JP7756588B2 - 温調装置、温調方法、デバイス製造装置、および物品製造方法 - Google Patents

温調装置、温調方法、デバイス製造装置、および物品製造方法

Info

Publication number
JP7756588B2
JP7756588B2 JP2022054319A JP2022054319A JP7756588B2 JP 7756588 B2 JP7756588 B2 JP 7756588B2 JP 2022054319 A JP2022054319 A JP 2022054319A JP 2022054319 A JP2022054319 A JP 2022054319A JP 7756588 B2 JP7756588 B2 JP 7756588B2
Authority
JP
Japan
Prior art keywords
temperature
temperature control
heaters
control unit
control
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2022054319A
Other languages
English (en)
Japanese (ja)
Other versions
JP2023146890A (ja
JP2023146890A5 (https=
Inventor
崇文 大田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2022054319A priority Critical patent/JP7756588B2/ja
Priority to TW112105489A priority patent/TWI910405B/zh
Priority to KR1020230021122A priority patent/KR20230140363A/ko
Priority to CN202310303376.9A priority patent/CN116893704A/zh
Publication of JP2023146890A publication Critical patent/JP2023146890A/ja
Publication of JP2023146890A5 publication Critical patent/JP2023146890A5/ja
Application granted granted Critical
Publication of JP7756588B2 publication Critical patent/JP7756588B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D23/00—Control of temperature
    • G05D23/19—Control of temperature characterised by the use of electric means
    • G05D23/20—Control of temperature characterised by the use of electric means with sensing elements having variation of electric or magnetic properties with change of temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D23/00—Control of temperature
    • G05D23/19—Control of temperature characterised by the use of electric means
    • G05D23/1927—Control of temperature characterised by the use of electric means using a plurality of sensors
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D23/00—Control of temperature
    • G05D23/19—Control of temperature characterised by the use of electric means
    • G05D23/1951—Control of temperature characterised by the use of electric means with control of the working time of a temperature controlling device

Landscapes

  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Public Health (AREA)
  • Automation & Control Theory (AREA)
  • Toxicology (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Control Of Temperature (AREA)
  • Feedback Control In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2022054319A 2022-03-29 2022-03-29 温調装置、温調方法、デバイス製造装置、および物品製造方法 Active JP7756588B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2022054319A JP7756588B2 (ja) 2022-03-29 2022-03-29 温調装置、温調方法、デバイス製造装置、および物品製造方法
TW112105489A TWI910405B (zh) 2022-03-29 2023-02-16 調溫裝置，調溫方法，設備製造裝置及物品製造方法
KR1020230021122A KR20230140363A (ko) 2022-03-29 2023-02-17 온도 조절장치, 온도 조절방법, 디바이스 제조장치, 및 물품 제조방법
CN202310303376.9A CN116893704A (zh) 2022-03-29 2023-03-24 调温装置、调温方法、器件制造装置及物品制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2022054319A JP7756588B2 (ja) 2022-03-29 2022-03-29 温調装置、温調方法、デバイス製造装置、および物品製造方法

Publications (3)

Publication Number Publication Date
JP2023146890A JP2023146890A (ja) 2023-10-12
JP2023146890A5 JP2023146890A5 (https=) 2024-10-10
JP7756588B2 true JP7756588B2 (ja) 2025-10-20

Family

ID=88286782

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022054319A Active JP7756588B2 (ja) 2022-03-29 2022-03-29 温調装置、温調方法、デバイス製造装置、および物品製造方法

Country Status (4)

Country Link
JP (1) JP7756588B2 (https=)
KR (1) KR20230140363A (https=)
CN (1) CN116893704A (https=)
TW (1) TWI910405B (https=)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006005135A (ja) 2004-06-17 2006-01-05 Canon Inc 温度調節装置およびデバイス製造装置
JP2010258168A (ja) 2009-04-23 2010-11-11 Canon Inc デバイス製造装置およびデバイス製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5641709U (https=) 1979-09-01 1981-04-17
CN100403194C (zh) * 2005-09-13 2008-07-16 广州市高澜水技术有限公司 晶闸管阀组密闭式循环纯水冷却装置控制系统

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006005135A (ja) 2004-06-17 2006-01-05 Canon Inc 温度調節装置およびデバイス製造装置
JP2010258168A (ja) 2009-04-23 2010-11-11 Canon Inc デバイス製造装置およびデバイス製造方法

Also Published As

Publication number Publication date
TW202405572A (zh) 2024-02-01
KR20230140363A (ko) 2023-10-06
TWI910405B (zh) 2026-01-01
CN116893704A (zh) 2023-10-17
JP2023146890A (ja) 2023-10-12

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