (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Testing Of Individual Semiconductor Devices (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021196404A JP7817523B2 (ja) | 2021-12-02 | 2021-12-02 | 筐体及びプローバ |
| KR1020247017579A KR102707853B1 (ko) | 2021-12-02 | 2022-09-30 | 하우징 및 프로버 |
| MYPI2024003091A MY206652A (en) | 2021-12-02 | 2022-09-30 | Housing and prober |
| PCT/JP2022/036737 WO2023100463A1 (ja) | 2021-12-02 | 2022-09-30 | 筐体及びプローバ |
| CN202280079960.4A CN118355479A (zh) | 2021-12-02 | 2022-09-30 | 壳体以及探测器 |
| US18/731,040 US12399215B2 (en) | 2021-12-02 | 2024-05-31 | Housing and prober |
| JP2026016164A JP2026063507A (ja) | 2021-12-02 | 2026-02-03 | 筐体及びプローバ |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021196404A JP7817523B2 (ja) | 2021-12-02 | 2021-12-02 | 筐体及びプローバ |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2026016164A Division JP2026063507A (ja) | 2021-12-02 | 2026-02-03 | 筐体及びプローバ |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2023082554A JP2023082554A (ja) | 2023-06-14 |
| JP2023082554A5 JP2023082554A5 (https=) | 2025-03-18 |
| JP7817523B2 true JP7817523B2 (ja) | 2026-02-19 |
Family
ID=86611939
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021196404A Active JP7817523B2 (ja) | 2021-12-02 | 2021-12-02 | 筐体及びプローバ |
| JP2026016164A Pending JP2026063507A (ja) | 2021-12-02 | 2026-02-03 | 筐体及びプローバ |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2026016164A Pending JP2026063507A (ja) | 2021-12-02 | 2026-02-03 | 筐体及びプローバ |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US12399215B2 (https=) |
| JP (2) | JP7817523B2 (https=) |
| KR (1) | KR102707853B1 (https=) |
| CN (1) | CN118355479A (https=) |
| MY (1) | MY206652A (https=) |
| WO (1) | WO2023100463A1 (https=) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016181639A (ja) | 2015-03-25 | 2016-10-13 | 株式会社東京精密 | プローバ |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7100340B2 (en) * | 2001-08-31 | 2006-09-05 | Asyst Technologies, Inc. | Unified frame for semiconductor material handling system |
| JP5120018B2 (ja) * | 2007-05-15 | 2013-01-16 | 東京エレクトロン株式会社 | プローブ装置 |
| US9304412B2 (en) * | 2007-08-24 | 2016-04-05 | Nikon Corporation | Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and measuring method |
| KR20110039763A (ko) * | 2009-10-12 | 2011-04-20 | 뉴센트 주식회사 | 프로브카드 자동클리닝시스템 |
| JP6042760B2 (ja) * | 2013-03-28 | 2016-12-14 | 東京エレクトロン株式会社 | プローブ装置 |
| JP6267928B2 (ja) * | 2013-10-29 | 2018-01-24 | 東京エレクトロン株式会社 | ウエハ検査装置の整備用台車及びウエハ検査装置の整備方法 |
| JP5967510B1 (ja) | 2015-03-24 | 2016-08-10 | 株式会社東京精密 | プローバ |
| JP6908858B2 (ja) * | 2015-03-25 | 2021-07-28 | 株式会社東京精密 | 筐体 |
| JP6041175B2 (ja) | 2015-03-30 | 2016-12-07 | 株式会社東京精密 | プローバ |
| JP6652361B2 (ja) * | 2015-09-30 | 2020-02-19 | 東京エレクトロン株式会社 | ウエハ検査装置及びウエハ検査方法 |
| JP6365953B1 (ja) * | 2017-03-07 | 2018-08-01 | 株式会社東京精密 | プローバ |
| JP2020096028A (ja) * | 2018-12-11 | 2020-06-18 | 東京エレクトロン株式会社 | 検査装置、及び、検査方法 |
| KR102222827B1 (ko) * | 2019-08-12 | 2021-03-04 | 주식회사 쎄믹스 | 그룹 프로버 시스템 및 이의 설치 방법 |
| JP7458161B2 (ja) | 2019-09-24 | 2024-03-29 | 東京エレクトロン株式会社 | 検査装置の制御方法および検査装置 |
-
2021
- 2021-12-02 JP JP2021196404A patent/JP7817523B2/ja active Active
-
2022
- 2022-09-30 WO PCT/JP2022/036737 patent/WO2023100463A1/ja not_active Ceased
- 2022-09-30 MY MYPI2024003091A patent/MY206652A/en unknown
- 2022-09-30 KR KR1020247017579A patent/KR102707853B1/ko active Active
- 2022-09-30 CN CN202280079960.4A patent/CN118355479A/zh active Pending
-
2024
- 2024-05-31 US US18/731,040 patent/US12399215B2/en active Active
-
2026
- 2026-02-03 JP JP2026016164A patent/JP2026063507A/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016181639A (ja) | 2015-03-25 | 2016-10-13 | 株式会社東京精密 | プローバ |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2026063507A (ja) | 2026-04-10 |
| WO2023100463A1 (ja) | 2023-06-08 |
| MY206652A (en) | 2024-12-30 |
| JP2023082554A (ja) | 2023-06-14 |
| CN118355479A (zh) | 2024-07-16 |
| US20240319264A1 (en) | 2024-09-26 |
| US12399215B2 (en) | 2025-08-26 |
| KR102707853B1 (ko) | 2024-09-23 |
| KR20240091037A (ko) | 2024-06-21 |
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| A61 | First payment of annual fees (during grant procedure) |
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